Abstract: A method includes forming a photoresist layer over a wafer; aligning a first photomask with a first area of the wafer; performing a first exposure process to a first portion of the photoresist layer within the first area of the wafer; aligning a second photomask with a second area of the wafer, wherein aligning the first photomask and aligning the second photomask are performed using an alignment mark within a stitching zone of the wafer, the stitching zone being an overlapping region of the first area and the second area; performing a second exposure process to a second portion of the photoresist layer within the second area of the wafer; and performing a development process to remove the first and second portions of the photoresist layer.

Abstract: A physical vapor deposition (PVD) target for performing a PVD process is provided. The PVD target includes a backing plate and a target plate coupled to the backing plate. The target plate includes a sputtering source material and a dopant, with the proviso that the dopant is not impurities in the sputtering source material. The sputtering source material includes a diffusion barrier material.

Abstract: Manufacturing method of semiconductor package includes following steps. Bottom package is provided. The bottom package includes a die and a redistribution structure electrically connected to die. A first top package and a second top package are disposed on a surface of the redistribution structure further away from the die. An underfill is formed into the space between the first and second top packages and between the first and second top packages and the bottom package. The underfill covers at least a side surface of the first top package and a side surface of the second top package. A hole is opened in the underfill within an area overlapping with the die between the side surface of the first top package and the side surface of the second top package. A thermally conductive block is formed in the hole by filling the hole with a thermally conductive material.

Abstract: A display may include an array of pixels such as light-emitting diode pixels. The pixels may include multiple circuitry decks that each include one or more circuit components such as transistors, capacitors, and/or resistors. The circuitry decks may be vertically stacked. Each circuitry deck may include a planarization layer formed from a siloxane material that conforms to underlying components and provides a planar upper surface. In this way, circuitry components may be vertically stacked to mitigate the size of each pixel footprint. The circuitry components may include capacitors that include both a high-k dielectric layer and a low-k dielectric layer. The display pixel may include a via with a width of less than 1 micron.

Abstract: A method of forming a semiconductor device includes: forming a fin protruding above a substrate; forming isolation regions on opposing sides of the fin; forming a dummy gate over the fin; reducing a thickness of a lower portion of the dummy gate proximate to the isolation regions, where after reducing the thickness, a distance between opposing sidewalls of the lower portion of the dummy gate decreases as the dummy gate extends toward the isolation regions; after reducing the thickness, forming a gate fill material along at least the opposing sidewalls of the lower portion of the dummy gate; forming gate spacers along sidewalls of the dummy gate and along sidewalls of the gate fill material; and replacing the dummy gate with a metal gate.

Abstract: A gait evaluating system including a processor is provided. The processor identifies whether a gait type of the user belongs to a normal gait, a non-neuropathic gait or a neuropathic gait based on step feature values of a user and walking limb feature values of the user. In response to that the gait type of the user belongs to the non-neuropathic gait, the processor controls the display panel to display a first auxiliary information, a second auxiliary information, and a third auxiliary information. The first auxiliary information indicates a potential sarcopenia of the user. The second auxiliary information indicates a dietary guideline for muscle building and muscle strengthening. The third auxiliary information shows a motion instruction video for regaining or maintaining muscle strength of the user.

Abstract: A fabricating method of a non-enzyme sensor element includes a printing step, a coating step and an electroplating step. In the printing step, a conductive material is printed on a surface of a substrate to form a working electrode, a reference electrode and an auxiliary electrode, and a porous carbon material is printed on the working electrode to form a porous carbon layer. In the coating step, a graphene film material is coated on the porous carbon layer of the working electrode to form a graphene layer. In the electroplating step, a metal is electroplated on the graphene layer by a pulse constant current to form a catalyst layer including a metal oxide.

Abstract: This disclosure is directed to a circuit that includes a substrate, a target device on the substrate, and an electrostatic discharge (ESD) device electrically coupled to the target device. The ESD device includes an ESD detection circuit electrically coupled to a first reference voltage supply and a second reference voltage supply, an inverter circuit electrically coupled to the ESD detection circuit and configured to trigger in response to an ESD event on the first or second reference voltage supply, a rectifier circuit electrically coupled to the inverter circuit and configured to rectify a current discharged from the inverter circuit, and a transistor electrically coupled to the rectifier circuit and configured to discharge a remaining current passing through the rectifier circuit.

Abstract: A metallization structure of an integrated circuit (IC) includes: an intermetal dielectric (IMD) layer; a patterned metal layer embedded in the IMD layer; a patterned top metal layer disposed on the IMD layer; electrical vias comprising via material passing through the IMD layer and connecting the patterned top metal layer and the patterned metal layer embedded in the IMD layer; and a metal-insulator-metal (MIM) capacitor. The MIM capacitor includes: a first capacitor metal layer comprising the via material contacting an MIM capacitor landing area of the patterned metal layer embedded in the IMD layer; a second capacitor metal layer comprising the via material contacting a first MIM capacitor terminal area of the patterned top metal layer; and an insulator layer disposed between the first capacitor metal layer and the second capacitor metal layer.

Abstract: A semiconductor fabrication method includes: forming an epitaxial stack including at least one sacrificial epitaxial layer and at least one channel epitaxial layer; forming a plurality of fins in the epitaxial stack; performing tuning operations to prevent a width of the sacrificial epitaxial layer expanding beyond a width of the channel epitaxial layer during operations to form isolation features; forming the isolation features between the plurality of fins, wherein the width of the sacrificial epitaxial layer does not expand beyond the width of the channel epitaxial layer; forming a sacrificial gate stack; forming gate sidewall spacers on sidewalls of the sacrificial gate stack; forming inner spacers around the sacrificial epitaxial layer and the channel epitaxial layer; forming source/drain features; removing the sacrificial gate stack and sacrificial epitaxial layer; and forming a replacement metal gate, wherein the metal gate is shielded from the source/drain features.

Abstract: In a method of cleaning a lithography system, during idle mode, a stream of air is directed, through a first opening, into a chamber of a wafer table of an EUV lithography system. One or more particles is extracted by the directed stream of air from surfaces of one or more wafer chucks in the chamber of the wafer table. The stream of air and the extracted one or more particle are drawn, through a second opening, out of the chamber of the wafer table.

Abstract: A method of forming a nanosheet FET is provided. A plurality of first and second semiconductor layers are alternately formed on a substrate. The first and second semiconductor layers are patterned into a plurality of stacks of semiconductor layers separate from each other by a space along a direction. Each stack of semiconductor layers has a cross-sectional view along the direction gradually widening towards the substrate. An epitaxial feature is formed in each of the spaces. The patterned second semiconductor layers are then removed from each of the stacks of semiconductor layers.

Abstract: Example methods and systems to identify a suspicious cytology specimen including target cells have been disclosed. One example method includes obtaining a first image associated with a first region of the cytology specimen through a first object lens, obtaining a second set of one or more images associated with a first subregion of the first region through a second object lens, identifying a first number of target cells and determining whether the first number is greater than a threshold number. In response that the first number is greater than the threshold number, the example method prompts an alert. Otherwise, the example method further includes obtaining a third set of one or more images associated with a second subregion through the second object lens and identifying a second number of the target cells associated with the second subregion.

Abstract: The present invention relates to a reaction platform, which comprises: a machine body with a bottom plate for placing non-porous substrates; and a coater module configured on the top of the machine body and capable of maintaining a preset of a predetermined height for moving along the surface of non-porous substrate, wherein the coater module has one or more slits, and a target liquid can be directly injected or sucking in from the outside of the coater module through the slit, and spreading the target liquid onto a surface of the non-porous substrate while moving along the non-porous substrate; wherein the surface of the non-porous substrate has a target to be coated. The reaction platform of the present invention can not only save time, labor and cost, but also have accurate and reproducible experimental results, showing better results than traditional methods.

Abstract: A video encoding method includes: during a first period, performing an encoding process upon a first block group of a current frame to generate a first block group bitstream; and during a second period, transmitting a second block group bitstream derived from encoding a second block group of the current frame, wherein the second period overlaps the first period. The encoding process includes: during a first time segment of the first period, performing a first in-loop filtering process upon a first group of pixels; and during a second time segment of the first period, performing a second in-loop filtering process upon a second group of pixels, wherein the second time segment overlaps the first time segment, and a non-zero pixel distance exists between a first edge pixel of the first group of pixels and a second edge pixel of the second group of pixels in a filter direction.

Abstract: A method of expanding natural killer cells, comprising: providing a population of internally gelated cells, each of which includes a gelated interior and a fluid cell membrane that contains one or more membrane-bound proteins each or collectively are capable of stimulating expansion of natural killer (NK) cells; and culturing a population of cells containing NK cells, which are capable of responding to the one or more membrane-bound proteins, with the population of internally gelated cells under conditions that allow expansion of NK cells.

Abstract: A convolutional neural network (CNN) and associated method for identifying basal cell carcinoma are disclosed. The CNN comprises two convolution layers, two pooling layers and at least one fully-connected layer. The first convolution layer uses initial Gabor filters that model the kernel parameters setting in advance based on human professional knowledge. The method uses collagen fiber images for training images and converts doctors' knowledge to initiate the Gabor filters as featuring computerization. The invention provides better training performance in terms of training time consumption and training material overhead.

Abstract: Example methods and systems to obtain images associated with target cells distributed in a cytology specimen have been disclosed. One example method includes obtaining a first image associated with a first region of the cytology specimen through a first object lens, determining a first subregion of the first region, obtaining a second set of one or more images associated with the first subregion through a second object lens, identifying a third image from the first image, and in response to a ratio of a second number of the target cells in the second set of one or more images to the first number of the target cells in the third image being in a predetermined range, obtaining images associated with the target cells based on the second set of images.

Abstract: A video encoding method includes: during a first period, performing an encoding process upon a first block group of a current frame to generate a first block group bitstream; and during a second period, transmitting a second block group bitstream derived from encoding a second block group of the current frame, wherein the second period overlaps the first period. The encoding process includes: during a first time segment of the first period, performing a first in-loop filtering process upon a first group of pixels; and during a second time segment of the first period, performing a second in-loop filtering process upon a second group of pixels, wherein the second time segment overlaps the first time segment, and a non-zero pixel distance exists between a first edge pixel of the first group of pixels and a second edge pixel of the second group of pixels in a filter direction.

Abstract: Example methods and systems to obtain images associated with target cells distributed in a cytology specimen have been disclosed. One example method includes obtaining a first image associated with a first region of the cytology specimen through a first object lens, determining a first subregion of the first region, obtaining a second set of one or more images associated with the first subregion through a second object lens, identifying a third image from the first image, and in response to a ratio of a second number of the target cells in the second set of one or more images to the first number of the target cells in the third image being in a predetermined range, obtaining images associated with the target cells based on the second set of images.