Patents by Inventor Shih-Hua Kuo

Shih-Hua Kuo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Highly efficient automatic particle cleaner method for EUV systems
    Patent number: 11953839
    Abstract: In a method of cleaning a lithography system, during idle mode, a stream of air is directed, through a first opening, into a chamber of a wafer table of an EUV lithography system. One or more particles is extracted by the directed stream of air from surfaces of one or more wafer chucks in the chamber of the wafer table. The stream of air and the extracted one or more particle are drawn, through a second opening, out of the chamber of the wafer table.
    Type: Grant
    Filed: December 5, 2022
    Date of Patent: April 9, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Shih-Yu Tu, Shao-Hua Wang, Yen-Hao Liu, Chueh-Chi Kuo, Li-Jui Chen, Heng-Hsin Liu
  • Chamfered Die of Semiconductor Package and Method for Forming the Same
    Publication number: 20240088050
    Abstract: A semiconductor device includes a die, an encapsulant over a front-side surface of the die, a redistribution structure on the encapsulant, a thermal module coupled to the back-side surface of the die, and a bolt extending through the redistribution structure and the thermal module. The die includes a chamfered corner. The bolt is adjacent to the chamfered corner.
    Type: Application
    Filed: November 20, 2023
    Publication date: March 14, 2024
    Inventors: Chen-Hua Yu, Wei-Kang Hsieh, Shih-Wei Chen, Tin-Hao Kuo, Hao-Yi Tsai
  • Method and apparatus for generating featured test pattern
    Patent number: 10067186
    Abstract: An method of generating a featured scan pattern for test includes: providing a plurality of predetermined test patterns to perform test on a plurality of devices under test (DUT) under a stress condition to generate a plurality of test responses of each DUT; grouping a plurality of specific test responses of each DUT from the test responses of each DUT to determine a feature value corresponding to a failure feature for each DUT; and generating at least one featured test pattern according to the feature value of each DUT.
    Type: Grant
    Filed: September 10, 2016
    Date of Patent: September 4, 2018
    Assignee: MEDIATEK INC.
    Inventors: Harry Hai Chen, Shih-Hua Kuo, Chih-Sheng Tung
  • METHOD AND APPARATUS FOR GENERATING FEATURED TEST PATTERN
    Publication number: 20160377678
    Abstract: An method of generating a featured scan pattern for test includes: providing a plurality of predetermined test patterns to perform test on a plurality of devices under test (DUT) under a stress condition to generate a plurality of test responses of each DUT; grouping a plurality of specific test responses of each DUT from the test responses of each DUT to determine a feature value corresponding to a failure feature for each DUT; and generating at least one featured test pattern according to the feature value of each DUT.
    Type: Application
    Filed: September 10, 2016
    Publication date: December 29, 2016
    Inventors: Harry Hai Chen, Shih-Hua Kuo, Chih-Sheng Tung
  • Method and apparatus for generating featured scan pattern
    Patent number: 9465071
    Abstract: An method of generating a featured scan pattern for scan test includes: providing a plurality of predetermined scan patterns to perform scan test on a plurality of devices under test (DUT) under a stress condition to generate a plurality of test responses of each DUT; grouping a plurality of specific test responses of each DUT from the test responses of each DUT to determine a feature value corresponding to a failure feature for each DUT; and generating at least one featured scan pattern according to the feature value of each DUT.
    Type: Grant
    Filed: March 3, 2015
    Date of Patent: October 11, 2016
    Assignee: MEDIATEK INC.
    Inventors: Harry Hai Chen, Shih-Hua Kuo, Chih-Sheng Tung
  • METHOD AND APPARATUS FOR GENERATING FEATURED SCAN PATTERN
    Publication number: 20150253384
    Abstract: An method of generating a featured scan pattern for scan test includes: providing a plurality of predetermined scan patterns to perform scan test on a plurality of devices under test (DUT) under a stress condition to generate a plurality of test responses of each DUT; grouping a plurality of specific test responses of each DUT from the test responses of each DUT to determine a feature value corresponding to a failure feature for each DUT; and generating at least one featured scan pattern according to the feature value of each DUT.
    Type: Application
    Filed: March 3, 2015
    Publication date: September 10, 2015
    Inventors: Harry Hai Chen, Shih-Hua Kuo, Chih-Sheng Tung