Abstract: In an embodiment, a method of forming a structure includes forming a first transistor and a second transistor over a first substrate; forming a front-side interconnect structure over the first transistor and the second transistor; etching at least a backside of the first substrate to expose the first transistor and the second transistor; forming a first backside via electrically connected to the first transistor; forming a second backside via electrically connected to the second transistor; depositing a dielectric layer over the first backside via and the second backside via; forming a first conductive line in the dielectric layer, the first conductive line being a power rail electrically connected to the first transistor through the first backside via; and forming a second conductive line in the dielectric layer, the second conductive line being a signal line electrically connected to the second transistor through the second backside via.

Abstract: A container of coolant used in a NIKON.TM. stepper is utilizing a screw cap to air-tightly close a coolant inlet of the container of coolant. The container of coolant is a closed system except the coolant inlet, a circulative input duct and a circulative output duct.

Abstract: A container of coolant used in a NIKON.TM. stepper is utilizing a transparent duct mounted on a side of the container of coolant to check a liquid level. The container of coolant can be conventional or other similar container of coolant.

Abstract: A photoresist dispensing system used in a photoresist coating machine includes a pump, a switch valve, a sucking-back valve, a solenoid valve, a first set of speed controllers a second set of speed controllers and a sucking-back speed controller. The pump is used to transport liquid photoresist to a wafer through the switch valve. The sucking-back valve is controlled by solenoid valve through the sucking-back speed controller to produce or release a sucking force on the liquid photoresist to prevent it from undesired dropping onto the wafer. The solenoid valve also controls the switch valve and the pump to start or stop photoresist dispensing. The first set of speed controllers is coupled between the switch valve and the solenoid valve and the second set of speed controller is coupled between the pump and the solenoid valve.