Patents by Inventor Shih-Hsun Chen

Shih-Hsun Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250078445
    Abstract: A judgment system, an electronic system, a judgment method, and a display method are provided. The judgment method includes: receiving an image by a feature acquisition module and obtaining a first key point coordinate, a second key point coordinate, and a size of a face box of a user by the feature acquisition module based on the image; and performing following steps by a judgment module: obtaining a judgment value based on an ordinate of the first key point coordinate, an ordinate of the second key point coordinate, and a size of the face box; and sending a rotation signal in response to that the judgment value satisfies a rotation condition.
    Type: Application
    Filed: May 21, 2024
    Publication date: March 6, 2025
    Applicant: REALTEK SEMICONDUCTOR CORP.
    Inventors: Chih-Yuan Koh, Chao-Hsun Yang, Shih-Tse Chen
  • Publication number: 20250064345
    Abstract: A gait evaluating system including a processor is provided. The processor identifies whether a gait type of the user belongs to a normal gait, a non-neuropathic gait or a neuropathic gait based on step feature values of a user and walking limb feature values of the user. In response to that the gait type of the user belongs to the non-neuropathic gait, the processor controls the display panel to display a first auxiliary information, a second auxiliary information, and a third auxiliary information. The first auxiliary information indicates a potential sarcopenia of the user. The second auxiliary information indicates a dietary guideline for muscle building and muscle strengthening. The third auxiliary information shows a motion instruction video for regaining or maintaining muscle strength of the user.
    Type: Application
    Filed: October 18, 2024
    Publication date: February 27, 2025
    Applicant: Industrial Technology Research Institute
    Inventors: Je-Ping Hu, Keng-Hsun Lin, Shih-Fang Yang Mao, Pin-Chou Li, Jian-Hong Wu, Szu-Ju Li, Hui-Yu Cho, Yu-Chang Chen, Yen-Nien Lu, Jyun-Siang Hsu, Nien-Ya Lee, Kuan-Ting Ho, Ming-Chieh Tsai, Ching-Yu Huang
  • Patent number: 12235586
    Abstract: Impurities in a liquefied solid fuel utilized in a droplet generator of an extreme ultraviolet photolithography system are removed from vessels containing the liquefied solid fuel. Removal of the impurities increases the stability and predictability of droplet formation which positively impacts wafer yield and droplet generator lifetime.
    Type: Grant
    Filed: August 7, 2023
    Date of Patent: February 25, 2025
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Cheng-Hao Lai, Ming-Hsun Tsai, Hsin-Feng Chen, Wei-Shin Cheng, Yu-Kuang Sun, Cheng-Hsuan Wu, Yu-Fa Lo, Shih-Yu Tu, Jou-Hsuan Lu, Shang-Chieh Chien, Li-Jui Chen, Heng-Hsin Liu
  • Publication number: 20250063789
    Abstract: A method for forming a semiconductor device structure includes forming nanostructures over a substrate. The method also includes forming a gate structure wrapped around the nanostructures. The method also includes forming source/drain epitaxial structures over opposite sides of the nanostructures. The method also includes forming a first interlayer dielectric structure over the source/drain epitaxial structures. The method also includes removing the first interlayer dielectric structure. The method also includes forming a recess in the source/drain epitaxial structures. The method also includes forming a silicide structure in the recess. The method also includes forming a second interlayer dielectric structure over the silicide structure.
    Type: Application
    Filed: August 15, 2023
    Publication date: February 20, 2025
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Fu-Hsiang SU, Ping-Chun WU, Je-Wei HSU, Hong-Chih CHEN, Chia-Hao KUO, Shih-Hsun CHANG
  • Publication number: 20250048704
    Abstract: A semiconductor device includes a semiconductor substrate, a plurality of metal portions, a plurality of nanosheet structures, and a plurality of isolation structures. The metal portions are disposed on the semiconductor substrate and are spaced apart from each other. The nanosheet structures are surrounded by the metal portions such that the nanosheet structures are spaced apart from each other. The isolation structures are disposed on the semiconductor substrate such that two adjacent ones of the metal portions are isolated from each other by a corresponding one of the isolation structures. Each of the isolation structures includes a first dielectric layer and an air gap surrounded by the first dielectric layer.
    Type: Application
    Filed: August 1, 2023
    Publication date: February 6, 2025
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Hong-Chih CHEN, Fu-Hsiang SU, Shih-Hsun CHANG, Chia-Hao KUO, Chih-Ting YEH
  • Publication number: 20240124591
    Abstract: Antibodies that specifically bind to CD47 and antibodies that specifically bind to PD-L1 are provided, as well as CD47/PD-L1 bispecific antibodies. Also provided are uses of these antibodies, and related compositions and methods.
    Type: Application
    Filed: May 18, 2023
    Publication date: April 18, 2024
    Applicant: Pfizer Inc.
    Inventors: Javier Fernando CHAPARRO RIGGERS, Shih-Hsun CHEN, Sheng DING, Pawel Kamil DOMINIK, Shahram SALEK-ARDAKANI, Jessica Lynn Stanfield, Thomas John VAN BLARCOM
  • Patent number: 11858879
    Abstract: Provided herein are, inter alia, compounds inhibiting poly(ADP-ribose) Glycohydrolase (PARG) in a cancer cell and methods of treating cancer using compounds of the invention.
    Type: Grant
    Filed: June 22, 2018
    Date of Patent: January 2, 2024
    Assignee: CITY OF HOPE
    Inventors: Xiaochun Yu, Shih-Hsun Chen, Yate-Ching Yuan, Hongzhi Li, David Horne
  • Patent number: 11702474
    Abstract: Antibodies that specifically bind to CD47 and antibodies that specifically bind to PD-L1 are provided, as well as CD47/PD-L1 bispecific antibodies. Also provided are uses of these antibodies, and related compositions and methods.
    Type: Grant
    Filed: December 14, 2020
    Date of Patent: July 18, 2023
    Assignee: Pfizer Inc.
    Inventors: Javier Fernando Chaparro Riggers, Shih-Hsun Chen, Sheng Ding, Pawel Kamil Dominik, Shahram Salek-Ardakani, Jessica Lynn Stanfield, Thomas John Van Blarcom
  • Publication number: 20230117438
    Abstract: An intelligent expanding similar word model system and a method thereof are provided. The system is operated in a database system host and includes: a character analysis unit, configured to combine a plurality of key word acoustic models with an interference sound key word test set into a key word forward test module; a candidate word generation unit, configured to generate a plurality of candidate word temporary acoustic models; a recognition rate processing unit, configured to generate a first candidate word acoustic model; a false waking-up rate processing unit, configured to generate a second candidate word acoustic model; and an adjustment unit, configured to combine the plurality of key word acoustic models with the second candidate word acoustic model into a similar word acoustic model.
    Type: Application
    Filed: October 14, 2022
    Publication date: April 20, 2023
    Inventors: Chin-Jung LIU, Shih-Hsun CHEN, Chih-Lung LIN
  • Publication number: 20220370606
    Abstract: The present disclosure describes combination therapies and uses thereof for the treatment of cancer. The combinations therapies include at least a first therapeutic agent and a second therapeutic agent.
    Type: Application
    Filed: December 18, 2019
    Publication date: November 24, 2022
    Applicant: Pfizer Inc.
    Inventors: Shih-Hsun CHEN, Luca MICCI, Cecilia Marianne ODERUP, Shahram SALEK-ARDAKANI, Jie WEI
  • Publication number: 20220002231
    Abstract: Provided herein are, inter alia, compounds inhibiting poly(ADP-ribose) Glycohydrolase (PARG) in a cancer cell and methods of treating cancer using compounds of the invention.
    Type: Application
    Filed: June 22, 2018
    Publication date: January 6, 2022
    Inventors: Xiaochun Yu, Shih-Hsun Chen, Yate-Ching Yuan, Hongzhi LI, David Horne
  • Publication number: 20210355103
    Abstract: Provided herein are, inter alia, methods of treating cancer using compounds of the invention.
    Type: Application
    Filed: July 25, 2019
    Publication date: November 18, 2021
    Inventors: Xiaochun Yu, Shih-Hsun Chen, David Horne, Jun Xie
  • Publication number: 20210179716
    Abstract: Antibodies that specifically bind to CD47 and antibodies that specifically bind to PD-L1 are provided, as well as CD47/PD-L1 bispecific antibodies. Also provided are uses of these antibodies, and related compositions and methods.
    Type: Application
    Filed: December 14, 2020
    Publication date: June 17, 2021
    Applicant: Pfizer Inc.
    Inventors: Javier Fernando CHAPARRO RIGGERS, Shih-Hsun CHEN, Sheng DING, Pawel Kamil DOMINIK, Shahram SALEK-ARDAKANI, Jessica Lynn Stanfield, Thomas John VAN BLARCOM
  • Publication number: 20200149146
    Abstract: A manufacturing method of a high entropy alloy (HEA) coating is provided. The manufacturing method of the HEA coating includes: melting a HEA material, wherein the HEA material comprises at least four metal elements, and the at least four elements are contained in the HEA material with substantially the same content; performing a gas atomization process on the molten HEA material to form HEA powders; and performing a plasma spray process to heat the HEA powders, and spray the heated HEA powders onto a target substrate.
    Type: Application
    Filed: January 22, 2019
    Publication date: May 14, 2020
    Applicant: National Taiwan University of Science and Technology
    Inventors: Shih-Hsun Chen, Kuei-Chung Cheng
  • Patent number: 8469274
    Abstract: A method for fast locating a decipherable pattern in an input image, which is characterized in utilizing an overly downscaled binary image to not only reduce computation time but also facilitate extraction of skeletons for fast and accurately locating pattern, is disclosed. First, a pre-process is applied to an input image to acquire a binary image downscaled n times, from which at least one skeleton corresponding to a decipherable pattern is extracted. Coordinate values of at least one pixel of each skeleton are respectively enlarged n1/2 times and used as the central points on the original image plane for establishing a plurality of detecting blocks with the identical size. Subsequently, a grading mechanism is employed to determine the corresponding detecting blocks of the decipherable pattern.
    Type: Grant
    Filed: October 23, 2009
    Date of Patent: June 25, 2013
    Assignees: Armorlink SH Corp., ICP Electronics, Inc.
    Inventors: Chun-Shun Tseng, Ya-Yun Jheng, Ming-Chi Jhuang, Shih-Hsun Chen, Hai-Peng Cheng, Te-Heng Hsiang, Jung-Hua Wang
  • Publication number: 20100163632
    Abstract: A method for fast locating a decipherable pattern in an input image, which is characterized in utilizing an overly downscaled binary image to not only reduce computation time but also facilitate extraction of skeletons for fast and accurately locating pattern, is disclosed. First, a pre-process is applied to an input image to acquire a binary image downscaled n times, from which at least one skeleton corresponding to a decipherable pattern is extracted. Coordinate values of at least one pixel of each skeleton are respectively enlarged n1/2 times and used as the central points on the original image plane for establishing a plurality of detecting blocks with the identical size. Subsequently, a grading mechanism is employed to determine the corresponding detecting blocks of the decipherable pattern.
    Type: Application
    Filed: October 23, 2009
    Publication date: July 1, 2010
    Inventors: Chun-Shun Tseng, Ya-Yun Jheng, Ming-Chi Jhuang, Shih-Hsun Chen, Hai-Peng Cheng, Te-Heng Hsiang, Jung-Hua Wang
  • Patent number: 7147534
    Abstract: A patterned carbon nanotube process adopted for an electronic device is described. A negative photoresist layer is coated on a cathode substrate. A mask layer is formed with a carved cavity therein during a development process. A carbon nanotube spray is sprayed thereon to fill the carved cavity with a plurality of carbon nanotubes. The cathode substrate is sintered at a high temperature or in a vacuum to remove the mask layer and part of the carbon nanotubes adhered to the mask layer simultaneously, and to connect the rest of the carbon nanotubes firmly to the cathode conductive layer as an electron emitter layer with high resolution for increasing current density and uniformity of illumination of the electronic device.
    Type: Grant
    Filed: June 4, 2004
    Date of Patent: December 12, 2006
    Assignee: Teco Nanotech Co., Ltd.
    Inventors: Shih-Hsun Chen, Chun-Yen Hsiao, Shih-Chien Hsiao, Shie-Heng Lee, Kuei-Wen Cheng
  • Publication number: 20060051885
    Abstract: A method of fabricating a gate mask of a tetra-polar field-emission display. A focus metal mask having a plurality of windows is formed. A low-viscosity and water-soluble high molecular solution is coated on the focus metal mask to form a viscous interface. A first low-temperature drying process is performed allow the viscous interface dried up into a film. An insulating material is then formed on the film of viscous interface by screen printing. A sintering process is performed to remove the viscous interface, so as to crystallize the insulating material on the focus metal mask.
    Type: Application
    Filed: September 3, 2004
    Publication date: March 9, 2006
    Inventors: Jui-Ting Hsu, Jia-Hung Wu, Pu-Hsin Chang, Shih-Hsun Chen, Shih-Chien Hsiao
  • Publication number: 20050272342
    Abstract: A patterned carbon nanotube process adopted for an electronic device is described. A negative photoresist layer is coated on a cathode substrate. A mask layer is formed with a carved cavity therein during a development process. A carbon nanotube spray is sprayed thereon to fill the carved cavity with a plurality of carbon nanotubes. The cathode substrate is sintered at a high temperature or in a vacuum to remove the mask layer and part of the carbon nanotubes adhered to the mask layer simultaneously, and to connect the rest of the carbon nanotubes firmly to the cathode conductive layer as an electron emitter layer with high resolution for increasing current density and uniformity of illumination of the electronic device.
    Type: Application
    Filed: June 4, 2004
    Publication date: December 8, 2005
    Inventors: Shih-Hsun Chen, Chun-Yen Hsiao, Shih-Chien Hsiao, Shie-Heng Lee, Kuei-Wen Cheng
  • Patent number: 6504317
    Abstract: A ceiling lamp brightness control device includes a zipper switch, a power element and a control circuit. By the positioning of the zipper switch, a specific time clock waveform is generated by triggering a diode so that the power element is conducted in a specific time of an AC waveform. Thereby, the brightness of the ceiling lamp can be adjusted step by step.
    Type: Grant
    Filed: August 14, 2001
    Date of Patent: January 7, 2003
    Inventor: Shih Hsun Chen