Patents by Inventor Shin-Mao Huang

Shin-Mao Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6912038
    Abstract: The present invention discloses a method for manufacturing liquid crystal display (LCD) device by utilizing photopolymer. A first photopolymer layer is coated on the support substrate and the substrate having a buffer layer is treated by photopolymerization. A substrate is treated by processes for forming an electrode layer, an alignment layer and projections as required by general LCD manufacturing. A second photopolymer layer is coated on the substrate having a plurality electrode patterns, an alignment layer and projections. Mask exposure is applied to the substrate and the photopolymer forms a polymer wall. Alternatively molding can be applied to the substrate along with linear ultra violet exposure. The photopolymer layer is hardened by such process and forms a polymer wall with alignment. The cavities in the polymer wall are filled with mixture of liquid crystal and small amount of photopolymer.
    Type: Grant
    Filed: September 30, 2003
    Date of Patent: June 28, 2005
    Assignee: Industrial Technology Research Institute
    Inventors: Chi-Chang Liao, Ing-Jer Lin, Yi-Chun Wong, Chia-Rong Sheu, Lung-Pin Hsin, Kang--Hung Liu, Ching-Hsiang Chan, Yi-An Sha, Shin-Mao Huang
  • Publication number: 20050018124
    Abstract: The present invention discloses a method for manufacturing liquid crystal display (LCD) device by utilizing photopolymer. A first photopolymer layer is coated on the support substrate and the substrate having a buffer layer is treated by photopolymerization. A substrate is treated by processes for forming an electrode layer, an alignment layer and projections as required by general LCD manufacturing. A second photopolymer layer is coated on the substrate having a plurality electrode patterns, an alignment layer and projections. Mask exposure is applied to the substrate and the photopolymer forms a polymer wall. Alternatively molding can be applied to the substrate along with linear ultra violet exposure. The photopolymer layer is hardened by such process and forms a polymer wall with alignment. The cavities in the polymer wall are filled with mixture of liquid crystal and small amount of photopolymer.
    Type: Application
    Filed: September 30, 2003
    Publication date: January 27, 2005
    Applicant: Industrial Technology Research Institute
    Inventors: Chi-Chang Liao, Ing-Jer Lin, Yi-Chun Wong, Chia-Rong Sheu, Lung-Pin Hsin, Kang-Hung Liu, Ching-Hsiang Chan, Yi-An Sha, Shin-Mao Huang