Patents by Inventor Shin Sasamoto

Shin Sasamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11326069
    Abstract: Objects are to provide a fluorine-containing active energy ray curable resin which may be suitably used as a surfactant in an aqueous active energy ray curable resin composition, to provide an active energy ray curable resin composition including the resin, and to provide a cured product obtained by curing the composition. Specifically, a fluorine-containing active energy ray curable resin is provided which includes a polymer structure (a1) derived from a radically polymerizable unsaturated monomer, a poly(perfluoroalkylene ether) chain (a2), a radically polymerizable unsaturated group (a3), and an acid group forming a neutral salt structure (a4).
    Type: Grant
    Filed: December 5, 2017
    Date of Patent: May 10, 2022
    Assignee: DIC Corporation
    Inventors: Shin Sasamoto, Akira Takano
  • Publication number: 20190359844
    Abstract: Objects are to provide a fluorine-containing active energy ray curable resin which may be suitably used as a surfactant in an aqueous active energy ray curable resin composition, to provide an active energy ray curable resin composition including the resin, and to provide a cured product obtained by curing the composition. Specifically, a fluorine-containing active energy ray curable resin is provided which includes a polymer structure (a1) derived from a radically polymerizable unsaturated monomer, a poly(perfluoroalkylene ether) chain (a2), a radically polymerizable unsaturated group (a3), and an acid group forming a neutral salt structure (a4).
    Type: Application
    Filed: December 5, 2017
    Publication date: November 28, 2019
    Inventors: Shin Sasamoto, Akira Takano
  • Publication number: 20130172476
    Abstract: Provided is a fluorine-based surfactant including a copolymer synthesized by copolymerizing, as essential monomers, a polymerizable monomer (A) having a poly(perfluoroalkylene ether) chain and polymerizable unsaturated groups at both ends of the chain and a polymerizable monomer (B) having an oxyalkylene group and a polymerizable unsaturated group. The fluorine-based surfactant cannot structurally generate PFOS or PFOA, which tend to accumulate in the environment and living bodies; even when the fluorine-based surfactant has lower fluorine content than surfactants having a fluoroalkyl group having 8 or more carbon atoms, the fluorine-based surfactant has a higher capability of decreasing surface tension than the surfactants. Accordingly, the fluorine-based surfactant can be suitably used as a leveling agent for a coating composition, a resist composition, or the like.
    Type: Application
    Filed: June 28, 2011
    Publication date: July 4, 2013
    Applicant: DIC Corporation
    Inventors: Shin Sasamoto, Hideya Suzuki
  • Patent number: 8410210
    Abstract: A fluorine-containing novolac resin represented by the following formula, as well as a fluorine based surfactant and a fluorine based surfactant composition, which include the fluorine-containing novolac resin. In the formula, R represents a fluorinated alkyl-containing substituent, R? represents a hydrogen atom or a methyl group, R? represents a hydrogen atom or a non-fluorinated substituent, —X— represents any one of following four types of linking groups, —X? represents any one of three following types of substituents, n represents 0 or an integer of 1 or more, m represents an integer of 1 or more, and n+m is an integer of 2 or more.
    Type: Grant
    Filed: May 21, 2008
    Date of Patent: April 2, 2013
    Assignee: DIC Corporation
    Inventors: Hideya Suzuki, Shin Sasamoto, Kiyofumi Takano
  • Patent number: 8409687
    Abstract: A UV-curable composition for optical discs contains a fluorine-containing UV-curable resin having a poly(perfluoroalkylene ether) chain and a UV-curable group. The fluorine-containing UV-curable resin exhibits good compatibility with the composition and satisfactorily localizes in and near a surface of a coating film. Thus, the composition can be used to form an outermost layer of an optical disc such that the droplet size of grease such as that constituting fingerprints adhering to the outermost layer is reduced and scattering of light having a short oscillation wavelength passing through the outermost layer is suppressed. Accordingly, an optical disc on and from which signals can be satisfactorily recorded and read is formed.
    Type: Grant
    Filed: October 12, 2010
    Date of Patent: April 2, 2013
    Assignee: DIC Corporation
    Inventors: Hirokazu Saito, Takeshi Isonaka, Hideya Suzuki, Youzou Yamashina, Shin Sasamoto, Jun Noguchi
  • Publication number: 20120163158
    Abstract: A UV-curable composition for optical discs contains a fluorine-containing UV-curable resin having a poly(perfluoroalkylene ether) chain and a UV-curable group. The fluorine-containing UV-curable resin exhibits good compatibility with the composition and satisfactorily localizes in and near a surface of a coating film. Thus, the composition can be used to form an outermost layer of an optical disc such that the droplet size of grease such as that constituting fingerprints adhering to the outermost layer is reduced and scattering of light having a short oscillation wavelength passing through the outermost layer is suppressed. Accordingly, an optical disc on and from which signals can be satisfactorily recorded and read is formed.
    Type: Application
    Filed: October 12, 2010
    Publication date: June 28, 2012
    Applicant: DIC CORPORATION
    Inventors: Hirokazu Saito, Takeshi Isonaka, Hideya Suzuki, Youzou Yamashina, Shin Sasamoto, Jun Noguchi
  • Patent number: 8030412
    Abstract: The present invention relates to an active-energy-ray-curable coating composition containing, as essential components, a radical-polymerizable resin (I) containing a polymer structure (?) of a radical-polymerizable unsaturated monomer and a poly(perfluoroalkylene ether) chain (?), and having a resin structure in which a plurality of the polymer structures (?) are linked to each other with the poly(perfluoroalkylene ether) chain (?) therebetween and the polymer structures (?) each have a radical-polymerizable unsaturated group at a side chain thereof; and a polymerization initiator (II). The active-energy-ray-curable coating composition can be used as a coating material that imparts surface properties such as stain-proof properties.
    Type: Grant
    Filed: April 15, 2009
    Date of Patent: October 4, 2011
    Assignee: DIC Corporation
    Inventors: Hideya Suzuki, Shin Sasamoto
  • Publication number: 20110118405
    Abstract: The present invention relates to an active-energy-ray-curable coating composition containing, as essential components, a radical-polymerizable resin (I) containing a polymer structure (?) of a radical-polymerizable unsaturated monomer and a poly(perfluoroalkylene ether) chain (?), and having a resin structure in which a plurality of the polymer structures (?) are linked to each other with the poly(perfluoroalkylene ether) chain (?) therebetween and the polymer structures (?) each have a radical-polymerizable unsaturated group at a side chain thereof; and a polymerization initiator (II). The active-energy-ray-curable coating composition can be used as a coating material that imparts surface properties such as stain-proof properties.
    Type: Application
    Filed: April 15, 2009
    Publication date: May 19, 2011
    Applicant: DIC Corporation
    Inventors: Hideya Suzuki, Shin Sasamoto
  • Publication number: 20100113678
    Abstract: A fluorine-containing novolac resin represented by the following formula, as well as a fluorine based surfactant and a fluorine based surfactant composition, which include the fluorine-containing novolac resin. In the formula, R represents a fluorinated alkyl-containing substituent, R? represents a hydrogen atom or a methyl group, R? represents a hydrogen atom or a non-fluorinated substituent, —X— represents any one of following four types of linking groups, —X? represents any one of three following types of substituents, n represents 0 or an integer of 1 or more, m represents an integer of 1 or more, and n+m is an integer of 2 or more.
    Type: Application
    Filed: May 21, 2008
    Publication date: May 6, 2010
    Applicant: DIC CORPORATION
    Inventors: Hideya Suzuki, Shin Sasamoto, Kiyofumi Takano