Patents by Inventor Shin Osada

Shin Osada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090087289
    Abstract: The present invention provides a structure for storing a substrate that can be downsized compared to conventional techniques and is capable of suppressing an increase in footprint. The structure for storing a substrate pertaining to the present invention includes a holding section for holding a substrate horizontally, an inner component positioned around the holding section, which has a loading and unloading section for loading and unloading the substrate from the holding section in a horizontal direction, and an outer component positioned around the inner component, which has an opening corresponding to the loading and unloading section, wherein the inner component and the outer component are able to rotate independently of each other and a rotation axis of the inner component and a rotation axis of the outer component are orthogonal to a face of the substrate.
    Type: Application
    Filed: September 17, 2008
    Publication date: April 2, 2009
    Applicant: TOKYO ELECTRON LIMITED
    Inventor: Shin Osada
  • Patent number: 7490010
    Abstract: When measurement data collected with a specific sampling cycle by MCs from measuring instrument units are stored into a data storage apparatus, a sampling controller adjusts the sampling cycle to a longer setting if the apparatus state is other than a substrate processing execution state (e.g., an idling state) compared to the sampling cycle set in the substrate processing execution state, so as to minimize the volume of data stored into the data storage apparatus.
    Type: Grant
    Filed: July 9, 2007
    Date of Patent: February 10, 2009
    Assignee: Tokyo Electron Limited
    Inventor: Shin Osada
  • Publication number: 20080236755
    Abstract: A single-wafer type substrate processing apparatus includes: a plurality of process modules connected to a substrate transfer chamber; a carry-in port having a plurality of first placement tables arranged in a horizontal direction so that a substrate carrier is placed thereon; a second placement table installed on the left or right of an area where the first placement tables are arranged in the horizontal direction so that the substrate carrier is temporarily placed thereon; and a transfer mechanism transferring the substrate carrier from the second placement table to one of the first placement tables. When viewed in a direction perpendicular to the horizontal direction, an outer end of the second placement table in the horizontal direction is inside one of a maintenance area and a footprint area of the plurality of single-wafer type process modules as a whole, which one area is larger than the other in the horizontal direction.
    Type: Application
    Filed: March 26, 2008
    Publication date: October 2, 2008
    Inventors: Keisuke Kondoh, Shin Osada
  • Publication number: 20080040061
    Abstract: When measurement data collected with a specific sampling cycle by MCs from measuring instrument units are stored into a data storage means, a sampling control means adjusts the sampling cycle to a longer setting if the apparatus state is other than a substrate processing execution state (e.g., an idling state) compared to the sampling cycle set in the substrate processing execution state, so as to minimize the volume of data stored into the data storage means.
    Type: Application
    Filed: July 9, 2007
    Publication date: February 14, 2008
    Applicant: TOKYO ELECTRON LIMITED
    Inventor: Shin OSADA