Abstract: The present disclosure discloses a display apparatus having an on-screen display control mechanism. A signal receiving terminal receives a keyboard input signal. A signal transmission circuit receives the keyboard input signal by using an input terminal from the signal receiving terminal and transmits the keyboard input signal to a first output terminal and a second output terminal respectively in a keyboard signal transmission mode and a on-screen display control mode. The display control circuit controls a display panel to display a on-screen display including control items and an indicating object under the on-screen display control mode, receive the keyboard input signal from the second output terminal to retrieve key information and control the indicating object according to the key information to move among the control items to switch a selected control item indicated thereby or execute a control function of the selected control item.

Abstract: A wafer lithographic shielding mask for fabricating a multi-project wafer (MPW) and a wafer fabrication method using the same are disclosed. The mask including a light shielding layer and at least one transparent region is used to select the layout patterns of designated chips on an MPW reticle to be exposed onto the photoresist layer on the surface of the wafer. The lithography method of fabricating MPW mainly involves disposing a wafer lithographic shielding mask for selecting the exposure regions on the MPW reticle on the light transmission path from a lithographic light source to a wafer, e.g., between the MPW reticle and the lithographic light source or between the MPW reticle and the wafer, so as to prevent some undesired chips from being fabricated on the wafer using the MPW reticle, thereby decreasing the wafer production cost.

Abstract: A wafer lithographic shielding mask for fabricating a multi-project wafer (MPW) and a wafer fabrication method using the same are disclosed. The mask including a light shielding layer and at least one transparent region is used to select the layout patterns of designated chips on an MPW reticle to be exposed onto the photoresist layer on the surface of the wafer. The lithography method of fabricating MPW mainly involves disposing a wafer lithographic shielding mask for selecting the exposure regions on the MPW reticle on the light transmission path from a lithographic light source to a wafer, e.g., between the MPW reticle and the lithographic light source or between the MPW reticle and the wafer, so as to prevent some undesired chips from being fabricated on the wafer using the MPW reticle, thereby decreasing the wafer production cost.

Abstract: A multi-functional timer comprises a CPU connected respectively with a setting unit, display unit, output control circuit and oscillating circuit. The setting unit has several switches; the switches are connected to several buttons on a panel. The display unit has a display zone, setting date display zone and date/time display zone. Digits 1 to 7, which represent Monday to Sunday, can be shown at the setting date display zone. The display zone is also combined onto the panel. The timer according to the present can be simpler on the setting operation of a work time and can be used to set different work time sections as well as to set every kind of action interval in a work time section.