Abstract: The present disclosure provides a method of manufacturing a semiconductor structure. The method includes providing a substrate; depositing a mask layer over the substrate; forming a mandrel pattern over the mask layer; forming a spacer pattern around the mandrel pattern; removing the mandrel pattern; and applying at least one directional etching operation along a first direction to etch two opposing ends of the spacer pattern and form a first spacer feature and a second spacer feature apart from each other.

Abstract: Various embodiments of the present disclosure are directed towards an integrated chip including a substrate comprising first opposing sidewalls defining a first trench and second opposing sidewalls defining a second trench laterally offset from the first trench. A stack of layers comprises a plurality of conductive layers and a plurality of dielectric layers alternatingly stacked with the conductive layers. The stack of layers comprises a first segment in the first trench and a second segment in the second trench. A first lateral distance between the first segment and the second segment aligned with a first surface of the substrate is greater than a second lateral distance between the first segment and the second segment below the first surface of the substrate.

Abstract: A weeder robot includes a movable carrier and a blade module assembled to the movable carrier. The movable carrier includes a map creating module and a control module that is electrically coupled to the blade module and the map creating module. The map creating module includes an infrared unit and a vision sensing unit. The infrared unit can emit and receive an infrared light. The vision sensing unit can obtain an image information in a non-contact manner. The movable carrier can be used to move in a court, so that the map creating module can generate a three-dimensional (3D) court map through cooperation between the infrared unit and the vision sensing unit. When the weeder robot performs a maintenance process, the control module drives the blade module to weed a portion of a lawn higher than a predetermined height according to the 3D court map.

Abstract: For a metal gate replacement integration scheme, the present disclosure describes removing a polysilicon gate electrode with a highly selective wet etch chemistry without damaging surrounding layers. For example, the wet etch chemistry can include one or more alkaline solvents with a steric hindrance amine structure, a buffer system that includes tetramethylammonium hydroxide (TMAH) and monoethanolamine (MEA), one or more polar solvents, and water.

Abstract: For a metal gate replacement integration scheme, the present disclosure describes removing a polysilicon gate electrode with a highly selective wet etch chemistry without damaging surrounding layers. For example, the wet etch chemistry can include one or more alkaline solvents with a steric hindrance amine structure, a buffer system that includes tetramethylammonium hydroxide (TMAH) and monoethanolamine (MEA), one or more polar solvents, and water.

Abstract: For a metal gate replacement integration scheme, the present disclosure describes removing a polysilicon gate electrode with a highly selective wet etch chemistry without damaging surrounding layers. For example, the wet etch chemistry can include one or more alkaline solvents with a steric hindrance amine structure, a buffer system that includes tetramethylammonium hydroxide (TMAH) and monoethanolamine (MEA), one or more polar solvents, and water.

Abstract: For a metal gate replacement integration scheme, the present disclosure describes removing a polysilicon gate electrode with a highly selective wet etch chemistry without damaging surrounding layers. For example, the wet etch chemistry can include one or more alkaline solvents with a steric hindrance amine structure, a buffer system that includes tetramethylammonium hydroxide (TMAH) and monoethanolamine (MEA), one or more polar solvents, and water.

Abstract: A method of applying a protective coating to a substrate includes applying a surface treatment to edges of the substrate to increase surface wettability of the edges and/or preheating the substrate. A curable coating material is applied to the edges. Then, the substrate is spun to adjust a thickness and uniformity of the curable coating material applied on the substrate edges. The curable coating material is cured to form the protective coating on the substrate edges.

Abstract: A method of edge coating a batch of glass articles includes printing masks on surfaces of a glass sheet, where at least one of the masks is a patterned mask defining a network of separation paths. The glass sheet with the printed masks is divided into multiple glass articles along the separation paths. For at least a batch of the glass articles, the edges of the glass articles in the batch are finished to reduce roughness at the edges. Each finished edge is then etched with an etching medium to reduce and/or blunt flaws in the finished edge. A curable coating is simultaneously applied to the etched edges. The curable coatings are pre-cured. Then, the printed masks are removed from the glass articles with the curable coatings. After removing the printed masks, the pre-cured curable coatings are post-cured.