Patents by Inventor SHIN EKIMOTO

SHIN EKIMOTO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lead frame and semiconductor device
    Patent number: 9779966
    Abstract: A lead frame includes a dam bar and leads connected by the dam bar. Each lead includes an inner lead, which is located at one side of the dam bar, and an outer lead, which is located at the other side of the dam bar and formed integrally with the inner lead. Each inner lead includes a basal portion located at a side closer to the dam bar, a distal portion located at the opposite side of the basal portion, and an intermediate portion connecting the distal and basal portions and having a width that differs from the distal portion. A plating layer covers an upper surface and a side surface of the distal portion and at least part of a side surface of the intermediate portion. Side surfaces of the basal portion and the dam bar are entirely located outside the plating layer.
    Type: Grant
    Filed: July 28, 2016
    Date of Patent: October 3, 2017
    Assignee: Shinko Electric Industries Co., Ltd.
    Inventors: Naoya Sakai, Shin Ekimoto, Tatsuya Inatsugu, Mitsuharu Sato
  • LEAD FRAME AND SEMICONDUCTOR DEVICE
    Publication number: 20170040183
    Abstract: A lead frame includes a dam bar and leads connected by the dam bar. Each lead includes an inner lead, which is located at one side of the dam bar, and an outer lead, which is located at the other side of the dam bar and formed integrally with the inner lead. Each inner lead includes a basal portion located at a side closer to the dam bar, a distal portion located at the opposite side of the basal portion, and an intermediate portion connecting the distal and basal portions and having a width that differs from the distal portion. A plating layer covers an upper surface and a side surface of the distal portion and at least part of a side surface of the intermediate portion. Side surfaces of the basal portion and the dam bar are entirely located outside the plating layer.
    Type: Application
    Filed: July 28, 2016
    Publication date: February 9, 2017
    Inventors: NAOYA SAKAI, SHIN EKIMOTO, TATSUYA INATSUGU, MITSUHARU SATO