Patents by Inventor Shih Hsin Wu

Shih Hsin Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250085460
    Abstract: A lens assembly with a high uniform rectangular focused halo comprises: a first lens and an adjacent second lens. The first lens includes a first incident surface, a first non-spherical surface, and a first convex array emitting surface. The first incident surface contains a light source focus, and the first convex array emitting surface consists of multiple non-spherical convex arrays having rectangular openings. The second lens includes a second concave array incident surface and a second non-spherical surface emitting surface. The second concave array incident surface consists of multiple non-spherical concave arrays having rectangular openings corresponding to the first convex array emitting surface. The lens assembly provided by the present invention allows light to pass through only one total internal reflection lens and one flat convex lens so that the energy can be focused, while maintains an ultra-high optical efficiency.
    Type: Application
    Filed: February 8, 2024
    Publication date: March 13, 2025
    Inventors: Shih Hsin Ma, Jing Ting Wu
  • Publication number: 20250048706
    Abstract: A sidewall protection layer is formed on sidewall spacers of a dummy gate structure of a semiconductor device prior to etching an underlying fin structure to form a source/drain recess. The sidewall protection layer enables the profile of the source/drain recess to be precisely controlled so that etching into residual dummy gate material near the source/drain recess is minimized or prevented. The sidewall protection layer may be removed or retained in the semiconductor device after formation of the source/drain recess. The sidewall protection layer reduces the likelihood of the source/drain regions of the semiconductor device contacting the metal gate structures of the semiconductor device after the dummy gate structures are replaced with the metal gate structures. Thus, the sidewall protection layer reduces the likelihood of electrical shorting between the source/drain regions and the metal gate structures.
    Type: Application
    Filed: November 2, 2023
    Publication date: February 6, 2025
    Inventors: Tsung-Jui WU, Tsung-Yin HSU, Ying Ming WANG, Shih-Hao CHEN, Sung-Hsin YANG
  • Publication number: 20250034363
    Abstract: The present invention relates to a sizing agent composition, a sizing agent, a carbon fiber covered with the sizing agent, and a composite material. The sizing agent composition includes a polyamic acid and an alkali agent. The alkali agent has a specific molecular weight, and there is a specific molar ratio between the polyamic acid and the alkali agent, such that emulsification stability of the polyamic acid and thermal stability of a sizing layer consisting of the sizing agent are enhanced, thereby increasing interlayer bonding strength in the composite material that is made by the carbon fiber covered with the sizing agent.
    Type: Application
    Filed: June 21, 2024
    Publication date: January 30, 2025
    Inventors: Hsuan-Yin CHEN, Long-Tyan HWANG, Chien-Hsin WU, Ying-Chi HUANG, Chien-Jung WANG, Shih-Huang TUNG, Ru-Jong JENG
  • Patent number: 12204163
    Abstract: An optical system affixed to an electronic apparatus is provided, including a first optical module, a second optical module, and a third optical module. The first optical module is configured to adjust the moving direction of a first light from a first moving direction to a second moving direction, wherein the first moving direction is not parallel to the second moving direction. The second optical module is configured to receive the first light moving in the second moving direction. The first light reaches the third optical module via the first optical module and the second optical module in sequence. The third optical module includes a first photoelectric converter configured to transform the first light into a first image signal.
    Type: Grant
    Filed: February 5, 2024
    Date of Patent: January 21, 2025
    Assignee: TDK TAIWAN CORP.
    Inventors: Chao-Chang Hu, Chih-Wei Weng, Chia-Che Wu, Chien-Yu Kao, Hsiao-Hsin Hu, He-Ling Chang, Chao-Hsi Wang, Chen-Hsien Fan, Che-Wei Chang, Mao-Gen Jian, Sung-Mao Tsai, Wei-Jhe Shen, Yung-Ping Yang, Sin-Hong Lin, Tzu-Yu Chang, Sin-Jhong Song, Shang-Yu Hsu, Meng-Ting Lin, Shih-Wei Hung, Yu-Huai Liao, Mao-Kuo Hsu, Hsueh-Ju Lu, Ching-Chieh Huang, Chih-Wen Chiang, Yu-Chiao Lo, Ying-Jen Wang, Shu-Shan Chen, Che-Hsiang Chiu
  • Patent number: 7604945
    Abstract: A gene related to a susceptibility of infection and asthma—the Protein-Tyrosine Phosphatase Receptor-type Delta (PTPRD) gene—a method of detecting the asthma-associated gene, a method of predicting the occurrence of asthma, a method of identifying asthma-associated alleles in PTPRD gene, a method of screening PTPRD for drugs useful in the treatment of asthma, and antibodies specific for PTPRD variants and their use in diagnostic assays.
    Type: Grant
    Filed: January 23, 2008
    Date of Patent: October 20, 2009
    Assignee: Vita Genomics, Inc.
    Inventors: Shih Hsin Wu, Ellson Ye-Shyon Chen
  • Publication number: 20080187932
    Abstract: A gene related to a susceptibility of infection and asthma—the Protein-Tyrosine Phosphatase Receptor-type Delta (PTPRD) gene—a method of detecting the asthma-associated gene, a method of predicting the occurrence of asthma, a method of identifying asthma-associated alleles in PTPRD gene, a method of screening PTPRD for drugs useful in the treatment of asthma, and antibodies specific for PTPRD variants and their use in diagnostic assays.
    Type: Application
    Filed: January 23, 2008
    Publication date: August 7, 2008
    Applicant: Vita Genomics, Inc.
    Inventors: Shih Hsin Wu, Ellson Ye-Shyon Chen
  • Publication number: 20040265832
    Abstract: By genotyping analysis in combination with Monte-Carlo estimation, a model for predicting an hepatitis B patient to response to interferon treatment is constructed. With this model, by selecting STR markers combination, the hepatitis B patients are divided into three groups comprising high response rate, ambiguous, and low response rate, respectively, and hence, predictions of treatment response for HBV patients, especially for interferon therapy, are obtained.
    Type: Application
    Filed: June 24, 2003
    Publication date: December 30, 2004
    Inventors: Lawrence Shih Hsin Wu, Lichih Huang, Cherry Guan Ju Lin, Julia Kuei Ting Yu, Ding-Shinn Chen, Pei-Jer Chen, Ming-Yang Lai, Shiou-Hwei Yeh