Patents by Inventor Shih-Hsuan Liu

Shih-Hsuan Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LIQUID CRYSTAL DISPLAY APPARATUS
    Publication number: 20140160388
    Abstract: A liquid crystal display device is provided. The device includes a liquid crystal display panel, a grey lever inversion compensation film and a light enhancement module. The liquid crystal display panel has a relatively high aperture ratio, a display side and a rear side. The grey level inversion compensation film is disposed on the liquid crystal display panel at the display side. The light enhancement module is disposed on the liquid crystal display panel at the rear side.
    Type: Application
    Filed: May 31, 2013
    Publication date: June 12, 2014
    Applicant: HannStar Display Corporation
    Inventors: Hsu-Ho Wu, Chia-Hua Yu, Feng-Wei Kuo, Shih-Hsuan Liu
  • LIQUID CRYSTAL DISPLAY APPARATUS
    Publication number: 20140160387
    Abstract: A liquid crystal display device is provided. The device includes a liquid crystal display panel, a grey lever inversion compensation film and a light enhancement module. The liquid crystal display panel has a relatively high aperture ratio, a display side and a rear side. The grey level inversion compensation film is disposed on the liquid crystal display panel at the display side. The light enhancement module is disposed on the liquid crystal display panel at the rear side.
    Type: Application
    Filed: December 10, 2012
    Publication date: June 12, 2014
    Applicant: HannStar Display Corporation
    Inventors: Hsu-Ho Wu, Chia Hua Yu, Feng-Wei Kuo, Shih-Hsuan Liu
  • Test photomask and compensation method using the same
    Publication number: 20060105250
    Abstract: A test photomask and a compensation method using the same are disclosed. The present invention employs several groups of parallel lines in the longitudinal direction and in the traverse direction on the test photomask to fabricate the test photomask. The parallel lines have different widths thereof and widths of pitches. Then, the differences of widths of these parallel lines and the difference of widths of pitches are determined so that widths of these parallel lines and pitches of the patterns are compensated.
    Type: Application
    Filed: April 26, 2005
    Publication date: May 18, 2006
    Inventor: Shih-Hsuan Liu