Abstract: A solid oxide cell stack includes first and second interconnects, a solid oxide cell disposed between the first and second interconnects, and a porous metal foam between the first interconnect and the solid oxide cell, wherein the porous metal foam includes a carbon nanostructure formed on a surface thereof.

Abstract: A sterilizing device includes a pipe having an inlet and an outlet and allowing fluid to move therethrough and a light source provided on one side of the pipe and providing light to the fluid. At least a portion of the pipe is provided in a spiral shape and the inlet and/or the outlet are arranged in a light emitting region.

Abstract: Provided is a transfer chamber disposed between a buffer unit providing a space where wafers stay before being transferred, and process chambers each providing a space where a wafer processing process is performed, to transfer the wafers, the transfer chamber including a main robot for transferring the wafers between the buffer unit and the process chambers, or between the process chambers, a guide rail connected to the main robot to move the main robot, and a frame defining a space where the main robot and the guide rail of the transfer chamber operate, wherein a plurality of closers are connected to the frame to close a plurality of opening regions formed by the frame.

Abstract: Provided is a gas exhaust apparatus for expelling a gas in a treatment space of a wafer treatment apparatus to outside, the gas exhaust apparatus including a main exhaust line connected to the treatment space, and an auxiliary exhaust line having an end connected to the main exhaust line to supply an external air current to the main exhaust line, wherein an automatic closer is disposed at another end of the auxiliary exhaust line to close the other end of the auxiliary exhaust line in a specific situation.

Abstract: The inventive concept provides a substrate treating apparatus.

Abstract: Provided are a guide pin configured to support a corner of a photo mask using a double slide structure, a photo mask supporting unit including the same, and a photo mask cleaning apparatus including the same. The photo mask supporting unit includes a supporting plate, a supporting shaft which supports the supporting plate from under the supporting plate, a supporting plate driver configured to rotate the supporting plate, and a guide pin provided as a plurality of guide pins on the supporting plate to support a photo mask and including at least one column protruding upward from a flat surface and having a first sliding portion and a second sliding portion formed on a side surface of the column to be inclined downward to have different angles.

Abstract: Provided are a guide pin configured to support a corner of a photo mask using a double slide structure, a photo mask supporting unit including the same, and a photo mask cleaning apparatus including the same. The photo mask supporting unit includes a supporting plate, a supporting shaft which supports the supporting plate from under the supporting plate, a supporting plate driver configured to rotate the supporting plate, and a guide pin provided as a plurality of guide pins on the supporting plate to support a photo mask and including at least one column protruding upward from a flat surface and having a first sliding portion and a second sliding portion formed on a side surface of the column to be inclined downward to have different angles.