Abstract: Air curtain devices can reduce defects on semiconductor wafers when implemented on a track equipped with robotic wafer transport. The air curtain devices can be added to one or more processing devices arranged along the track to prevent defects from landing on wafer surfaces. For example, the air curtain devices can prevent volatile organic solvent mist from drifting towards processing devices on the track and preventing contamination via a wafer transport system.

Abstract: Air curtain devices can reduce defects on semiconductor wafers when implemented on a track equipped with robotic wafer transport. The air curtain devices can be added to one or more processing devices arranged along the track to prevent defects from landing on wafer surfaces. For example, the air curtain devices can prevent volatile organic solvent mist from drifting towards processing devices on the track and preventing contamination via a wafer transport system.

Abstract: Air curtain devices can reduce defects on semiconductor wafers when implemented on a track equipped with robotic wafer transport. The air curtain devices can be added to one or more processing devices arranged along the track to prevent defects from landing on wafer surfaces. For example, the air curtain devices can prevent volatile organic solvent mist from drifting towards processing devices on the track and preventing contamination via a wafer transport system.

Abstract: The present invention provides a heavy metal detecting device and the fabricating method thereof. The heavy metal detecting device includes a substrate and a nano-metal-particle array. The fabricating method of the heavy metal detecting device includes following steps of: (S1) preparing a substrate, cleaning the substrate with a first liquid, and drying the substrate with a first gas; (S2) soaking the substrate in a first solution; (S3) after soaking the substrate for a first period of time, cleaning and drying the substrate with the first liquid and the first gas respectively; (S4) soaking the substrate in a pre-synthesized nano-metal-particle solution; and (S5) after soaking the substrate for a second period of time, cleaning and drying the substrate with a second liquid and the first gas respectively. Compared to the prior arts, the heavy metal detecting device of the present invention has the advantages of simplicity and rapidity.

Abstract: The present invention provides a heavy metal detecting device and the fabricating method thereof. The heavy metal detecting device comprises a substrate and a nano-metal-particle array. The fabricating method of the heavy metal detecting device comprises following steps of: (S1) preparing a substrate, cleaning the substrate with a first liquid, and drying the substrate with a first gas; (S2) soaking the substrate in a first solution; (S3) after soaking the substrate for a first period of time, cleaning and drying the substrate with the first liquid and the first gas respectively; (S4) soaking the substrate in a pre-synthesized nano-metal-particle solution; and (S5) after soaking the substrate for a second period of time, cleaning and drying the substrate with a second liquid and the first gas respectively. Compared to the prior arts, the heavy metal detecting device of the present invention has the advantages of simplicity and rapidity.

Abstract: The present invention provides a heavy metal detecting device and the fabricating method thereof. The heavy metal detecting device comprises a substrate and a nano-metal-particle array. The fabricating method of the heavy metal detecting device comprises following steps of: (S1) preparing a substrate, cleaning the substrate with a first liquid, and drying the substrate with a first gas; (S2) soaking the substrate in a first solution; (S3) after soaking the substrate for a first period of time, cleaning and drying the substrate with the first liquid and the first gas respectively; (S4) soaking the substrate in a pre-synthesized nano-metal-particle solution; and (S5) after soaking the substrate for a second period of time, cleaning and drying the substrate with a second liquid and the first gas respectively. Compared to the prior arts, the heavy metal detecting device of the present invention has the advantages of simplicity and rapidity.

Abstract: The present invention provides a fiber base sensor and the fabricating method thereof. More specifically, one of the main goals of the present invention is to solve the problem existing in the prior art of the failure of forming a plurality of nano-particles on the surface of the fiber base sensor evenly by utilizing self-assembly process with the nano-imprint process. Furthermore, the another goal of the present invention is to provide detail parameters required in the said nano-imprinting process for avoiding the efficiency drop caused by over-embedding the nano-particles into the fiber based sensor.

Abstract: The present invention provides a fiber base sensor and the fabricating method thereof. More specifically, one of the main goals of the present invention is to solve the problem existing in the prior art of the failure of forming a plurality of nano-particles on the surface of the fiber base sensor evenly by utilizing self-assembly process with the nano-imprint process. Furthermore, the another goal of the present invention is to provide detail parameters required in the said nano-imprinting process for avoiding the efficiency drop caused by over-embedding the nano-particles into the fiber based sensor.