Abstract: Chemical vapor deposition equipment includes a reactor, an adjustable pipe, and an exhausted pipe. The adjustable pipe includes a compressible body, a bushing, and a ring positioned at an end of the body for connecting with the exhausted pipe. The bushing is positioned inside the body, and an end of the bushing is connected to the reactor for preventing exhaust gas from remaining inside the body. In addition, the compressible body is monolithically formed. Therefore, exhaust gas will not leak from the body, which improves the quality of manufacture.