Patents by Inventor Shih-Sian Yang

Shih-Sian Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10756121
    Abstract: A conductor structure includes a first metal layer, a second metal layer, and a controlling layer. The second metal layer is disposed on the first metal layer. A material of the first metal layer and a material of the second metal layer include at least one identical metal element. The controlling layer is disposed between the first metal layer and the second metal layer. A thickness of the controlling layer is less than a thickness of the first metal layer, and the thickness of the controlling layer is less than a thickness of the second metal layer.
    Type: Grant
    Filed: February 26, 2018
    Date of Patent: August 25, 2020
    Assignee: Innolux Corporation
    Inventors: Ming-Chun Chen, Hsu-Min Huang, Shih-Sian Yang
  • Publication number: 20180261629
    Abstract: A conductor structure includes a first metal layer, a second metal layer, and a controlling layer. The second metal layer is disposed on the first metal layer. A material of the first metal layer and a material of the second metal layer include at least one identical metal element. The controlling layer is disposed between the first metal layer and the second metal layer. A thickness of the controlling layer is less than a thickness of the first metal layer, and the thickness of the controlling layer is less than a thickness of the second metal layer.
    Type: Application
    Filed: February 26, 2018
    Publication date: September 13, 2018
    Applicant: Innolux Corporation
    Inventors: Ming-Chun Chen, Hsu-Min Huang, Shih-Sian Yang