Patents by Inventor Shin-Chang Tsai

Shin-Chang Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9236219
    Abstract: Measurements of line roughness are separated into groups depending upon pre-layers. Image data collected from similar pre-layer types are considered together in order to separate effects of line roughness from distortion of measurements caused by the pre-layers. The resulting line roughness measurements are used to estimate an aspect of line quality.
    Type: Grant
    Filed: May 3, 2013
    Date of Patent: January 12, 2016
    Assignee: Macronix International Co., Ltd.
    Inventors: Yu-Chung Chen, Shin-Chang Tsai, Ta-Hung Yang
  • Publication number: 20140264016
    Abstract: Measurements of line roughness are separated into groups depending upon pre-layers. Image data collected from similar pre-layer types are considered together in order to separate effects of line roughness from distortion of measurements caused by the pre-layers. The resulting line roughness measurements are used to estimate an aspect of line quality.
    Type: Application
    Filed: May 3, 2013
    Publication date: September 18, 2014
    Applicant: Macronix International Co., Ltd.
    Inventors: YU-CHUNG CHEN, SHIN-CHANG TSAI, TA-HUNG YANG
  • Patent number: 8772802
    Abstract: A light emitting device includes a carrier, a light emitting element disposed and electrically connected to the carrier, and a transparent plate disposed on the carrier and including a flat-portion and a lens-portion. The lens-portion covers the light emitting element and has a light incident surface, a light emitting surface, a first side surface and a second side surface. The light emitting element is suitable for emitting a light beam. A first partial beam of the light beam passes through the light incident surface and leaves from the light emitting surface. A second partial beam of the light beam passes through the light incident surface and is transmitted to the first side surface or the second side surface, and the first side surface or the second side surface reflects at least a part of the second partial beam of the light beam to be passed through the light emitting surface.
    Type: Grant
    Filed: November 2, 2009
    Date of Patent: July 8, 2014
    Assignee: Everlight Electronics Co., Ltd.
    Inventors: Shin-Chang Tsai, Chia-Hao Liang, Pei-Husan Chen
  • Patent number: 8390049
    Abstract: A structure of a semiconductor device including a substrate and a patterned layer is provided. The patterned layer being patterned to have an open area and a dense area is disposed on the substrate. The patterned layer includes, in the dense area, a first pattern adjacent to the open area and a second pattern. The first pattern has a first bottom. The second pattern has a second bottom width. The bottom of the first pattern includes a recess facing the open area, so that the first bottom width is close to the second bottom width.
    Type: Grant
    Filed: October 21, 2008
    Date of Patent: March 5, 2013
    Assignee: MACRONIX International Co., Ltd.
    Inventors: Shin-Chang Tsai, Hsin-Fang Su, Chun-Hung Lee
  • Publication number: 20100207143
    Abstract: A light emitting device includes a carrier, a light emitting element disposed and electrically connected to the carrier, and a transparent plate disposed on the carrier and including a flat-portion and a lens-portion. The lens-portion covers the light emitting element and has a light incident surface, a light emitting surface, a first side surface and a second side surface. The light emitting element is suitable for emitting a light beam. A first partial beam of the light beam passes through the light incident surface and leaves from the light emitting surface. A second partial beam of the light beam passes through the light incident surface and is transmitted to the first side surface or the second side surface, and the first side surface or the second side surface reflects at least a part of the second partial beam of the light beam to be passed through the light emitting surface.
    Type: Application
    Filed: November 2, 2009
    Publication date: August 19, 2010
    Applicant: EVERLIGHT ELECTRONICS CO., LTD.
    Inventors: Shin-Chang Tsai, Chia-Hao Liang, Pei-Husan Chen
  • Publication number: 20100096683
    Abstract: A structure of a semiconductor device including a substrate and a patterned layer is provided. The patterned layer being patterned to have an open area and a dense area is disposed on the substrate. The patterned layer includes, in the dense area, a first pattern adjacent to the open area and a second pattern. The first pattern has a first bottom. The second pattern has a second bottom width. The bottom of the first pattern includes a recess facing the open area, so that the first bottom width is close to the second bottom width.
    Type: Application
    Filed: October 21, 2008
    Publication date: April 22, 2010
    Applicant: MACRONIX INTERNATIONAL CO., LTD.
    Inventors: Shin-Chang Tsai, Hsin-Fang Su, Chun-Hung Lee
  • Publication number: 20070179025
    Abstract: An angle-adjusting device for the wind-resisting plates of the resisting wheel of a stationary bike includes an adjusting button for actuating a pushing unit on the shaft of a resisting wheel to rotate. A coupled rotary sleeve fitted in the pushing unit and restricted to shift axially has its inner wall fixed with an offset-angled projecting member. A main gear unit fitted on the shaft by a bearing has a sleeve having one end inserted in the coupled rotary sleeve and bored with an oblique recess for the offset-angled projecting member to engage with and a main bevel gear having its toothed side facing the resisting wheel. The wind-resisting plates have their shafts respectively provided with an auxiliary bevel gear engaged with the main bevel gear. The angles of the wind-resisting plates can be adjusted by pulling the adjusting button.
    Type: Application
    Filed: February 1, 2006
    Publication date: August 2, 2007
    Applicant: Tonic Fitness Technology, Inc.
    Inventor: Shin-Chang Tsai
  • Patent number: D611181
    Type: Grant
    Filed: May 18, 2009
    Date of Patent: March 2, 2010
    Assignee: Everlight Electronics Co., Ltd.
    Inventors: Shin-Chang Tsai, Chai-Hao Liang, Hsi-Chuan Hsu