Patents by Inventor Shih-Chiang Tu

Shih-Chiang Tu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5994009
    Abstract: The present invention discloses a novel method for interlayer corrections for photolithographic patterns that are reproduced on a wafer surface capable of correcting not only the optically-induced proximity effect but also the process-induced proximity effect. In the method, a conventional optical proximity correction is first performed on a photomask, the corrected photomask is then used to produce a pattern on a wafer surface. The various critical dimensions bias values at a multiplicity of locations are then measured and fed back to the computer aided design data file for the photomask for producing patterns that are corrected for both optically-induced and process-induced proximity effect on a wafer surface.
    Type: Grant
    Filed: November 17, 1997
    Date of Patent: November 30, 1999
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: San-De Tzu, Shih-Chiang Tu, Chia-Hui Lin