Patents by Inventor Shih Cheng Yeh

Shih Cheng Yeh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9513674
    Abstract: An electronic device includes a casing and a rotary flap door device. The rotary flap door device is installed inside the casing and includes a base plate and a door member. The base plate is mounted on the casing. A base constraining structure and a base engaging structure are formed on the base plate. The door member includes a door body, a door limit part and a door engaging portion. The door body is rotably disposed on the base plate. The door limit part extends from the door body and is for embedding into the base limit part. The door engaging portion protrudes from the door body and is for engaging with the base engaging portion.
    Type: Grant
    Filed: March 31, 2015
    Date of Patent: December 6, 2016
    Assignees: Inventec (Pudong) Technology Corp., Inventec Corporation
    Inventors: Yuan-Chang Yang, Shih-Wei Chen, Shih-Cheng Yeh, Chih-Wei Chiang
  • Publication number: 20160157369
    Abstract: An electronic device includes a casing and a rotary flap door device. The rotary flap door device is installed inside the casing and includes a base plate and a door member. The base plate is mounted on the casing. A base constraining structure and a base engaging structure are formed on the base plate. The door member includes a door body, a door limit part and a door engaging portion. The door body is rotably disposed on the base plate. The door limit part extends from the door body and is for embedding into the base limit part. The door engaging portion protrudes from the door body and is for engaging with the base engaging portion.
    Type: Application
    Filed: March 31, 2015
    Publication date: June 2, 2016
    Inventors: Yuan-Chang Yang, Shih-Wei Chen, Shih-Cheng Yeh, Chih-Wei Chiang
  • Patent number: 7910014
    Abstract: A chemical processing bath and system used in semiconductor manufacturing utilizes a dynamic spiking model that essentially constantly monitors chemical concentration in the processing bath and adds fresh chemical on a regular basis to maintain chemical concentrations at desirable levels. Etch rates and etch selectivities are maintained at desirable levels and contamination from undesirable precipitation is avoided. The system and method automatically compare concentration levels to a plurality of control limits associated with various technologies and identify the technology or technologies that may undergo processing.
    Type: Grant
    Filed: December 21, 2007
    Date of Patent: March 22, 2011
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Tai-Yung Yu, Yu-Sheng Su, Li Te Hsu, Jin Lin Liang, Shih Cheng Yeh, Pin Chia Su
  • Publication number: 20090087929
    Abstract: A chemical processing bath and system used in semiconductor manufacturing utilizes a dynamic spiking model that essentially constantly monitors chemical concentration in the processing bath and adds fresh chemical on a regular basis to maintain chemical concentrations at desirable levels. Etch rates and etch selectivities are maintained at desirable levels and contamination from undesirable precipitation is avoided. The system and method automatically compare concentration levels to a plurality of control limits associated with various technologies and identify the technology or technologies that may undergo processing.
    Type: Application
    Filed: December 21, 2007
    Publication date: April 2, 2009
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Tai-Yung Yu, Yu-Sheng Su, Li Te Hsu, Jin Lin Liang, Shih Cheng Yeh, Pin Chia Su