Abstract: An adjustable connection mechanism of an uninterruptible power supply apparatus includes a first connector, a second connector, a supporting member and a carrier plate. The first connector is arranged on a battery module and electrically connected to the battery module. The second connector is electrically connected to a power supply module and a control module of the uninterruptible power supply apparatus. The supporting member is disposed within a case for supporting the second connector. The carrier plate is coupled with the second connector, and selectively movable to a first position to have the second connector disconnect with the first connector or movable to a second position to have the second connector connect with the first connector.

Abstract: An adjustable connection mechanism of an uninterruptible power supply apparatus includes a first connector, a second connector, a supporting member and a carrier plate. The first connector is arranged on a battery module and electrically connected to the battery module. The second connector is electrically connected to a power supply module and a control module of the uninterruptible power supply apparatus. The supporting member is disposed within a case for supporting the second connector. The carrier plate is coupled with the second connector, and selectively movable to a first position to have the second connector disconnect with the first connector or movable to a second position to have the second connector connect with the first connector.

Abstract: A method for monitoring dynamic particle pollution in an etching chamber is provided. The method is described as follows. A bare wafer is positioned in an etching machine. Subsequently the bare wafer is transferred to a main etching chamber. Then, the plasma power source is turned on to perform an etching process on the photoresist. After that, the number of particles fallen on the bare wafer is counted to determine the polluted situation for the etching machine.