Patents by Inventor Shigeyuki Hayashi
Shigeyuki Hayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240060573Abstract: The present invention enables fluid control with a smaller current or voltage by reducing a magnetic resistance of a magnetic path including the valve body. The present invention includes: a flow path block formed with an internal flow path; an orifice fixed to the flow path block and having a valve seat surface; a valve body having a seating surface seated on the valve seat surface, and made of a magnetic material; and an actuator portion that drives the valve body by a magnetic force. The actuator portion includes: an iron core provided to face a surface of the valve body opposite to the seating surface; a solenoid coil wound around the iron core; and a casing accommodating the iron core and the solenoid coil, and made of a magnetic material. The casing extends to a position surrounding a periphery of the valve body.Type: ApplicationFiled: August 8, 2023Publication date: February 22, 2024Inventors: Kazuya SHAKUDO, Yuki HIDA, Shigeyuki HAYASHI
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Patent number: 11867308Abstract: In order to provide a piezoelectric actuator and a fluid control valve that can vaporize a liquid material more effectively than a conventional arrangement, the piezoelectric actuator comprises a piezoelectric stack wherein a piezoelectric ceramic layer and an electrode layer are alternately laminated, a DC voltage application circuit that displaces the piezoelectric stack by applying a DC voltage to at least a part or whole of the piezoelectric stack, and a vibration voltage application circuit that vibrates the piezoelectric stack by applying a voltage having a predetermined frequency or above to at least a part or whole of the piezoelectric stack.Type: GrantFiled: November 20, 2019Date of Patent: January 9, 2024Assignee: HORIBA STEC, Co., Ltd.Inventors: Shigeyuki Hayashi, Tadahiro Yasuda
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Patent number: 11835924Abstract: A watch includes a first barrel complete including a first barrel arbor, a first mainspring, and a first barrel, and a second barrel complete that includes a second barrel arbor, a second mainspring, and a second barrel, is disposed side by side in a planar direction orthogonal to a shaft direction of the first barrel arbor, and receives transmission of rotation of the first barrel complete. A tooth tip circle diameter of the first barrel complete is smaller than a tooth tip circle diameter of the second barrel complete, and a thickness of the first barrel is greater than a thickness of the second barrel.Type: GrantFiled: January 26, 2021Date of Patent: December 5, 2023Inventor: Shigeyuki Hayashi
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Publication number: 20210232094Abstract: A watch includes a first barrel complete including a first barrel arbor, a first mainspring, and a first barrel, and a second barrel complete that includes a second barrel arbor, a second mainspring, and a second barrel, is disposed side by side in a planar direction orthogonal to a shaft direction of the first barrel arbor, and receives transmission of rotation of the first barrel complete. A tooth tip circle diameter of the first barrel complete is smaller than a tooth tip circle diameter of the second barrel complete, and a thickness of the first barrel is greater than a thickness of the second barrel.Type: ApplicationFiled: January 26, 2021Publication date: July 29, 2021Inventor: Shigeyuki HAYASHI
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Publication number: 20200185588Abstract: In order to provide a piezoelectric actuator and a fluid control valve that can vaporize a liquid material more effectively than a conventional arrangement, the piezoelectric actuator comprises a piezoelectric stack wherein a piezoelectric ceramic layer and an electrode layer are alternately laminated, a DC voltage application circuit that displaces the piezoelectric stack by applying a DC voltage to at least a part or whole of the piezoelectric stack, and a vibration voltage application circuit that vibrates the piezoelectric stack by applying a voltage having a predetermined frequency or above to at least a part or whole of the piezoelectric stack.Type: ApplicationFiled: November 20, 2019Publication date: June 11, 2020Inventors: Shigeyuki Hayashi, Tadahiro Yasuda
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Patent number: 10503179Abstract: A flow rate control apparatus is provided which enables high speed response particularly in a transient response state, such as when a target flow rate falls. The flow rate control apparatus includes: a valve provided with a position sensor to measure an opening degree and disposed in a flow channel; a flow rate sensor disposed upstream of the valve and provided with a restrictor; a first pressure sensor disposed downstream of the restrictor and disposed upstream of the valve; a second pressure sensor disposed downstream of the valve; a storage section to store a characteristic map indicating a relationship between at least the opening degree of the valve, a differential pressure before and after the valve, and a flow rate of a fluid passing through the flow channel; and a valve control section to control the valve so that the flow rate reaches an accepted target flow rate.Type: GrantFiled: December 5, 2017Date of Patent: December 10, 2019Assignee: HORIBA STEC, Co., Ltd.Inventors: Shigeyuki Hayashi, Kentaro Nagai, Masao Yamaguchi
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Patent number: 10480670Abstract: In order to provide a fluid control valve less likely to cause contamination, and a fluid control apparatus using the fluid control valve, at least any one of a valve seat member and a valve body member is one including a base body made of metal; and a resin layer that covers the surface of the base body to form a valve seat surface or a seating surface, in which the resin layer is directly chemically bonded to the base body.Type: GrantFiled: April 6, 2017Date of Patent: November 19, 2019Assignee: HORIBA STEC, Co., Ltd.Inventors: Shigeyuki Hayashi, Kazuya Shakudo
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Patent number: 10184185Abstract: In a gas flow monitoring method using a MFC (a flow control device) for controlling a flow rate of process gas from a process gas supply source and supply the process gas to a predetermined process chamber, a start shut-off valve placed upstream of the MFC, and a pressure gauge placed between the start shut-off valve and the MFC, the start shut-off valve is closed and a drop of pressure on an upstream side of the MFC is measured by the pressure gauge to measure a flow rate of the MFC, thereafter, the start shut-off valve is opened to monitor the flow rate of the MFC. The MFC is switched from an ON state to an OFF state before the start shut-off valve is opened. The method enables in-line monitoring a low rate of process gas without affecting a semiconductor manufacturing process.Type: GrantFiled: November 29, 2016Date of Patent: January 22, 2019Assignees: CKD CORPORATION, HORIBA STEC. CO., LTD.Inventors: Akiko Nakada, Yasunori Nishimura, Minoru Ito, Masami Nishikawa, Shigeyuki Hayashi, Atsushi Ieki
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Patent number: 10114385Abstract: To provide a fluid control valve that enables the internal volume to be reduced and, for example, the falling response performance to be improved without compromising the accuracy in controlling a pressure, a flow rate, and so on of fluid, a fluid control valve includes a valve seat portion, a valve body capable of making or breaking contact with the valve seat portion, a fluid resistance, and a pair of clamping members that clamps the fluid resistance. The fluid resistance and the pair of clamping members form an in-valve space in which the valve body or at least part of an actuation member that moves the valve body is housed. Fluid passes through the fluid resistance from the downstream-side in-valve space and flows out to the outside.Type: GrantFiled: October 15, 2014Date of Patent: October 30, 2018Assignee: HORIBA STEC, Co., Ltd.Inventors: Tadahiro Yasuda, Shigeyuki Hayashi
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Publication number: 20180173249Abstract: A flow rate control apparatus is provided which enables high speed response particularly in a transient response state, such as when a target flow rate falls. The flow rate control apparatus includes: a valve provided with a position sensor to measure an opening degree and disposed in a flow channel; a flow rate sensor disposed upstream of the valve and provided with a restrictor; a first pressure sensor disposed downstream of the restrictor and disposed upstream of the valve; a second pressure sensor disposed downstream of the valve; a storage section to store a characteristic map indicating a relationship between at least the opening degree of the valve, a differential pressure before and after the valve, and a flow rate of a fluid passing through the flow channel; and a valve control section to control the valve so that the flow rate reaches an accepted target flow rate.Type: ApplicationFiled: December 5, 2017Publication date: June 21, 2018Inventors: Shigeyuki Hayashi, Kentaro Nagai, Masao Yamaguchi
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Patent number: 9896768Abstract: The present invention is mainly intended to provide a sealing member which can be easily manufactured and which is capable of sealing with high accuracy and a method of manufacturing the sealing member, wherein the sealing member is a metallic sealing member that is arranged so as to be interposed between a first surface and a second surface which are facing each other. The sealing member is provided with a first protrusion protruded toward the first surface and a pair of second protrusions protruded toward the second surface, wherein the first protrusion is arranged between the paired second protrusions and distal end portions of the first protrusion and second protrusions are mutually parallel flat surfaces.Type: GrantFiled: December 18, 2013Date of Patent: February 20, 2018Assignee: HORIBA STEC, Co., Ltd.Inventors: Tadahiro Yasuda, Masayuki Nagasawa, Shigeyuki Hayashi
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Patent number: 9795936Abstract: The fluid mixing element in accordance with this invention forms a first internal flow channel whose starting end opens on an end surface of one end part and whose terminal end opens on an end surface of the other end part and a second internal flow channel whose starting end opens on a side peripheral surface of a middle part and whose terminal end opens on an end surface of the other end part. It is possible for the fluid mixing element to securely mix a first fluid flowing in a main flow channel with a second fluid flowing in a sub-flow channel by the use of a pipe with a short length with a simple arrangement.Type: GrantFiled: December 26, 2013Date of Patent: October 24, 2017Assignee: HORIBA STEC, Co., Ltd.Inventors: Tadahiro Yasuda, Shigeyuki Hayashi
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Publication number: 20170292622Abstract: In order to provide a fluid control valve less likely to cause contamination, and a fluid control apparatus using the fluid control valve, at least any one of a valve seat member and a valve body member is one including a base body made of metal; and a resin layer that covers the surface of the base body to form a valve seat surface or a seating surface, in which the resin layer is directly chemically bonded to the base body.Type: ApplicationFiled: April 6, 2017Publication date: October 12, 2017Inventors: SHIGEYUKI HAYASHI, KAZUYA SHAKUDO
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Patent number: 9746102Abstract: In order to make it possible to increase a diameter and output thereof, a diaphragm structure is provided that has low repulsiveness, can be largely deformed to increase a stroke even without being applied with a large force from an actuator, and is unlikely to give rise to a defect or fault even when formed thin, and a fluid control valve is provided with the diaphragm structure and the actuator that presses the diaphragm structure, wherein the diaphragm structure is provided with: a protruding part that is formed in a tubular shape and pressed by the actuator; a brim part that spreads from a base end of the protruding part outward with respect to the protruding part; and a support part that is formed on an outer circumference of the brim part and attached to another member, and the brim part is formed in a film shape.Type: GrantFiled: March 26, 2014Date of Patent: August 29, 2017Assignee: HORIBA STEC, Co., Ltd.Inventors: Tadahiro Yasuda, Shigeyuki Hayashi, Nobuyuki Kannan
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Publication number: 20170167026Abstract: In a gas flow monitoring method using a MFC (a flow control device) for controlling a flow rate of process gas from a process gas supply source and supply the process gas to a predetermined process chamber, a start shut-off valve placed upstream of the MFC, and a pressure gauge placed between the start shut-off valve and the MFC, the start shut-off valve is closed and a drop of pressure on an upstream side of the MFC is measured by the pressure gauge to measure a flow rate of the MFC, thereafter, the start shut-off valve is opened to monitor the flow rate of the MFC. The MFC is switched from an ON state to an OFF state before the start shut-off valve is opened. The method enables in-line monitoring a low rate of process gas without affecting a semiconductor manufacturing process.Type: ApplicationFiled: November 29, 2016Publication date: June 15, 2017Applicants: CKD CORPORATION, HORIBA STEC, CO., LTD.Inventors: Akiko NAKADA, Yasunori NISHIMURA, Minoru ITO, Masami NISHIKAWA, Shigeyuki HAYASHI, Atsushi IEKI
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Patent number: 9657860Abstract: The present invention is directed a valve element which is intended to improve a sealing property at a time of closing a fluid control valve and to improve stability while maintaining durability for a long time period, wherein the valve element constitutes one of a valve seat surface or a seating surface and the valve element includes a concave portion formed in an opposing surface facing the valve seat surface and a resin coating film which is formed in the concave portion and contacts the valve seat surface.Type: GrantFiled: September 5, 2013Date of Patent: May 23, 2017Assignee: HORIBA STEC, Co., Ltd.Inventors: Shigeyuki Hayashi, Tadahiro Yasuda, Kazuya Ohsa
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Patent number: 9605985Abstract: The present invention is a flow rate measuring mechanism provided with: a body unit that has an internal flow path through which a target fluid to be measured is configured to flow; and a pressure sensor that is attached to the body unit and senses a pressure of the internal flow path, and configured to calculate a flow rate of the fluid on the basis of the fluid pressure sensed by the pressure sensor, wherein the body unit has a length direction and a surface parallel to the length direction, which is set as a component attachment surface, and to the component attachment surface, the pressure sensor is attached such that a pressure sensitive surface thereof is substantially vertical to the component attachment surface and substantially parallel to the length direction, and thereby, without causing a reduction in pressure measurement sensitivity, makes a width direction size dramatically smaller than before.Type: GrantFiled: September 17, 2010Date of Patent: March 28, 2017Assignee: HORIBA STEC, Co., Ltd.Inventors: Shigeyuki Hayashi, Akira Kuwahara
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Patent number: 9371930Abstract: An object of this invention is both to prevent contamination of a fluid passing a fluid control valve and to prevent a tilt of a valve body in a moving direction and vibration of the valve body. The fluid control valve comprises a valve body that is arranged on an inner surface of a valve chest through a predetermined space in the valve chest and that is arranged on a valve seat arranged in the valve chest in a detachable manner, an actuator that biases the valve body in a direction of opening the valve, a valve body return spring that biases the valve body in a direction of closing the valve, and a tilt restraining spring that biases the valve body in a direction of resolving a tilt of the valve body to an open/close direction.Type: GrantFiled: August 29, 2012Date of Patent: June 21, 2016Assignee: HORIBA STEC, Co., Ltd.Inventor: Shigeyuki Hayashi
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Publication number: 20160124439Abstract: To provide a fluid control valve that enables the internal volume to be reduced and, for example, the falling response performance to be improved without compromising the accuracy in controlling a pressure, a flow rate, and so on of fluid, a fluid control valve includes a valve seat portion, a valve body capable of making or breaking contact with the valve seat portion, a fluid resistance, and a pair of clamping members that clamps the fluid resistance. The fluid resistance and the pair of clamping members form an in-valve space in which the valve body or at least part of an actuation member that moves the valve body is housed. Fluid passes through the fluid resistance from the downstream-side in-valve space and flows out to the outside.Type: ApplicationFiled: October 15, 2014Publication date: May 5, 2016Inventors: Tadahiro Yasuda, Shigeyuki Hayashi
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Patent number: 9328826Abstract: In order to, in a short period of time, reduce to zero a measured flow rate value measured after fully closing a fluid control valve, the fluid control valve having a configuration suitable to decrease the inside volume of the fluid control valve is configured together with a valve element member, and a valve seat block provided with: an in-valve flow path that is formed inside of the valve seat block; and a valve seat surface that is brought into contact with or separated from a seating surface of the valve element member is provided with a cutout that is formed in a part of a protruded rim so as to be communicatively connected to a downstream side flow path.Type: GrantFiled: December 26, 2013Date of Patent: May 3, 2016Assignee: HORIBA STEC, CO. Ltd.Inventor: Shigeyuki Hayashi