Patents by Inventor Shin Funada

Shin Funada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140302441
    Abstract: A method for manufacturing a magnetic sensor using an electrical lapping guide deposited and patterned simultaneously with a hard bias structure of the sensor material. The method includes depositing a sensor material, and patterning and ion milling the sensor material to define a track width of the sensor. A magnetic, hard bias material is then deposited and a second patterning and ion milling process is performed to simultaneously define the back edge of an electrical lapping guide and a back edge of the sensor.
    Type: Application
    Filed: June 20, 2014
    Publication date: October 9, 2014
    Applicant: HGST NETHERLANDS B.V.
    Inventors: Shin Funada, Quang Le, Jui-Lung Li
  • Patent number: 8778198
    Abstract: A method for manufacturing a magnetic sensor using an electrical lapping guide deposited and patterned simultaneously with a hard bias structure of the sensor material. The method includes depositing a sensor material, and patterning and ion milling the sensor material to define a track width of the sensor. A magnetic, hard bias material is then deposited and a second patterning and ion milling process is performed to simultaneously define the back edge of an electrical lapping guide and a back edge of the sensor.
    Type: Grant
    Filed: June 29, 2011
    Date of Patent: July 15, 2014
    Assignee: HGST Netherlands B.V.
    Inventors: Quang Le, Shin Funada, Jui-Lung Li
  • Publication number: 20130001187
    Abstract: A method for manufacturing a magnetic sensor using an electrical lapping guide deposited and patterned simultaneously with a hard bias structure of the sensor material. The method includes depositing a sensor material, and patterning and ion milling the sensor material to define a track width of the sensor. A magnetic, hard bias material is then deposited and a second patterning and ion milling process is performed to simultaneously define the back edge of an electrical lapping guide and a back edge of the sensor.
    Type: Application
    Filed: June 29, 2011
    Publication date: January 3, 2013
    Inventors: Quang Le, Shin Funada, Jui-Lung Li
  • Patent number: 8296930
    Abstract: A method for manufacturing a magnetoresistive sensor that results in the sensor having a very flat top magnetic shield. The process involves depositing a plurality of sensor layers and then depositing a thin high density carbon CMP stop layer over the sensor layers and forming a mask over the CMP stop layer. An ion milling is performed to define the sensor. Then a thin insulating layer and magnetic hard bias layer are deposited. A chemical mechanical polishing is performed to remove the mask and a reactive ion etching is performed to remove the remaining carbon CMP stop layer. Because the CMP stop layer is very dense and hard, it can be made very thin. This means that when it is removed by reactive ion etching, there is very little notching over the sensor, thereby allowing the upper shield to be very thin.
    Type: Grant
    Filed: December 22, 2009
    Date of Patent: October 30, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Shin Funada, Quang Le, Thomas L. Leong, Jui-Lung Li, Chang-Man Park, Ning Shi, Hicham M. Sougrati
  • Publication number: 20120156390
    Abstract: A method for manufacturing a magnetic sensor that result in improved magnetic bias field to the sensor, improved shield to hard bias spacing and a flatter top shield profile. The method includes a multi-angled deposition of the hard bias structure. After forming the sensor stack a first hard bias layer is deposited at an angle of about 70 degrees relative to horizontal. This is a conformal deposition. Then, a second deposition is performed at an angle of about 90 degrees relative to horizontal. This is a notching deposition, that results in notches being formed adjacent to the sensor stack. Then, a hard bias capping layer is deposited at an angle of about 55 degrees relative to horizontal. This is a leveling deposition that further flattens the surface on which the top shield can be electroplated.
    Type: Application
    Filed: December 21, 2010
    Publication date: June 21, 2012
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Satoru Araki, Shin Funada, Insik Jin, Quang Le, Simon H. Liao, Chang-Man Park
  • Publication number: 20110146061
    Abstract: A method for manufacturing a magnetoresistive sensor that results in the sensor having a very flat top magnetic shield. The process involves depositing a plurality of sensor layers and then depositing a thin high density carbon CMP stop layer over the sensor layers and forming a mask over the CMP stop layer. An ion milling is performed to define the sensor. Then a thin insulating layer and magnetic hard bias layer are deposited. A chemical mechanical polishing is performed to remove the mask and a reactive ion etching is performed to remove the remaining carbon CMP stop layer. Because the CMP stop layer is very dense and hard, it can be made very thin. This means that when it is removed by reactive ion etching, there is very little notching over the sensor, thereby allowing the upper shield (deposited there-over) to be very thin.
    Type: Application
    Filed: December 22, 2009
    Publication date: June 23, 2011
    Inventors: Shin Funada, Quang Le, Thomas L. Leong, Jui-Lung Li, Chang-Man Park, Ning Shi, Hicham M. Sougrati
  • Patent number: 7684160
    Abstract: A method and system for providing a magnetoresistive structure is disclosed. The magnetoresistive structure includes a pinned layer, a nonmagnetic spacer layer, a free layer, a specular layer, a barrier layer, and a capping layer. The spacer layer resides between the pinned layer and the free layer. The free layer is electrically conductive and resides between the specular layer and the nonmagnetic spacer layer. The specular layer is adjacent to the free layer and includes at least one of titanium oxide, yttrium oxide, hafnium oxide, magnesium oxide, aluminum oxide, nickel oxide, iron oxide, zirconium oxide, niobium oxide, and tantalum oxide. The barrier layer resides between the specular layer and the capping layer. The barrier layer is nonmagnetic and includes a first material. The capping layer includes a second material different from the first material.
    Type: Grant
    Filed: February 6, 2006
    Date of Patent: March 23, 2010
    Assignee: Western Digital (Fremont), LLC
    Inventors: Dustin Erickson, Chang-man Park, Shin Funada, Lena Miloslavsky
  • Patent number: 7417832
    Abstract: A method and system for providing a magnetoresistive structure is disclosed. The magnetoresistive structure includes a pinned layer, a nonmagnetic spacer layer, a free layer, a filter layer, a specular layer, a barrier layer, and a capping layer. The nonmagnetic spacer layer resides between the pinned layer and the free layer. The free layer is electrically conductive and resides between the filter layer and the nonmagnetic spacer layer. The specular layer includes a first material and is electrically insulating. The barrier layer resides between the specular oxide layer and the capping layer. The barrier layer is nonmagnetic and includes a second material different material from the first material. The capping layer includes a third material different from the second material.
    Type: Grant
    Filed: April 26, 2005
    Date of Patent: August 26, 2008
    Assignee: Western Digital (Fremont), LLC
    Inventors: Dustin W. Erickson, Chang-Man Park, Shin Funada, Lena Miloslavsky
  • Patent number: 7318947
    Abstract: A method and system for providing a magnetic element are described. The method and system include providing a pinned layer, fabricating a metallic spacer layer and oxidizing a portion of the spacer layer in an environment including at least oxygen and a gas inert with respect to the spacer layer to provide an oxide layer. The method and system also include creating a free layer. The oxide layer is between a remaining metallic portion of the spacer layer and the free layer. In one aspect, the system includes a chamber and a gas diffusion apparatus within the chamber. The gas diffusion apparatus includes a plurality of nozzles and defines a plane. The gas exits each of the plurality of nozzles in a cone having an apex angle. The nozzles are directed at a nozzle tilt angle of at least half of the apex angle from the plane and the spacer layer.
    Type: Grant
    Filed: August 31, 2004
    Date of Patent: January 15, 2008
    Assignee: Western Digital (Fremont), LLC
    Inventors: Chang-Man Park, Shin Funada, Amritpal S. Rana, Daniel E. Scott
  • Patent number: 7307818
    Abstract: A method and system for providing a spin filter is disclosed. The method and system include providing a pinned layer, a free layer, and a conductive nonmagnetic spacer layer between the pinned layer and the free layer. The method and system also include providing a spin filter layer and a capping layer on the spin filter layer. The spin filter layer is adjacent to the free layer. The spin filter layer is on an opposite side of the free layer as the nonmagnetic spacer layer and includes at least Pt and/or Rh. The capping layer has a specular reflection layer therein. In one aspect, the specular reflection layer allows specular reflection of current carriers traveling from the spin filter layer to the specular reflection layer. In another aspect, the specular reflection layer includes at least Ta, Ti, Zr, Hf, Nb, Al, Mo, W, Si, Cr, V, Ni, Co, and Fe.
    Type: Grant
    Filed: April 30, 2004
    Date of Patent: December 11, 2007
    Assignee: Western Digital (Fremont), LLC
    Inventors: Chang-Man Park, Shin Funada, Amritpal S. Rana, Lena Miloslavsky
  • Patent number: 6747301
    Abstract: A tunneling barrier for a spin dependent tunneling (SDT) device is disclosed that includes a plurality of ferromagnetic atoms disposed in a substantially homogenous layer. The presence of such atoms in the tunneling barrier is believed to increase a magnetoresistance or &Dgr;R/R response, improving the signal and the signal to noise ratio. Such an increase &Dgr;R/R response also offers the possibility of decreasing an area of the tunnel barrier layer. Decreasing the area of the tunnel barrier layer can afford improvements in resolution of devices such as MR sensors and increased density of devices such as of MRAM cells.
    Type: Grant
    Filed: February 6, 2002
    Date of Patent: June 8, 2004
    Assignee: Western Digital (Fremont), Inc.
    Inventors: Hugh Craig Hiner, Kyusik Sin, Shin Funada, Xizeng Shi, Hua-Ching Tong
  • Patent number: 6639291
    Abstract: A tunneling barrier for a spin dependent tunneling (SDT) device is disclosed that includes a plurality of ferromagnetic particles. The presence of such particles in the tunneling barrier has been found to increase a magnetoresistance or &Dgr;R/R response, improving the signal and the signal to noise ratio. Such an increased &Dgr;R/R response also offers the possibility of decreasing an area of the tunnel barrier layer and/or increasing a thickness of the tunnel barrier layer. Decreasing the area of the tunnel barrier layer can afford improvements in resolution of devices such as MR sensors and increased density of devices such as of MRAM cells. Increasing the thickness of the tunnel barrier can afford improvements in manufacturing such as increased yield.
    Type: Grant
    Filed: February 6, 2002
    Date of Patent: October 28, 2003
    Assignee: Western Digital (Fremont), Inc.
    Inventors: Kyusik Sin, Shin Funada, Hugh Craig Hiner, Hua-Ching Tong, Xizeng Shi
  • Patent number: 6418048
    Abstract: A method and system for providing a top pinned spin-dependent tunneling sensor is disclosed. The method and system include providing a free layer, a tunneling barrier, a synthetic pinned layer and an antiferromagnetic layer. The free layer is ferromagnetic. The tunneling barrier is an insulator. The tunneling barrier is disposed between the free layer and the synthetic pinned layer. The synthetic pinned layer is ferromagnetic and includes a ferromagnetic top layer. The synthetic pinned layer is between the tunneling barrier and the antiferromagnetic layer. The ferromagnetic top layer acts as a seed layer for the antiferromagnetic layer.
    Type: Grant
    Filed: October 2, 2001
    Date of Patent: July 9, 2002
    Assignee: Read-Rite Corporation
    Inventors: Kyusik Sin, Shin Funada, Hugh C. Hiner, Xizeng Shi
  • Publication number: 20010040774
    Abstract: A method and system for providing a dual spin valve is disclosed. The dual spin valve is for reading data in a magnetic recording media. The method and system include providing a first pinned layer. The first pinned layer has a first magnetization. The method and system also include providing a CoFe free layer and providing a first nonmagnetic spacer layer. The first nonmagnetic spacer layer is between the first pinned layer and the CoFe free layer. The method and system also include providing a second pinned layer and a second nonmagnetic spacer layer. The second pinned layer has a second magnetization. The second nonmagnetic spacer layer is between the CoFe free layer and the second pinned layer.
    Type: Application
    Filed: August 18, 1999
    Publication date: November 15, 2001
    Applicant: Read-Rite Corporation
    Inventors: SHIN FUNADA, MING MAO, HUA-CHING TONG
  • Patent number: 5529854
    Abstract: A magnetic recording film and a magneto-optic recording system utilizing films. The film includes light and heavy rare earth elements and transition metal elements. The system can include dielectric layers and low magnetic coercivity layers in addition to the recording layer.
    Type: Grant
    Filed: April 25, 1994
    Date of Patent: June 25, 1996
    Assignee: Seiko Epson Corporation
    Inventors: Tatsuya Shimoda, Satoshi Shimokawato, Shin Funada, Mamoru Sugimoto, Akira Aoyama, Satoshi Nebashi
  • Patent number: 5100741
    Abstract: A magnetic thin film recording layer comprised primarily of a light rare earth element and a transition metal element is disclosed. Other elements are optionally included in the film. The film has an easy axis of magnetization perpendicular with respect to the surface of the film. Magneto-optic recording systems using such films are also disclosed.
    Type: Grant
    Filed: May 12, 1988
    Date of Patent: March 31, 1992
    Assignee: Seiko Epson Corporation
    Inventors: Tatsuya Shimoda, Satoshi Shimokawato, Shin Funada, Mamoru Sugimoto, Akira Aoyama, Satoshi Nebashi