Abstract: A continuous solid-state polymerization device according to the present invention comprises: a feeder for injecting a prepolymer continuously; a transverse reactor connected to the feeder via a first connector to receive the prepolymer from the feeder and to perform solid-state polymerization, the reactor itself rotating; and a chamber connected to the transverse reactor via a second connector to receive a polymer, which has been discharged from the transverse reactor, and solid-state polymerization of which has been completed, and to discharge the polymer, wherein the transverse reactor has a demolding coating film formed on the inner wall thereof, and the feeder, the transverse reactor and the chamber are in a vacuum state. The continuous solid-state polymerization device can prevent formation of an interval, in which the prepolymer stagnates, and can perform solid-state polymerization continuously in a vacuum state without using inert gas.

Abstract: The continuous solid-state polymerization device of the present invention comprises: a feeder for continuously introducing a prepolymer; a horizontal reactor which is connected via a first connecting part to the feeder and receives the prepolymer from the feeder so as to subject same to solid-state polymerization, wherein the reactor itself is rotated; a stirring device which comprises a stirring shaft rotating inside the horizontal reactor, in the direction opposite to that of the rotational axis of the horizontal reactor, and comprises stirring blades joined vertically to the stirring shaft; and a chamber which is connected via a second connecting part to the horizontal reactor and, once the solid-state polymerization has been completed, receives the resulting polymer discharged from the horizontal reactor, and, here, the feeder, the horizontal reactor and the chamber are in a vacuum state.

Abstract: A polyamide ester resin includes: a repeat unit derived from a dicarboxylic acid; a repeat unit derived from a diamine; and a repeat unit represented by the following Formula 1, wherein the polyamide ester resin has a melting temperature (Tm) of about 280° C. or more. The polyamide ester resin can exhibit excellent properties in terms of moisture absorption resistance, heat resistance, discoloration resistance, fluidity and the like by using a cyclic ester. wherein R1 is a C3 to C12 linear, branched or cyclic alkylene group.

Abstract: A copolymerized polyamide resin according to the present invention is characterized by comprising: a repeat unit derived from a dicarboxylic acid; a repeat unit derived from a diamine; and a repeat unit represented by Formula 1, wherein the copolymerized polyamide resin has a melting point (Tm) of about 280° C. to about 330° C. The copolymerized polyamide resin has excellent heat resistance and melt-process ability.

Abstract: The continuous solid-state polymerisation device of the present invention comprises: a feeder for continuously introducing a prepolymer; a horizontal reactor which is connected via a first connecting part to the feeder and receives the prepolymer from the feeder so as to subject same to solid-state polymerisation, wherein the reactor itself is rotated; a stirring device which comprises a stirring shaft rotating inside the horizontal reactor, in the direction opposite to that of the rotational axis of the horizontal reactor, and comprises stirring blades joined vertically to the stirring shaft; and a chamber which is connected via a second connecting part to the horizontal reactor and, once the solid-state polymerisation has been completed, receives the resulting polymer discharged from the horizontal reactor, and, here, the feeder, the horizontal reactor and the chamber are in a vacuum state.

Abstract: A continuous solid-state polymerization device according to the present invention comprises: a feeder for injecting a prepolymer continuously; a transverse reactor connected to the feeder via a first connector to receive the prepolymer from the feeder and to perform solid-state polymerization, the reactor itself rotating; and a chamber connected to the transverse reactor via a second connector to receive a polymer, which has been discharged from the transverse reactor, and solid-state polymerization of which has been completed, and to discharge the polymer, wherein the transverse reactor has a demolding coating film formed on the inner wall thereof, and the feeder, the transverse reactor and the chamber are in a vacuum state. The continuous solid-state polymerization device can prevent formation of an interval, in which the prepolymer stagnates, and can perform solid-state polymerization continuously in a vacuum state without using inert gas.

Abstract: A polyamide ester resin includes: a repeat unit derived from a dicarboxylic acid; a repeat unit derived from a diamine; and a repeat unit represented by the following Formula 1, wherein the polyamide ester resin has a melting temperature (Tm) of about 280° C. or more. The polyamide ester resin can exhibit excellent properties in terms of moisture absorption resistance, heat resistance, discoloration resistance, fluidity and the like by using a cyclic ester. wherein R1 is a C3 to C12 linear, branched or cyclic alkylene group.

Abstract: Disclosed are a copolymer for organic antireflective films containing a repeating unit represented by the following formula (1), a monomer for the copolymer, and an organic antireflective film composition including the copolymer: wherein in the formula (1), R1, R2, R3, A, m and n respectively have the same meanings as defined in the detailed description of the invention. The organic antireflective film composition including the copolymer for organic antireflective films has an increased refractive index and exhibits excellent effects when produced into an antireflective film, and hydrophilicity and hydrophobicity of the coating film produced from the composition can be regulated, so that excellent compatibility with resists can be obtained.

Abstract: Disclosed is an organic antireflective film composition which includes a monomer containing two or more thiol groups and a monomer containing two or more vinyl groups, as crosslinking agents. When the organic antireflective film composition is used, an antireflective film formed from the composition can be rapidly etched in an ultrafine pattern forming process, and the curing rate can be increased, while the etching rate is increased, without using an acid generator and a curing agent or by using the agents only in small amounts.

Abstract: A light absorbent for forming an organic anti-reflective layer, represented by the following formula 1 or formula 2, is provided: wherein A represents a substituted or unsubstituted, linear or branched, saturated tetravalent hydrocarbon group, a substituted or unsubstituted, linear or branched, saturated hydrocarbon group and containing one or more heteroatoms, a substituted or unsubstituted aromatic group, a substituted or unsubstituted heteroaromatic group, a substituted or unsubstituted alicyclic group, a substituted or unsubstituted heteroalicyclic group, a substituted or unsubstituted diaryl ether, a substituted or unsubstituted diaryl sulfide, a substituted or unsubstituted diaryl sulfoxide, a substituted or unsubstituted diaryl ketone, or a substituted or unsubstituted diaryl bisphenol A; R1, R2, and R3 each independently represent a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted acetal group,

Abstract: Disclosed are a copolymer for organic antireflective films containing a repeating unit represented by the following formula (1), a monomer for the copolymer, and an organic antireflective film composition including the copolymer: wherein in the formula (1), R1, R2, R3, A, m and n respectively have the same meanings as defined in the detailed description of the invention. The organic antireflective film composition including the copolymer for organic antireflective films has an increased refractive index and exhibits excellent effects when produced into an antireflective film, and hydrophilicity and hydrophobicity of the coating film produced from the composition can be regulated, so that excellent compatibility with resists can be obtained.

Abstract: A light absorbent for forming an organic anti-reflective layer, represented by the following formula 1 or formula 2, is provided: wherein A represents a substituted or unsubstituted, linear or branched, saturated tetravalent hydrocarbon group, a substituted or unsubstituted, linear or branched, saturated hydrocarbon group and containing one or more heteroatoms, a substituted or unsubstituted aromatic group, a substituted or unsubstituted heteroaromatic group, a substituted or unsubstituted alicyclic group, a substituted or unsubstituted heteroalicyclic group, a substituted or unsubstituted diaryl ether, a substituted or unsubstituted diaryl sulfide, a substituted or unsubstituted diaryl sulfoxide, a substituted or unsubstituted diaryl ketone, or a substituted or unsubstituted diaryl bisphenol A; R1, R2, and R3 each independently represent a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted acetal group,

Abstract: A light absorbent for forming an organic anti-reflective layer, represented by the following formula 1 or formula 2, is provided: wherein A represents a substituted or unsubstituted, linear or branched, saturated tetravalent hydrocarbon group, a substituted or unsubstituted, linear or branched, saturated hydrocarbon group and containing one or more heteroatoms, a substituted or unsubstituted aromatic group, a substituted or unsubstituted heteroaromatic group, a substituted or unsubstituted alicyclic group, a substituted or unsubstituted heteroalicyclic group, a substituted or unsubstituted diaryl ether, a substituted or unsubstituted diaryl sulfide, a substituted or unsubstituted diaryl sulfoxide, a substituted or unsubstituted diaryl ketone, or a substituted or unsubstituted diaryl bisphenol A; R1, R2, and R3 each independently represent a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group a substituted or unsubstituted aryl group, a substituted or unsubstituted acetal group, o