Patents by Inventor Shijing Xia

Shijing Xia has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Chemical mechanical polishing pad and preparation thereof
    Patent number: 12220784
    Abstract: The present invention concerns a chemical mechanical polishing pad having a polishing layer. The polishing layer contains an extruded sheet. The extruded sheet is a photopolymerizable composition containing a block copolymer, a UV curable acrylate, and a photoinitiator.
    Type: Grant
    Filed: October 13, 2021
    Date of Patent: February 11, 2025
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: Bainian Qian, Robert M. Blomquist, Lyla M. El-Sayed, Michael E. Mills, Kancharla-Arun Reddy, Bradley K. Taylor, Shijing Xia
  • Chemical mechanical polishing pad and preparation thereof
    Patent number: 11679531
    Abstract: The present invention concerns a chemical mechanical polishing pad having a polishing layer. The polishing layer contains an extruded sheet. The extruded sheet is prepared by extruding a compounded photopolymerizable composition followed by exposure to UV light.
    Type: Grant
    Filed: October 13, 2021
    Date of Patent: June 20, 2023
    Assignees: Rohm and Haas Electronic Materials CMP Holdings, Inc., DuPont Electronics, Inc.
    Inventors: Bainian Qian, Robert M. Blomquist, Lyla M. El-Sayed, Michael E. Mills, Kancharla-Arun Reddy, Bradley K. Taylor, Shijing Xia
  • CHEMICAL MECHANICAL POLISHING PAD AND PREPARATION THEREOF
    Publication number: 20230112598
    Abstract: The present invention concerns a chemical mechanical polishing pad having a polishing layer. The polishing layer contains an extruded sheet. The extruded sheet is prepared by extruding a compounded photopolymerizable composition followed by exposure to UV light.
    Type: Application
    Filed: October 13, 2021
    Publication date: April 13, 2023
    Inventors: Bainian Qian, Robert M. Blomquist, Lyla M. El-Sayed, Michael E. Mills, Kancharla-Arun Reddy, Bradley K. Taylor, Shijing Xia
  • CHEMICAL MECHANICAL POLISHING PAD AND PREPARATION THEREOF
    Publication number: 20230112228
    Abstract: The present invention concerns a chemical mechanical polishing pad having a polishing layer. The polishing layer contains an extruded sheet. The extruded sheet is a photopolymerizable composition containing a block copolymer, a UV curable acrylate, and a photoinitiator.
    Type: Application
    Filed: October 13, 2021
    Publication date: April 13, 2023
    Inventors: Bainian QIAN, Robert M. BLOMQUIST, Lyla M. EL-SAYED, Michael E. MILLS, Kancharla-Arun REDDY, Bradley K. TAYLOR, Shijing XIA
  • IMPROVED LITHIUM METAL OXIDE RICH CATHODE MATERIALS AND METHOD TO MAKE THEM
    Publication number: 20160164092
    Abstract: A method of doping elements (particularly those that do not have stable divalent oxidation states) into lithium rich metal oxides useful in lithium ion batteries is comprised of the following steps. A dopant metal is dissolved in a liquid, which includes being present as a colloid, to form a solution. The solution is added to a particulate lithium rich metal oxide precursor while agitating said precursor to form a mixture. The solution is added in an amount that is at most that amount which would make the mixture a paste. The liquid is removed to form a doped lithium rich metal oxide precursor. A source of lithium is added. The doped lithium rich metal oxide precursor is heated to form the lithium rich metal oxide.
    Type: Application
    Filed: August 5, 2014
    Publication date: June 9, 2016
    Inventors: Alan L. Stottlemyer, Koichi Numata, Shijing Xia, Hideaki Maeda, Mark L. Dreibelbis, Michael Gardner