Abstract: A material cutting and grinding device is provided. The material cutting and grinding device includes a shaft, a rotor assembly, a cutting grinding sheet, a fixture and a channel set. The rotor assembly includes a housing, a rotor, an air intake opening, blades and accommodating grooves. The rotor is accommodated in a holding groove of the housing. The rotor is sleeved on the shaft. The accommodating grooves are passed through the rotor. The blades are passed through the accommodating grooves. The cutting grinding sheet is connected to the other end of the shaft. The fixture clamps the cutting grinding sheet. The channel set includes a shaft channel and a gas channel. The shaft channel is passing through the shaft. The gas channel is disposed on the fixture. The gas channel is connected to the shaft channel.

Abstract: A method of manufacturing a semiconductor structure includes providing a substrate and a photoresist over the substrate; placing a mask over the photoresist; exposing the photoresist to a predetermined electromagnetic radiation through the mask; and removing at least a portion of the photoresist exposed to the predetermined electromagnetic radiation. The mask includes a first portion configured to totally allow the predetermined electromagnetic radiation passing through, a second portion configured to partially allow the predetermined electromagnetic radiation passing through, and a third portion configured to block the predetermined electromagnetic radiation, the second portion is disposed between the first portion and the third portion.

Abstract: A method of manufacturing a semiconductor structure includes providing a substrate and a photoresist over the substrate; placing a mask over the photoresist; exposing the photoresist to a predetermined electromagnetic radiation through the mask; and removing at least a portion of the photoresist exposed to the predetermined electromagnetic radiation. The mask includes a first portion configured to totally allow the predetermined electromagnetic radiation passing through, a second portion configured to partially allow the predetermined electromagnetic radiation passing through, and a third portion configured to block the predetermined electromagnetic radiation, the second portion is disposed between the first portion and the third portion.

Abstract: An examination container includes a main body, a cover and a carrier stage. The main body has an accommodating trough for holding a sample. The cover is detachably connected to the main body to close the accommodating trough. The cover has a first through-hole penetrating through an outer surface and an inner surface of the cover, and includes a membrane arranging on the inner surface of the cover. The membrane has a second through-hole opposite to the first through-hole for passing an electron beam through the first through hole and the second through hole. The carrier stage is installed in a position corresponding to the second through-hole. The carrier stage is detachably arranged in the accommodating trough for a variety of examination purposes. An electron microscope using the abovementioned examination container is also disclosed.

Abstract: An examination container includes a main body, a membrane assembly and a cover. The main body has an accommodating trough for holding sample. The membrane assembly covers an opening end of the accommodating trough. The membrane assembly includes a support body and a membrane. The support body has a first surface and a second surface, wherein the support body is flat and has a first through-hole penetrating through the first surface and the second surface. The membrane is arranged on the second surface side of the support body and has a second through-hole. The second through-hole is opposite to the first through-hole and allows a charged particle beam to pass the second through-hole. The cover is detachably connected to the main body to secure the membrane assembly. The membrane assembly is easy to replace and uses less consumables. An electron microscope using the abovementioned examination container is also disclosed.

Abstract: An examination container includes a main body, a membrane assembly and a cover. The main body has an accommodating trough for holding sample. The membrane assembly covers an opening end of the accommodating trough. The membrane assembly includes a support body and a membrane. The support body has a first surface and a second surface, wherein the support body is flat and has a first through-hole penetrating through the first surface and the second surface. The membrane is arranged on the second surface side of the support body and has a second through-hole. The second through-hole is opposite to the first through-hole and allows a charged particle beam to pass the second through-hole. The cover is detachably connected to the main body to secure the membrane assembly. The membrane assembly is easy to replace and uses less consumables. An electron microscope using the abovementioned examination container is also disclosed.

Abstract: An examination container includes a main body, a cover and a carrier stage. The main body has an accommodating trough for holding a sample. The cover is detachably connected to the main body to close the accommodating trough. The cover has a first through-hole penetrating through an outer surface and an inner surface of the cover, and includes a membrane arranging on the inner surface of the cover. The membrane has a second through-hole opposite to the first through-hole for passing a charged particle beam through the first through hole and the second through hole. The carrier stage is installed in a position corresponding to the second through-hole. The carrier stage is detachably arranged in the accommodating trough for a variety of examination purposes. An electron microscope using the abovementioned examination container is also disclosed.

Abstract: An electron microscope includes a charged particle beam generator, a detector, a film and a bearing unit. The charged particle beam generator generates a first charged particle beam to bomb an object. The detector detects a second charged particle from the object to form an image. The film disposes on downstream of charged particle beam generator and has a first surface and a second surface. A space between charged particle beam generator and the first surface of film is a vacuum environment. The bearing unit disposes at a side of second surface of film and has a bearing surface and a back surface. The object disposes on the bearing surface of the bearing unit and a distance between an analyzed surface of the object and the film is less than a predetermined spacing. A liquid space exists between the analyzed surface and the film to be filled a liquid.