Patents by Inventor Shin Amano

Shin Amano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11948778
    Abstract: A conventional substrate processing apparatus for generating plasma cannot generate plasma with high density and thus throughput of substrate processing is low. In order to solve this problem, provided is a substrate processing apparatus including a reaction vessel having a tubular shape and provided with a coil installed at an outer circumference thereof; a cover installed at a first end of the reaction vessel; a gas introduction port installed at the cover; a first plate installed between the gas introduction port and an upper end of the coil; a second plate installed between the first plate and the upper end of the coil; a substrate processing chamber installed at a second end of the reaction vessel; and a gas exhaust part connected to the substrate processing chamber.
    Type: Grant
    Filed: July 14, 2021
    Date of Patent: April 2, 2024
    Assignee: KOKUSAI ELECTRIC CORPORATION
    Inventors: Hidehiro Yanai, Shin Hiyama, Toru Kakuda, Toshiya Shimada, Tomihiro Amano
  • Publication number: 20240087937
    Abstract: According to the present disclosure, there is provided a technique capable of suppressing an erroneous detection of a presence or absence of a substrate caused by a light receiver receiving a specularly reflected light. There is provided a technique that includes: a holding structure provided with a placing surface capable of accommodating a substrate thereon; a light detector including: a light emitter arranged to irradiate an irradiation light toward a back surface of the substrate placed on the placing surface; and a light receiver arranged to be capable of receiving a diffusely reflected light of the irradiation light irradiated from the light emitter without receiving a specularly reflected light of the irradiation light; and a controller configured to be capable of determining a presence or absence of the substrate based on a light receiving state of the light receiver.
    Type: Application
    Filed: August 14, 2023
    Publication date: March 14, 2024
    Applicant: Kokusai Electric Corporation
    Inventors: Naoki Hara, Tomihiro Amano, Shin Hiyama
  • Patent number: 4042908
    Abstract: In a detection apparatus for determining the operability of lighting circuits, a high frequency oscillator operates at a frequency different from that of the power source for the lighting circuits. An electrical element having a high impedance at the oscillator frequency is connected in series with the lighting circuits. Another electrical element having substantially a constant impedance supplies the oscillator output to a connection point between the first electrical member and the lighting circuits. A detecting circuit determines failure of at least one of the lighting circuits by detecting the presence of a high frequency voltage at the connection point. The detected high frequency voltage is rectified and used to indicate failure of the lighting circuit or circuits.
    Type: Grant
    Filed: December 5, 1975
    Date of Patent: August 16, 1977
    Assignee: Koito Seisakusho Co., Ltd.
    Inventors: Shin Amano, Takeshi Tanga