Patents by Inventor Shin-ichirou Iwanaga

Shin-ichirou Iwanaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10214607
    Abstract: Provided is a cell adhesion inhibitor which exhibits low cytotoxicity and an excellent cell adhesion prevention effect; a tool and an apparatus each having a surface modified through application of the cell adhesion inhibitor thereto; a method for producing each of the surface-modified tool and apparatus; a biomedical structure and a production method therefor; and a microchannel device and a production method therefor. The invention provides a cell adhesion inhibitor comprising, as an active ingredient, a polymer comprising a repeating unit having a sulfinyl group in a side chain thereof.
    Type: Grant
    Filed: February 22, 2016
    Date of Patent: February 26, 2019
    Assignee: JSR CORPORATION
    Inventors: Naoki Hayashi, Satoshi Hyugaji, Toshihiro Ogawa, Hidetoshi Miyamoto, Shin-ichirou Iwanaga
  • Publication number: 20190048113
    Abstract: Provided is a cell adhesion inhibitor which exhibits low cytotoxicity and an excellent cell adhesion prevention effect; a tool and an apparatus each having a surface modified through application of the cell adhesion inhibitor thereto; a method for producing each of the surface-modified tool and apparatus; a biomedical structure and a production method therefor; and a microchannel device and a production method therefor. The invention provides a cell adhesion inhibitor comprising, as an active ingredient, a polymer comprising a repeating unit having a sulfinyl group in a side chain thereof.
    Type: Application
    Filed: October 17, 2018
    Publication date: February 14, 2019
    Applicant: JSR Corporation
    Inventors: Naoki HAYASHI, Satoshi HYUGAJI, Toshihiro OGAWA, Hidetoshi MIYAMOTO, Shin-ichirou IWANAGA
  • Patent number: 9493600
    Abstract: To provide a novel polymer having an excellent non-specific adsorption inhibitory effect, a surface-hydrophilizing agent comprising the polymer, and a method for producing a substrate having a hydrophilic surface. The polymer comprises a hydrophilic repeating unit having a sulfinyl group in a side chain thereof.
    Type: Grant
    Filed: August 10, 2012
    Date of Patent: November 15, 2016
    Assignee: JSR CORPORATION
    Inventors: Naoki Hayashi, Toshihiro Ogawa, Shin-ichirou Iwanaga, Kazuhiro Iso
  • Publication number: 20160168294
    Abstract: Provided is a cell adhesion inhibitor which exhibits low cytotoxicity and an excellent cell adhesion prevention effect; a tool and an apparatus each having a surface modified through application of the cell adhesion inhibitor thereto; a method for producing each of the surface-modified tool and apparatus; a biomedical structure and a production method therefor; and a microchannel device and a production method therefor. The invention provides a cell adhesion inhibitor comprising, as an active ingredient, a polymer comprising a repeating unit having a sulfinyl group in a side chain thereof.
    Type: Application
    Filed: February 22, 2016
    Publication date: June 16, 2016
    Inventors: Naoki HAYASHI, Satoshi HYUGAJI, Toshihiro OGAWA, Hidetoshi MIYAMOTO, Shin-ichirou IWANAGA
  • Patent number: 9320836
    Abstract: Provided is a cell adhesion inhibitor which exhibits low cytotoxicity and an excellent cell adhesion prevention effect; a tool and an apparatus each having a surface modified through application of the cell adhesion inhibitor thereto; a method for producing each of the surface-modified tool and apparatus; a biomedical structure and a production method therefor; and a microchannel device and a production method therefor. The invention provides a cell adhesion inhibitor comprising, as an active ingredient, a polymer comprising a repeating unit having a sulfinyl group in a side chain thereof.
    Type: Grant
    Filed: December 26, 2012
    Date of Patent: April 26, 2016
    Assignee: JSR Corporation
    Inventors: Naoki Hayashi, Satoshi Hyugaji, Toshihiro Ogawa, Hidetoshi Miyamoto, Shin-ichirou Iwanaga
  • Publication number: 20150017221
    Abstract: Provided is a cell adhesion inhibitor which exhibits low cytotoxicity and an excellent cell adhesion prevention effect; a tool and an apparatus each having a surface modified through application of the cell adhesion inhibitor thereto; a method for producing each of the surface-modified tool and apparatus; a biomedical structure and a production method therefor; and a microchannel device and a production method therefor. The invention provides a cell adhesion inhibitor comprising, as an active ingredient, a polymer comprising a repeating unit having a sulfinyl group in a side chain thereof.
    Type: Application
    Filed: December 26, 2012
    Publication date: January 15, 2015
    Inventors: Naoki Hayashi, Satoshi Hyugaji, Toshihiro Ogawa, Hidetoshi Miyamoto, Shin-ichirou Iwanaga
  • Publication number: 20140194557
    Abstract: To provide a novel polymer having an excellent non-specific adsorption inhibitory effect, a surface-hydrophilizing agent comprising the polymer, and a method for producing a substrate having a hydrophilic surface. The polymer comprises a hydrophilic repeating unit having a sulfinyl group in a side chain thereof.
    Type: Application
    Filed: August 10, 2012
    Publication date: July 10, 2014
    Applicant: JSR CORPORATION
    Inventors: Naoki Hayashi, Toshihiro Ogawa, Shin-Ichirou Iwanaga, Kazuhiro Iso
  • Patent number: 7371500
    Abstract: Positive photosensitive insulating resin compositions of the invention contain at least (A) an alkali soluble resin having a phenolic hydroxyl group, (B) a compound having a quinonediazido group, (C) crosslinked fine particles, (D) a compound containing at least two alkyletherified amino groups in the molecule, and (F) a solvent The resin compositions have excellent resolution, electrical insulating properties and thermal shock properties. Cured products of the invention are obtained by curing these resin compositions, and they show good adhesive properties.
    Type: Grant
    Filed: March 28, 2007
    Date of Patent: May 13, 2008
    Assignee: JSR Corporation
    Inventors: Katsumi Inomata, Takashi Nishioka, Atsushi Itou, Masayoshi Suzuki, Shin-ichirou Iwanaga
  • Publication number: 20070166632
    Abstract: Positive photosensitive insulating resin compositions of the invention contain at least (A) an alkali soluble resin having a phenolic hydroxyl group, (B) a compound having a quinonediazido group, (C) crosslinked fine particles, (D) a compound containing at least two alkyletherified amino groups in the molecule, and (F) a solvent The resin compositions have excellent resolution, electrical insulating properties and thermal shock properties. Cured products of the invention are obtained by curing these resin compositions, and they show good adhesive properties.
    Type: Application
    Filed: March 28, 2007
    Publication date: July 19, 2007
    Applicant: JSR Corporation
    Inventors: Katsumi Inomata, Takashi Nishioka, Atsushi Itou, Masayoshi Suzuki, Shin-ichirou Iwanaga
  • Patent number: 7214454
    Abstract: Positive photosensitive insulating resin compositions of the invention contain at least (A) an alkali soluble resin having a phenolic hydroxyl group, (B) a compound having a quinonediazido group, (C) crosslinked fine particles, (D) a compound containing at least two alkyletherified amino groups in the molecule, and (F) a solvent. The resin compositions have excellent resolution, electrical insulating properties and thermal shock properties. Cured products of the invention are obtained by curing these resin compositions, and they show good adhesive properties.
    Type: Grant
    Filed: January 15, 2003
    Date of Patent: May 8, 2007
    Assignee: JSR Corporation
    Inventors: Katsumi Inomata, Takashi Nishioka, Atsushi Itou, Masayoshi Suzuki, Shin-ichirou Iwanaga
  • Publication number: 20060079609
    Abstract: A heat curable resin composition having a low elastic modulus comprising (A) an epoxy resin, (B) crosslinked fine particles, and (C) a curing agent, which when cured with heat, produces a cured product having a elastic modulus of less than 1 GPa is provided. A cured product excelling in characteristics such as stress relaxation property (low stress properties), electric insulation properties, heat shock resistance, and heat resistance can be produced from the heat curable resin.
    Type: Application
    Filed: November 17, 2005
    Publication date: April 13, 2006
    Applicant: JSR Corporation
    Inventors: Takashi Nishioka, Hirofumi Goto, Katsumi Inomata, Shin-ichirou Iwanaga
  • Publication number: 20040126696
    Abstract: Positive photosensitive insulating resin compositions of the invention contain at least (A) an alkali soluble resin having a phenolic hydroxyl group, (B) a compound having a quinonediazido group, (C) crosslinked fine particles, (D) a compound containing at least two alkyletherified amino groups in the molecule, and (F) a solvent. The resin compositions have excellent resolution, electrical insulating properties and thermal shock properties. Cured products of the invention are obtained by curing these resin compositions, and they show good adhesive properties.
    Type: Application
    Filed: October 23, 2003
    Publication date: July 1, 2004
    Inventors: Katsumi Inomata, Takashi Nishioka, Atsushi Itou, Masayoshi Suzuki, Shin-ichirou Iwanaga