Abstract: In an embodiment, a method of forming a structure includes forming a first transistor and a second transistor over a first substrate; forming a front-side interconnect structure over the first transistor and the second transistor; etching at least a backside of the first substrate to expose the first transistor and the second transistor; forming a first backside via electrically connected to the first transistor; forming a second backside via electrically connected to the second transistor; depositing a dielectric layer over the first backside via and the second backside via; forming a first conductive line in the dielectric layer, the first conductive line being a power rail electrically connected to the first transistor through the first backside via; and forming a second conductive line in the dielectric layer, the second conductive line being a signal line electrically connected to the second transistor through the second backside via.

Abstract: A stacked integrated circuit (IC) device and a method are disclosed. The stacked IC device includes a first semiconductor element. The first substrate includes a dielectric block in the first substrate; and a plurality of first conductive features formed in first inter-metal dielectric layers over the first substrate. The stacked IC device also includes a second semiconductor element bonded on the first semiconductor element. The second semiconductor element includes a second substrate and a plurality of second conductive features formed in second inter-metal dielectric layers over the second substrate. The stacked IC device also includes a conductive deep-interconnection-plug coupled between the first conductive features and the second conductive features. The conductive deep-interconnection-plug is isolated by dielectric block, the first inter-metal-dielectric layers and the second inter-metal-dielectric layers.

Abstract: A method includes forming a dielectric layer over a conductive layer, and forming a sidewall spacer in an opening in the dielectric layer. The opening exposes a portion of the conductive layer. A bottom electrode layer is formed over the conductive layer and the sidewall spacer. A phase change material layer is formed over the bottom electrode layer, and a top electrode layer is formed over the phase change material layer. In an embodiment, the method includes recess etching the bottom electrode layer before forming the phase change material layer.

Abstract: A method includes forming a dielectric layer over a conductive layer, and forming a sidewall spacer in an opening in the dielectric layer. The opening exposes a portion of the conductive layer. A bottom electrode layer is formed over the conductive layer and the sidewall spacer. A phase change material layer is formed over the bottom electrode layer, and a top electrode layer is formed over the phase change material layer. In an embodiment, the method includes recess etching the bottom electrode layer before forming the phase change material layer.

Abstract: A liquid crystal display panel including an active device array substrate, an opposite substrate, and a liquid crystal layer is provided. The active device array substrate includes a plurality of pixel electrodes and each of the pixel electrodes includes a plurality of sets of stripe patterns extending along different directions. Each of the stripe patterns has a width of L and a space between two neighboring stripe patterns is S. The opposite substrate is disposed over the active device array substrate. The liquid crystal layer is disposed between the active device array substrate and the opposite substrate. A cell gap between the active device array substrate and the opposite substrate is d, birefringence of the liquid crystal layer is ?n, and dielectric anisotropy of the liquid crystal layer is ??, wherein S, d, ?n, and ?? comply with the inequality: S/|??|?2.8×?n×d.