Patents by Inventor SHIN?apos;ICHI TACHI

SHIN?apos;ICHI TACHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • DRY ETCHING APPARATUS AND A METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
    Publication number: 20020084034
    Abstract: The processing with a low gate rate of destruction and high anisotropy is achieved in dry etching. Plasma is generated by ECR resonance of electromagnetic wave which arose by supplying Ultra High Frequency electric power in microstripline 4 arranged on the atmosphere side of a dielectric 2, which separates a vacuum inside and an outside and magnetic field. A conducting layer is etched by this plasma, which is stable and uniform plasma.
    Type: Application
    Filed: July 29, 1999
    Publication date: July 4, 2002
    Inventors: NAOYUKI KOFUJI, MASAHITO MORI, KEN?apos;ETSU YOKOGAWA, NAOSHI ITABASHI, KAZUNORI TSUJIMOTO, SHIN?apos;ICHI TACHI