Abstract: An electric power supply system includes an electric power reception apparatus and an electric power supply apparatus adapted to supply electric power to the electric power reception apparatus when the electric power reception apparatus is placed on the electric power supply apparatus. The electric power supply apparatus includes a plurality of electric power supply units adapted to supply electric power by electromagnetic induction to the electric power reception apparatus. A selection unit of the electric power supply apparatus selects, from the total plurality of electric power supply units, a plurality of electric power supply units whose location corresponds to a position where the electric power reception apparatus is placed, and a control unit controls the supply of electric power such that electric power is supplied to the electric power reception apparatus from the selected plurality of electric power supply units.

Abstract: A plasma processing apparatus includes a processing chamber having a ceiling and a sidewall, a susceptor, disposed in the processing chamber, for mounting thereon an object to be processed, a processing gas supply mechanism for supplying a processing gas through the ceiling to generate a plasma, an exhaust plate that is disposed between the susceptor and the sidewall and has a plurality of holes, a gas exhaust unit for exhausting a gas from under the susceptor through the exhaust plate, and a fin structure having plural fins arranged at regular intervals, which is disposed as protruded from the sidewall, at least, in a region extending from a top end portion of the sidewall to a region of a same height as that of a mounting surface of the susceptor for mounting the object thereon.

Abstract: An upper electrode for use in generating a plasma of a processing gas includes a cooling block having a coolant path for circulating a coolant therethrough and one or more through holes for passing the processing gas therethrough, an electrode plate having one or more injection openings for injecting the processing gas toward the substrate to be processed mounted on the mounting table, and an electrode frame installed at an upper portion of the cooling block and providing a processing gas diffusion gap for diffusing the processing gas between the cooling block and the electrode frame. The electrode plate is detachably fixed to a bottom surface of the cooling block via a thermally conductive member having flexibility.

Abstract: A bottom cultivating machine including a laser emitter for emitting a plane signal of a laser beam, a laser detector which is secured to a frame and detects the plane signal to output an attitude control signal, a horizontal detector having a horizontal sensor which is secured to the frame and serves to detect the level of the front end portion of the bottom cultivating machine in a cultivation progress direction, and a controller for controlling the height of the bottom cultivating machine on the basis of the attitude control signal and controlling the attitude of the bottom cultivating machine on the basis of a signal output from the horizontal sensor by upwardly or downwardly moving a gage wheel or a heel which is provided at the rear portion of the bottom cultivating machine.

Abstract: A cultivating system including a tractor, a cultivating machine for performing a cultivating work in combination with the tractor, and a link mechanism for linking the tractor and the cultivating machine, includes a free-motion mechanism provided to at least one of the tractor, the cultivating machine and the link mechanism, and having a free motion permissible zone in which at least one of the tractor, the cultivating machine and the link mechanism is freely movable relatively to the others in accordance with variation of a cultivation attitude of the cultivating machine due to variation of a cultivation environment, a cultivation-condition control mechanism for detecting the free motion of at least one of the tractor, the cultivating machine and the link mechanism within the free motion permissible zone in accordance with the variation of the cultivation environment, and moving the cultivating machine in accordance with the free motion permissible zone so as to offset the variation of the attitude of said c