Patents by Inventor Shih-Cheng Chuang

Shih-Cheng Chuang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240170556
    Abstract: A method for forming a semiconductor structure is provided. The method includes forming a spacer layer along a first fin structure and a second fin structure, etching a first portion of the spacer layer and the first fin structure to form first fin spacers and a first recess between the first fin spacers, etching a second portion of the spacer layer and the second fin structure to form second fin spacers and a second recess between the second fin spacers, and forming a first source/drain feature in the first recess and a second source/drain feature in the second recess. The second fin structure is wider than the first fin structure. The first fin spacers have a first height, and the second fin spacers have a second height that is greater than the first height.
    Type: Application
    Filed: February 20, 2023
    Publication date: May 23, 2024
    Inventors: Shih-Cheng CHEN, Zhi-Chang LIN, Jung-Hung CHANG, Chien-Ning YAO, Tsung-Han CHUANG, Kuo-Cheng CHIANG
  • Publication number: 20240147556
    Abstract: In some examples, a device can include a first antenna having a first wireless connection with a first computing device, a second antenna having a second wireless connection with a second computing device, and a controller to determine a signal strength of the first wireless connection and a signal strength of the second wireless connection, designate, in response to the signal strength of the first wireless connection being greater than a threshold signal strength, the first wireless connection as an active connection and the second wireless connection as a standby connection, and cause the peripheral device to communicate with the first computing device via the active connection of the first antenna while maintaining the second wireless connection to the second computing device via the second antenna, where the second wireless connection remains as the standby connection.
    Type: Application
    Filed: October 28, 2022
    Publication date: May 2, 2024
    Inventors: Min-Hsu Chuang, Xin-Chang Chen, Pai-Cheng Huang, Chin-Hung Ma, Shih-Yen Cheng
  • Patent number: 11940737
    Abstract: A method includes receiving a device design layout and a scribe line design layout surrounding the device design layout. The device design layout and the scribe line design layout are rotated in different directions. An optical proximity correction (OPC) process is performed on the rotated device design layout and the rotated scribe line design layout. A reticle includes the device design layout and the scribe line design layout is formed after performing the OPC process.
    Type: Grant
    Filed: May 7, 2021
    Date of Patent: March 26, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Hsueh-Yi Chung, Yung-Cheng Chen, Fei-Gwo Tsai, Chi-Hung Liao, Shih-Chi Fu, Wei-Ti Hsu, Jui-Ping Chuang, Tzong-Sheng Chang, Kuei-Shun Chen, Meng-Wei Chen
  • Patent number: 11938405
    Abstract: An electronic device and a method for detecting abnormal device operation are provided. The method includes: obtaining multiple action events of a movable input device, and each action event including a relative coordinate and a time stamp of the movable input device; generating multiple absolute coordinates based on the relative coordinate of each action event; estimating multiple speed vectors based on the absolute coordinates and the time stamp of each action event; estimating multiple acceleration vectors based on the speed vectors and the time stamp of each action event; and estimating a probability of abnormal operation based on the speed vectors and the acceleration vectors.
    Type: Grant
    Filed: November 8, 2022
    Date of Patent: March 26, 2024
    Assignee: Acer Incorporated
    Inventors: Tien-Yi Chi, Wei-Chieh Chen, Shih-Cheng Huang, Tzu-Lung Chuang
  • Patent number: 10364162
    Abstract: A system and a method for treating salt-containing glycerin wastewater are provided, wherein the system for treating the salt-containing glycerin wastewater includes a mixing tank, a filtering device, a distillation column, and a water supply device. The mixing tank is adapted to mix salt-containing glycerin wastewater with a concentrated hydrochloric acid to obtain a mixture. The filtering device communicates with the mixing tank and filters the mixture to obtain an acidic filtrate and a precipitated salt. The distillation column communicates with the filtering device and receives the acidic filtrate from the filtering device. The water supply device supplies water to the acidic filtrate. The system and method for treating the salt-containing glycerin wastewater can effectively recycle hydrochloric acid.
    Type: Grant
    Filed: August 9, 2017
    Date of Patent: July 30, 2019
    Assignees: National Tsing Hua University, Chang Chun Plastics Co., Ltd., Chang Chun Petrochemical Co., Ltd.
    Inventors: Shih-Cheng Chuang, Shi-Shang Jang, David S. H. Wong, Sheng-Chieh Wang, En-Ko Lee
  • Publication number: 20190002305
    Abstract: A system and a method for treating salt-containing glycerin wastewater are provided, wherein the system for treating the salt-containing glycerin wastewater includes a mixing tank, a filtering device, a distillation column, and a water supply device. The mixing tank is adapted to mix salt-containing glycerin wastewater with a concentrated hydrochloric acid to obtain a mixture. The filtering device communicates with the mixing tank and filters the mixture to obtain an acidic filtrate and a precipitated salt. The distillation column communicates with the filtering device and receives the acidic filtrate from the filtering device. The water supply device supplies water to the acidic filtrate. The system and method for treating the salt-containing glycerin wastewater can effectively recycle hydrochloric acid.
    Type: Application
    Filed: August 9, 2017
    Publication date: January 3, 2019
    Applicants: National Tsing Hua University, Chang Chun Plastics Co., Ltd., Chang Chun Petrochemical Co., Ltd.
    Inventors: Shih-Cheng Chuang, Shi-Shang Jang, David S. H. Wong, Sheng-Chieh Wang, En-Ko Lee