Patents by Inventor Shin Funada
Shin Funada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140302441Abstract: A method for manufacturing a magnetic sensor using an electrical lapping guide deposited and patterned simultaneously with a hard bias structure of the sensor material. The method includes depositing a sensor material, and patterning and ion milling the sensor material to define a track width of the sensor. A magnetic, hard bias material is then deposited and a second patterning and ion milling process is performed to simultaneously define the back edge of an electrical lapping guide and a back edge of the sensor.Type: ApplicationFiled: June 20, 2014Publication date: October 9, 2014Applicant: HGST NETHERLANDS B.V.Inventors: Shin Funada, Quang Le, Jui-Lung Li
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Patent number: 8778198Abstract: A method for manufacturing a magnetic sensor using an electrical lapping guide deposited and patterned simultaneously with a hard bias structure of the sensor material. The method includes depositing a sensor material, and patterning and ion milling the sensor material to define a track width of the sensor. A magnetic, hard bias material is then deposited and a second patterning and ion milling process is performed to simultaneously define the back edge of an electrical lapping guide and a back edge of the sensor.Type: GrantFiled: June 29, 2011Date of Patent: July 15, 2014Assignee: HGST Netherlands B.V.Inventors: Quang Le, Shin Funada, Jui-Lung Li
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Publication number: 20130001187Abstract: A method for manufacturing a magnetic sensor using an electrical lapping guide deposited and patterned simultaneously with a hard bias structure of the sensor material. The method includes depositing a sensor material, and patterning and ion milling the sensor material to define a track width of the sensor. A magnetic, hard bias material is then deposited and a second patterning and ion milling process is performed to simultaneously define the back edge of an electrical lapping guide and a back edge of the sensor.Type: ApplicationFiled: June 29, 2011Publication date: January 3, 2013Inventors: Quang Le, Shin Funada, Jui-Lung Li
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Patent number: 8296930Abstract: A method for manufacturing a magnetoresistive sensor that results in the sensor having a very flat top magnetic shield. The process involves depositing a plurality of sensor layers and then depositing a thin high density carbon CMP stop layer over the sensor layers and forming a mask over the CMP stop layer. An ion milling is performed to define the sensor. Then a thin insulating layer and magnetic hard bias layer are deposited. A chemical mechanical polishing is performed to remove the mask and a reactive ion etching is performed to remove the remaining carbon CMP stop layer. Because the CMP stop layer is very dense and hard, it can be made very thin. This means that when it is removed by reactive ion etching, there is very little notching over the sensor, thereby allowing the upper shield to be very thin.Type: GrantFiled: December 22, 2009Date of Patent: October 30, 2012Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Shin Funada, Quang Le, Thomas L. Leong, Jui-Lung Li, Chang-Man Park, Ning Shi, Hicham M. Sougrati
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Publication number: 20120156390Abstract: A method for manufacturing a magnetic sensor that result in improved magnetic bias field to the sensor, improved shield to hard bias spacing and a flatter top shield profile. The method includes a multi-angled deposition of the hard bias structure. After forming the sensor stack a first hard bias layer is deposited at an angle of about 70 degrees relative to horizontal. This is a conformal deposition. Then, a second deposition is performed at an angle of about 90 degrees relative to horizontal. This is a notching deposition, that results in notches being formed adjacent to the sensor stack. Then, a hard bias capping layer is deposited at an angle of about 55 degrees relative to horizontal. This is a leveling deposition that further flattens the surface on which the top shield can be electroplated.Type: ApplicationFiled: December 21, 2010Publication date: June 21, 2012Applicant: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Satoru Araki, Shin Funada, Insik Jin, Quang Le, Simon H. Liao, Chang-Man Park
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Publication number: 20110146061Abstract: A method for manufacturing a magnetoresistive sensor that results in the sensor having a very flat top magnetic shield. The process involves depositing a plurality of sensor layers and then depositing a thin high density carbon CMP stop layer over the sensor layers and forming a mask over the CMP stop layer. An ion milling is performed to define the sensor. Then a thin insulating layer and magnetic hard bias layer are deposited. A chemical mechanical polishing is performed to remove the mask and a reactive ion etching is performed to remove the remaining carbon CMP stop layer. Because the CMP stop layer is very dense and hard, it can be made very thin. This means that when it is removed by reactive ion etching, there is very little notching over the sensor, thereby allowing the upper shield (deposited there-over) to be very thin.Type: ApplicationFiled: December 22, 2009Publication date: June 23, 2011Inventors: Shin Funada, Quang Le, Thomas L. Leong, Jui-Lung Li, Chang-Man Park, Ning Shi, Hicham M. Sougrati
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Patent number: 7684160Abstract: A method and system for providing a magnetoresistive structure is disclosed. The magnetoresistive structure includes a pinned layer, a nonmagnetic spacer layer, a free layer, a specular layer, a barrier layer, and a capping layer. The spacer layer resides between the pinned layer and the free layer. The free layer is electrically conductive and resides between the specular layer and the nonmagnetic spacer layer. The specular layer is adjacent to the free layer and includes at least one of titanium oxide, yttrium oxide, hafnium oxide, magnesium oxide, aluminum oxide, nickel oxide, iron oxide, zirconium oxide, niobium oxide, and tantalum oxide. The barrier layer resides between the specular layer and the capping layer. The barrier layer is nonmagnetic and includes a first material. The capping layer includes a second material different from the first material.Type: GrantFiled: February 6, 2006Date of Patent: March 23, 2010Assignee: Western Digital (Fremont), LLCInventors: Dustin Erickson, Chang-man Park, Shin Funada, Lena Miloslavsky
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Patent number: 7417832Abstract: A method and system for providing a magnetoresistive structure is disclosed. The magnetoresistive structure includes a pinned layer, a nonmagnetic spacer layer, a free layer, a filter layer, a specular layer, a barrier layer, and a capping layer. The nonmagnetic spacer layer resides between the pinned layer and the free layer. The free layer is electrically conductive and resides between the filter layer and the nonmagnetic spacer layer. The specular layer includes a first material and is electrically insulating. The barrier layer resides between the specular oxide layer and the capping layer. The barrier layer is nonmagnetic and includes a second material different material from the first material. The capping layer includes a third material different from the second material.Type: GrantFiled: April 26, 2005Date of Patent: August 26, 2008Assignee: Western Digital (Fremont), LLCInventors: Dustin W. Erickson, Chang-Man Park, Shin Funada, Lena Miloslavsky
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Patent number: 7318947Abstract: A method and system for providing a magnetic element are described. The method and system include providing a pinned layer, fabricating a metallic spacer layer and oxidizing a portion of the spacer layer in an environment including at least oxygen and a gas inert with respect to the spacer layer to provide an oxide layer. The method and system also include creating a free layer. The oxide layer is between a remaining metallic portion of the spacer layer and the free layer. In one aspect, the system includes a chamber and a gas diffusion apparatus within the chamber. The gas diffusion apparatus includes a plurality of nozzles and defines a plane. The gas exits each of the plurality of nozzles in a cone having an apex angle. The nozzles are directed at a nozzle tilt angle of at least half of the apex angle from the plane and the spacer layer.Type: GrantFiled: August 31, 2004Date of Patent: January 15, 2008Assignee: Western Digital (Fremont), LLCInventors: Chang-Man Park, Shin Funada, Amritpal S. Rana, Daniel E. Scott
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Patent number: 7307818Abstract: A method and system for providing a spin filter is disclosed. The method and system include providing a pinned layer, a free layer, and a conductive nonmagnetic spacer layer between the pinned layer and the free layer. The method and system also include providing a spin filter layer and a capping layer on the spin filter layer. The spin filter layer is adjacent to the free layer. The spin filter layer is on an opposite side of the free layer as the nonmagnetic spacer layer and includes at least Pt and/or Rh. The capping layer has a specular reflection layer therein. In one aspect, the specular reflection layer allows specular reflection of current carriers traveling from the spin filter layer to the specular reflection layer. In another aspect, the specular reflection layer includes at least Ta, Ti, Zr, Hf, Nb, Al, Mo, W, Si, Cr, V, Ni, Co, and Fe.Type: GrantFiled: April 30, 2004Date of Patent: December 11, 2007Assignee: Western Digital (Fremont), LLCInventors: Chang-Man Park, Shin Funada, Amritpal S. Rana, Lena Miloslavsky
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Patent number: 6747301Abstract: A tunneling barrier for a spin dependent tunneling (SDT) device is disclosed that includes a plurality of ferromagnetic atoms disposed in a substantially homogenous layer. The presence of such atoms in the tunneling barrier is believed to increase a magnetoresistance or &Dgr;R/R response, improving the signal and the signal to noise ratio. Such an increase &Dgr;R/R response also offers the possibility of decreasing an area of the tunnel barrier layer. Decreasing the area of the tunnel barrier layer can afford improvements in resolution of devices such as MR sensors and increased density of devices such as of MRAM cells.Type: GrantFiled: February 6, 2002Date of Patent: June 8, 2004Assignee: Western Digital (Fremont), Inc.Inventors: Hugh Craig Hiner, Kyusik Sin, Shin Funada, Xizeng Shi, Hua-Ching Tong
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Patent number: 6639291Abstract: A tunneling barrier for a spin dependent tunneling (SDT) device is disclosed that includes a plurality of ferromagnetic particles. The presence of such particles in the tunneling barrier has been found to increase a magnetoresistance or &Dgr;R/R response, improving the signal and the signal to noise ratio. Such an increased &Dgr;R/R response also offers the possibility of decreasing an area of the tunnel barrier layer and/or increasing a thickness of the tunnel barrier layer. Decreasing the area of the tunnel barrier layer can afford improvements in resolution of devices such as MR sensors and increased density of devices such as of MRAM cells. Increasing the thickness of the tunnel barrier can afford improvements in manufacturing such as increased yield.Type: GrantFiled: February 6, 2002Date of Patent: October 28, 2003Assignee: Western Digital (Fremont), Inc.Inventors: Kyusik Sin, Shin Funada, Hugh Craig Hiner, Hua-Ching Tong, Xizeng Shi
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Patent number: 6418048Abstract: A method and system for providing a top pinned spin-dependent tunneling sensor is disclosed. The method and system include providing a free layer, a tunneling barrier, a synthetic pinned layer and an antiferromagnetic layer. The free layer is ferromagnetic. The tunneling barrier is an insulator. The tunneling barrier is disposed between the free layer and the synthetic pinned layer. The synthetic pinned layer is ferromagnetic and includes a ferromagnetic top layer. The synthetic pinned layer is between the tunneling barrier and the antiferromagnetic layer. The ferromagnetic top layer acts as a seed layer for the antiferromagnetic layer.Type: GrantFiled: October 2, 2001Date of Patent: July 9, 2002Assignee: Read-Rite CorporationInventors: Kyusik Sin, Shin Funada, Hugh C. Hiner, Xizeng Shi
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Publication number: 20010040774Abstract: A method and system for providing a dual spin valve is disclosed. The dual spin valve is for reading data in a magnetic recording media. The method and system include providing a first pinned layer. The first pinned layer has a first magnetization. The method and system also include providing a CoFe free layer and providing a first nonmagnetic spacer layer. The first nonmagnetic spacer layer is between the first pinned layer and the CoFe free layer. The method and system also include providing a second pinned layer and a second nonmagnetic spacer layer. The second pinned layer has a second magnetization. The second nonmagnetic spacer layer is between the CoFe free layer and the second pinned layer.Type: ApplicationFiled: August 18, 1999Publication date: November 15, 2001Applicant: Read-Rite CorporationInventors: SHIN FUNADA, MING MAO, HUA-CHING TONG
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Patent number: 5529854Abstract: A magnetic recording film and a magneto-optic recording system utilizing films. The film includes light and heavy rare earth elements and transition metal elements. The system can include dielectric layers and low magnetic coercivity layers in addition to the recording layer.Type: GrantFiled: April 25, 1994Date of Patent: June 25, 1996Assignee: Seiko Epson CorporationInventors: Tatsuya Shimoda, Satoshi Shimokawato, Shin Funada, Mamoru Sugimoto, Akira Aoyama, Satoshi Nebashi
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Patent number: 5100741Abstract: A magnetic thin film recording layer comprised primarily of a light rare earth element and a transition metal element is disclosed. Other elements are optionally included in the film. The film has an easy axis of magnetization perpendicular with respect to the surface of the film. Magneto-optic recording systems using such films are also disclosed.Type: GrantFiled: May 12, 1988Date of Patent: March 31, 1992Assignee: Seiko Epson CorporationInventors: Tatsuya Shimoda, Satoshi Shimokawato, Shin Funada, Mamoru Sugimoto, Akira Aoyama, Satoshi Nebashi