Patents by Inventor Shih-Chia Cheng

Shih-Chia Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140330414
    Abstract: A system of an internet interactive service and operating method thereof is disclosed. A network host is to transmit an audio watermark not only to connect with multiple devices but also to set the multiple devices as a specific group. The invention comprises following steps: connecting at least one multimedia device with the network host, transmitting the audio watermark which may comprise certification from the network host to the at least one multimedia device, the at least one multimedia device broadcasting the audio watermark, the at least one electronic device receiving the audio watermark and afterward transmitting the audio watermark or the certification to the network host, the network host recognizing the audio watermark or the certification and afterward setting the at least one multimedia device and the at least one electronic device as the specific group, transmitting at least one datum from the network host to the specific group.
    Type: Application
    Filed: July 10, 2013
    Publication date: November 6, 2014
    Inventors: TSE-MING CHANG, SHIH-CHIA CHENG, KAI-YIN CHENG, YU-HSIANG LIN
  • Publication number: 20130276039
    Abstract: A characteristic karaoke video-on-demand (VOD) system with a reference index database is provided. According to the reference index database as well as a song request signal inputted by a user, the characteristic karaoke VOD system is able to recommend at least one artist or at least one song to the user to enhance convenience and functionality offered by the characteristic karaoke VOD system.
    Type: Application
    Filed: June 14, 2012
    Publication date: October 17, 2013
    Applicant: IKALA Interactive Media Inc.
    Inventors: TSE - MING CHANG, Shih- Chia Cheng, Kai-Yin Cheng
  • Publication number: 20130262634
    Abstract: A situation command system including a multimedia apparatus and a server is provided. The multimedia device and the server are connected via a network system. The multimedia apparatus, including a microprocessor, a memory device, a multimedia file input device, a network interface, an audio/video body-sensing input device, an audio/video body-sensing output device and a control device, presents a multimedia effect of a file to a user. The server, including a central processing system, a storage system, a communication system and a recognition system, accesses the file and determines whether the file satisfies a trigger condition to selectively output a special effect. When the file satisfies the trigger condition, the multimedia apparatus further superimposes the special effect to the file and presents the file together with the special effect to the user to provide a situation simulation effect.
    Type: Application
    Filed: April 28, 2012
    Publication date: October 3, 2013
    Applicant: IKALA Interactive Media Inc.
    Inventors: TSE-MING CHANG, Shih-Chia Cheng, Kai-Yin Cheng
  • Publication number: 20120110510
    Abstract: A method for adjusting settings of an electronic device is disclosed. The method includes the steps as follows: providing a user interface including a plurality of main setting menu keys and a control unit; selecting one of the main setting menu keys to call a main setting value corresponding to the main setting menu key; outputting a corresponding main setting option image at least including a main setting value display area according to the main setting value; and providing a touch control event to operate the control unit for adjusting the main setting value and then display the adjusted main setting value on the main setting value display area. The touch control event includes a touch displacement event and a touch event. The method for adjusting the settings is contemplated for user's intuitive operation to save the time cost.
    Type: Application
    Filed: November 3, 2010
    Publication date: May 3, 2012
    Inventors: Liew Hui Min Cindy, Ng Wan Lynn, Lionel Wong Zhen Jie, Chen Hung-Hsiang, Daniel Pittella Alenquer, Loi Wean Fong, Alec Wong, Shih Chia-Cheng, Lee Yun Qin
  • Patent number: 7074701
    Abstract: A method of forming an opening in a stack of insulator layers featuring an underlying etch stop layer comprised of a tri-layer insulator composite, has been developed. The tri-layer insulator composite comprised of a bottom silicon rich, silicon oxide layer and a top silicon nitride layer, is first formed on a conductive region of a semiconductor substrate. After deposition of overlying insulator layers a photoresist shape is used as a etch mask to allow the desired contact or via hole shape to be defined in the overlying insulator layers via a first phase of an anisotropic dry etch procedure, with the first phase of the dry etching procedure terminating at the top surface of the silicon nitride layer. An over etch procedure used to insure complete removal of overlying insulator layer from the surface of the tri-layer insulator composite, is next performed as a second phase of the anisotropic dry etch procedure.
    Type: Grant
    Filed: November 21, 2003
    Date of Patent: July 11, 2006
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: Yi-Lung Cheng, Shih-Chia Cheng
  • Publication number: 20050112859
    Abstract: A method of forming an opening in a stack of insulator layers featuring an underlying etch stop layer comprised of a tri-layer insulator composite, has been developed. The tri-layer insulator composite comprised of a bottom silicon rich, silicon oxide layer and a top silicon nitride layer, is first formed on a conductive region of a semiconductor substrate. After deposition of overlying insulator layers a photoresist shape is used as a etch mask to allow the desired contact or via hole shape to be defined in the overlying insulator layers via a first phase of an anisotropic dry etch procedure, with the first phase of the dry etching procedure terminating at the top surface of the silicon nitride layer. An over etch procedure used to insure complete removal of overlying insulator layer from the surface of the tri-layer insulator composite, is next performed as a second phase of the anisotropic dry etch procedure.
    Type: Application
    Filed: November 21, 2003
    Publication date: May 26, 2005
    Inventors: Yi-Lung Cheng, Shih-Chia Cheng