Abstract: A substrate processing apparatus of an embodiment includes: a processing tank that stores a processing solution and houses a plurality of substrates that are to be processed with the processing solution, with the substrates being arranged in a predetermined direction; an inner wall provided in the processing tank to cover at least a partial portion of a substrate surface located at one end in terms of the arrangement direction of the substrates and at least partial portions of side surfaces, of the substrates, that line up along the arrangement direction, with a space where the processing solution flows being present between the inner wall and a bottom surface of the processing tank; and a processing solution nozzle provided at a position that is in the processing tank and outside the inner wall and opening in a manner to cause an upward flow to be formed inside the inner wall.

Abstract: A processing device according to one embodiment includes an object placement unit, a source placement unit, a collimator, and a temperature adjusting unit. The object placement unit is configured to have an object arranged. The object placement unit is configured to have an object placed thereon. The source placement unit is arranged apart from the object placement unit and configured to have a particle source placed thereon, the particle source being capable of ejecting a particle toward the object. The collimator configured to be arranged between the object placement unit and the source placement unit, includes walls, and is provided with through holes formed by the walls and extending a direction from the object placement unit to the source placement unit. The temperature adjusting unit is configured to adjust a temperature of the collimator.

Abstract: A fluid passage structure includes a housing and first wall portions. The housing includes an outer surface located at an end of a first direction and two passages separated from each other provided inside. Each of two passages includes at least one fluid chamber, openings that open to the outer surface, and branch paths that is coupled to the fluid chamber. The fluid chambers of the two passages are arranged alternately in the first direction. The branch paths include at least one of: branch paths that couple at least one of the openings with one fluid chamber; and branch paths that couple one fluid chamber with another fluid chamber. The first wall portions are provided in the housing, face the fluid chamber, and are arranged in the first direction via the fluid chamber.

Abstract: According to an embodiment, a flow passage structure includes a member. The member has a surface and is provided with a first passage, a plurality of first openings, a second passage, and a plurality of second openings. The first passage includes a plurality of first closed path portions connected to each other. The first openings is connected to the first passage and is opened in the surface. The second passage includes a plurality of second closed path portions connected to each other. The second openings is connected to the second passage and is opened in the surface. The first closed path portions pass through the second closed path portions while being isolated from the second closed path portions. The second closed path portions pass through the first closed path portions while being isolated from the first closed path portions.

Abstract: A processing apparatus according to an embodiment includes an object placement unit, a source placement unit, a flow rectifying member, and a power supply. The object placement unit is configured to have an object placed thereon. The source placement unit is disposed apart from the object placement unit and configured to have a particle source capable of ejecting a particle toward the object placed thereon. The flow rectifying member is disposed between the object placement unit and the source placement unit in a first direction from the source placement unit to the object placement unit. The power supply is configured to apply, to the flow rectifying member, a voltage having the same polarity as that of an electric charge in the particle.

Abstract: According to an embodiment, a processing apparatus includes a generator mount, a first-object mount, and a first collimator. A particle generator capable of emitting particles is placed on the generator mount. A first object is placed on the first-object mount. The first collimator is placed between the generator mount and the first-object mount, and has first walls and second walls. In the first collimator, the first walls and the second walls form first through holes extending in a first direction from the generator mount to the first-object mount. Each of the second walls is provided with at least one first passage.

Abstract: According to an embodiment, a flow passage structure includes a member. The member has a surface and is provided with a first passage, a plurality of first openings, a second passage, and a plurality of second openings. The first passage includes a plurality of first closed path portions connected to each other. The first openings is connected to the first passage and is opened in the surface. The second passage includes a plurality of second closed path portions connected to each other. The second openings is connected to the second passage and is opened in the surface. The first closed path portions pass through the second closed path portions while being isolated from the second closed path portions. The second closed path portions pass through the first closed path portions while being isolated from the first closed path portions.

Abstract: A fluid passage structure includes a housing and first wall portions. The housing includes an outer surface located at an end of a first direction and two passages separated from each other provided inside. Each of two passages includes at least one fluid chamber, openings that open to the outer surface, and branch paths that is coupled to the fluid chamber. The fluid chambers of the two passages are arranged alternately in the first direction. The branch paths include at least one of: branch paths that couple at least one of the openings with one fluid chamber; and branch paths that couple one fluid chamber with another fluid chamber. The first wall portions are provided in the housing, face the fluid chamber, and are arranged in the first direction via the fluid chamber.

Abstract: A flow passage structure includes a member. The member includes a plurality of first openings, a plurality of second openings, a flow passage, and a plurality of joining and branching parts. The flow passage connects the first openings with the second openings. The joining and branching parts are provided in the flow passage and each have a plurality of first parts having respective first ends connected with each other and a plurality of second parts having respective second ends connected with each other. The second parts are closer to the second openings than the first parts are, in a path between the first opening and the second opening. The first ends are connected with the second ends in each joining and branching part.

Abstract: A nozzle device according to an embodiment includes a first opening, a plurality of second openings, and a first duct part. The first duct part includes at least one first branching part having a first part extending in a first direction and a plurality of second parts connected to a first end of the first part and extending in respective directions intersecting with the first direction. The first duct part connects the first opening and the second openings and is branched at least once by the first branching part in a path extending from the first opening to the second openings. The path lengths and the numbers of first branching parts between the first opening and the respective second openings are the same. The cross-sectional area of the first end of the first part is smaller than the cross-sectional area of a second end of the first part.

Abstract: A nozzle device according to an embodiment includes a first opening, a plurality of second openings, and a first duct part. The first duct part includes at least one first branching part having a first part extending in a first direction and a plurality of second parts connected to a first end of the first part and extending in respective directions intersecting with the first direction. The first duct part connects the first opening and the second openings and is branched at least once by the first branching part in a path extending from the first opening to the second openings. The path lengths and the numbers of first branching parts between the first opening and the respective second openings are the same. The cross-sectional area of the first end of the first part is smaller than the cross-sectional area of a second end of the first part.

Abstract: According to an embodiment, a processing apparatus includes a generator mount, a first-object mount, and a first collimator. A particle generator capable of emitting particles is placed on the generator mount. A first object is placed on the first-object mount. The first collimator is placed between the generator mount and the first-object mount, and has first walls and second walls. In the first collimator, the first walls and the second walls form first through holes extending in a first direction from the generator mount to the first-object mount. Each of the second walls is provided with at least one first passage.

Abstract: A mixer structure includes a helical fluid passage includes a first partition and a second partition. The first partition extends intersecting with a cross-sectional center line of the passage, and divides the helical passage into first sub-passages in parallel. The second partition is disposed downstream of the first partition, extends intersecting with the cross-sectional center line, and divides the helical passage into second sub-passages in parallel. A rear or downstream end of the first partition and a front or upstream end of the second partition intersect with each other or are at skew position.

Abstract: A processing apparatus according to an embodiment includes an object placement unit, a source placement unit, a flow rectifying member, and a power supply. The object placement unit is configured to have an object placed thereon. The source placement unit is disposed apart from the object placement unit and configured to have a particle source capable of ejecting a particle toward the object placed thereon. The flow rectifying member is disposed between the object placement unit and the source placement unit in a first direction from the source placement unit to the object placement unit. The power supply is configured to apply, to the flow rectifying member, a voltage having the same polarity as that of an electric charge in the particle.

Abstract: According to an embodiment, a processing apparatus includes a generator mount, a first-object mount, and a first collimator. A particle generator capable of emitting particles is placed on the generator mount. A first object is placed on the first-object mount. The first collimator is placed between the generator mount and the first-object mount, and has first walls and second walls. In the first collimator, the first walls and the second walls form first through holes extending in a first direction from the generator mount to the first-object mount. Each of the second walls is provided with at least one first passage.

Abstract: A nozzle includes a body. The body includes a supply port to which a liquid is supplied, a vent from which the liquid is discharged downward, and a flow channel that extends between the supply port and the vent. The flow channel includes: a storage including a first part through which the liquid flows downward to the vent, and a second part provided downstream of the first part, through which the liquid flows upward to the vent; and an exhaust capable of exhausting a gas upstream of the second part while the liquid is not discharged from the vent and is stored in the storage. The storage includes a third part connecting the first part and the second part. The exhaust includes a bypass channel that leads to parts upstream and downstream of the third part in the flow channel.

Abstract: According to one embodiment, a collimator includes peripheral openings that extend between a grid region and a peripheral frame, are larger in size than unit through-holes, and penetrate through the collimator in a first direction. The peripheral openings include first peripheral openings located between first end walls and the peripheral frame.

Abstract: According to an embodiment, a shower plate includes a first member and a second member. The first member includes a first wall provided with a plurality of first openings and internally including a room with which the first openings communicate. The second member includes a second wall provided with a second opening and arranged in the room. The second member is arranged at a position spaced apart from the first member, and allows one of the first openings facing the second opening to be replaced with another of the first openings by changing a position of the second member with respect to the first member.

Abstract: A processing device according to one embodiment includes an object placement unit, a source placement unit, a collimator, and a temperature adjusting unit. The object placement unit is configured to have an object arranged. The object placement unit is configured to have an object placed thereon. The source placement unit is arranged apart from the object placement unit and configured to have a particle source placed thereon, the particle source being capable of ejecting a particle toward the object. The collimator configured to be arranged between the object placement unit and the source placement unit, includes walls, and is provided with through holes formed by the walls and extending a direction from the object placement unit to the source placement unit. The temperature adjusting unit is configured to adjust a temperature of the collimator.

Abstract: A processing device according to one embodiment includes an object placement unit, a source placement unit, and a collimator. An object is placed on the object placement unit. The source placement unit is arranged apart from the object placement unit, and has a particle source placed thereon, the particle source being capable of ejecting particle toward the object. The collimator is arranged between the object placement unit and the source placement unit, includes walls, and is provided with through holes formed by the walls. The walls include a first inner surface facing the through hole. The first inner surface includes a first portion made of a first material capable of ejecting the particle, and a second portion made of a second material, and arranged with the first portion in the first direction and closer to the object placement unit than the first portion.