Patents by Inventor Shih-Hsien LEE

Shih-Hsien LEE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12046614
    Abstract: Apparatus and methods for effective impurity gettering are described herein. In some embodiments, a described device includes: a substrate; a pixel region disposed in the substrate; an isolation region disposed in the substrate and within a proximity of the pixel region; and a heterogeneous layer on the seed area. The isolation region comprises a seed area including a first semiconductor material. The heterogeneous layer comprises a second semiconductor material that has a lattice constant different from that of the first semiconductor material.
    Type: Grant
    Filed: August 20, 2020
    Date of Patent: July 23, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yueh-Chuan Lee, Shih-Hsien Huang, Chia-Chan Chen, Pu-Fang Chen
  • Patent number: 11934107
    Abstract: Embodiments described herein relate to methods of forming layers using maskless based lithography. In these embodiments, the methods implement ladders of dose change such that a geometric shape can be divided into overlaying sections. The overlaying sections can include a different dose of each section such that taper control can be achieved. The taper can be achieved by manipulating the geometry “mask data” into overlaying sections that are exposed by various doses controlled by pixel blending (PB) exposure techniques. To perform the methods described herein, a maskless lithography tool is used. The maskless lithography tool includes a controller that performs software based “mask data” manipulation.
    Type: Grant
    Filed: October 9, 2019
    Date of Patent: March 19, 2024
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Shih-Hsien Lee, Tingwei Chiu, Frederick Lie, Jang Fung Chen
  • Publication number: 20240077805
    Abstract: Embodiments described herein relate to methods of forming layers using maskless based lithography. In these embodiments, the methods implement ladders of dose change such that a geometric shape can be divided into overlaying sections. The overlaying sections can include a different dose of each section such that taper control can be achieved. The taper can be achieved by manipulating the geometry “mask data” into overlaying sections that are exposed by various doses controlled by pixel blending (PB) exposure techniques. To perform the methods described herein, a maskless lithography tool is used. The maskless lithography tool includes a controller that performs software based “mask data” manipulation.
    Type: Application
    Filed: October 9, 2019
    Publication date: March 7, 2024
    Inventors: Shih-Hsien LEE, Tingwei CHIU, Frederick LIE, Jang Fung CHEN
  • Patent number: 10928743
    Abstract: Embodiments herein beneficially enable simultaneous processing of a plurality of substrates in a digital direct write lithography processing system. In one embodiment a method of processing a plurality of substrate includes positioning a plurality of substrates on a substrate carrier of a processing system, positioning the substrate carrier under the plurality of optical modules, independently leveling each of the plurality of substrates, determining offset information for each of the plurality of substrates, generating patterning instructions based on the offset information for each of the plurality of substrates, and patterning each of the plurality of substrates using the plurality of optical modules. The processing system comprises a base, a motion stage disposed on the base, the substrate carrier disposed on the motion stage, a bridge disposed above a surface of the base and separated therefrom, and a plurality of optical modules disposed on the bridge.
    Type: Grant
    Filed: March 19, 2019
    Date of Patent: February 23, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Chien-Hua Lai, Chia-Hung Kao, Hsiu-Jen Wang, Shih-Hao Kuo, Yi-Sheng Liu, Shih-Hsien Lee, Ching-Chang Chen, Tsu-Hui Yang
  • Publication number: 20190369499
    Abstract: Embodiments herein beneficially enable simultaneous processing of a plurality of substrates in a digital direct write lithography processing system. In one embodiment a method of processing a plurality of substrate includes positioning a plurality of substrates on a substrate carrier of a processing system, positioning the substrate carrier under the plurality of optical modules, independently leveling each of the plurality of substrates, determining offset information for each of the plurality of substrates, generating patterning instructions based on the offset information for each of the plurality of substrates, and patterning each of the plurality of substrates using the plurality of optical modules. The processing system comprises a base, a motion stage disposed on the base, the substrate carrier disposed on the motion stage, a bridge disposed above a surface of the base and separated therefrom, and a plurality of optical modules disposed on the bridge.
    Type: Application
    Filed: March 19, 2019
    Publication date: December 5, 2019
    Inventors: Chien-Hua LAI, Chia-Hung KAO, Hsiu-Jen WANG, Shih-Hao KUO, Yi-Sheng LIU, Shih-Hsien LEE, Ching-Chang CHEN, Tsu-Hui YANG
  • Publication number: 20110259028
    Abstract: A temperature regulating device includes a C-shape portion, at least a solar panel and a small fan. A space is provided in the C-shape portion. Several outlets are disposed on top of the C-shape portion. Several inlets are disposed on the bottom of the C-shape portion and are in fluid communication with the space. The solar panel is disposed on the outer side of the C-shape portion to absorb sunlight so as to convert it to electricity. The small fan is electrically connected with the solar panel and is disposed in a space of the C-shape portion. Therefore, a user may wear the device and uses the solar panel to generate electricity. The device is easy to carry and use and is environmentally friendly.
    Type: Application
    Filed: April 27, 2010
    Publication date: October 27, 2011
    Inventor: Shih-Hsien LEE