Patents by Inventor Shin-ya Nakafuji
Shin-ya Nakafuji has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11880138Abstract: A composition that enables a resist underlayer film to be formed, contains: a compound having at least one partial structure represented by formula (1); and a solvent. In the formula (1), for example, Ar1 represents a group obtained by removing (p+1) hydrogen atoms on an aromatic carbon ring from a substituted or unsubstituted arene having 6 to 30 ring atoms, or a group obtained by removing (p+1) hydrogen atoms on an aromatic heteroring from a substituted or unsubstituted heteroarene having 5 to 30 ring atoms; Ar2 represents a substituted or unsubstituted aryl group having 6 to 30 ring atoms, or a substituted or unsubstituted heteroaryl group having 5 to 30 ring atoms, and R2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms, and R3 represents an ethynediyl group or a substituted or unsubstituted ethenediyl group.Type: GrantFiled: February 1, 2021Date of Patent: January 23, 2024Assignee: JSR CORPORATIONInventors: Shin-ya Nakafuji, Hiroki Nakatsu, Tomoaki Taniguchi, Tomohiro Oda
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Publication number: 20220011672Abstract: The composition contains: a compound which has a group represented by formula (1); and a solvent. In the formula (1), R1 and R2 each independently represent a substituted or unsubstituted aryl group having 6 to 30 ring atoms or a substituted or unsubstituted heteroaryl group having 5 to 30 ring atoms; R3 represents a hydrogen atom or a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 10 carbon atoms; and * denotes a bonding site to a part other than the group represented by the following formula (1) in the compound.Type: ApplicationFiled: September 23, 2021Publication date: January 13, 2022Applicant: JSR CORPORATIONInventors: Shin-ya NAKAFUJI, Tomoaki TANIGUCHI, Kazunori TAKANASHI
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Patent number: 11126084Abstract: A composition for resist underlayer film formation contains a compound having a group represented by formula (1), and a solvent. R1 represents an organic group having 2 to 10 carbon atoms and having a valency of (m+n), wherein the carbon atoms include two carbon atoms that are adjacent to each other, with a hydroxy group or an alkoxy group bonding to one of the two carbon atoms, and with a hydrogen atom bonding to another of the two carbon atoms; L1 represents an ethynediyl group or a substituted or unsubstituted ethenediyl group; R2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; n is an integer of 1 to 3; * denotes a bonding site to a moiety other than the group represented by the formula (1) in the compound; and m is an integer of 1 to 3.Type: GrantFiled: April 18, 2019Date of Patent: September 21, 2021Assignee: JSR CORPORATIONInventors: Naoya Nosaka, Goji Wakamatsu, Tsubasa Abe, Yuushi Matsumura, Yoshio Takimoto, Shin-ya Nakafuji, Kazunori Sakai
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Publication number: 20210157235Abstract: A composition that enables a resist underlayer film to be formed, contains: a compound having at least one partial structure represented by formula (1); and a solvent. In the formula (1), for example, Ar1 represents a group obtained by removing (p+1) hydrogen atoms on an aromatic carbon ring from a substituted or unsubstituted arene having 6 to 30 ring atoms, or a group obtained by removing (p+1) hydrogen atoms on an aromatic heteroring from a substituted or unsubstituted heteroarene having 5 to 30 ring atoms; Ar2 represents a substituted or unsubstituted aryl group having 6 to 30 ring atoms, or a substituted or unsubstituted heteroaryl group having 5 to 30 ring atoms, and R2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms, and R3 represents an ethynediyl group or a substituted or unsubstituted ethenediyl group.Type: ApplicationFiled: February 1, 2021Publication date: May 27, 2021Applicant: JSR CORPORATIONInventors: Shin-ya NAKAFUJI, Hiroki NAKATSU, Tomoaki TANIGUCHI, Tomohiro ODA
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Publication number: 20200348595Abstract: A composition contains: a compound including at least one group selected from the group consisting of a group represented by formula (1-1), a group represented by formula (1-2), and a group represented by formula (1-3); and a solvent. In formulae (1-1) to (1-3), * and ** each denote a site bonding to a part other than the group represented by the formulae (1-1) to (1-3) in the compound; and a and b are each independently an integer of 0 to 3. In a case in which a is 0, b is no less than 1, and in a case in which a is no less than 1, b is 0.Type: ApplicationFiled: July 20, 2020Publication date: November 5, 2020Applicant: JSR CORPORATIONInventors: Shin-ya NAKAFUJI, Kengo EHARA, Tomoaki TANIGUCHI, Kazunori TAKANASHI
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Publication number: 20190243247Abstract: A composition for resist underlayer film formation contains a compound having a group represented by formula (1), and a solvent. R1 represents an organic group having 2 to 10 carbon atoms and having a valency of (m+n), wherein the carbon atoms include two carbon atoms that are adjacent to each other, with a hydroxy group or an alkoxy group bonding to one of the two carbon atoms, and with a hydrogen atom bonding to another of the two carbon atoms; L1 represents an ethynediyl group or a substituted or unsubstituted ethenediyl group; R2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; n is an integer of 1 to 3; * denotes a bonding site to a moiety other than the group represented by the formula (1) in the compound; and m is an integer of 1 to 3.Type: ApplicationFiled: April 18, 2019Publication date: August 8, 2019Applicant: JSR CORPORATIONInventors: Naoya NOSAKA, Goji Wakamatsu, Tsubasa Abe, Yuushi Matsumura, Yoshio Takimoto, Shin-ya Nakafuji, Kazunori Sakai
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Composition, method for producing patterned substrate, film and forming method thereof, and compound
Patent number: 10146131Abstract: A composition includes a compound including a partial structure represented by formula (1), and solvent. In the formula (1), X1 and X2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with the spiro carbon atom and the carbon atoms of the aromatic ring adjacent to X1 or X2; n1 and n2 are each independently an integer of 0 to 2; and the sum of k1 and k2 are each independently an integer of 1 to 8, wherein the sum of k1 and k2 is no less than 2 and no greater than 16. The compound is preferably represented by formula (2). The sum of k1 and k2 in the formula (1) is preferably no less than 3.Type: GrantFiled: September 23, 2015Date of Patent: December 4, 2018Assignee: JSR CORPORATIONInventors: Shin-ya Nakafuji, Fumihiro Toyokawa, Gouji Wakamatsu, Yoshio Takimoto, Katsuhisa Mizoguchi, Takashi Okada, Takaaki Uno, Takeshi Endo, Masaki Moritsugu -
Patent number: 10053539Abstract: A composition comprises a compound comprising a partial structure represented by formula (1) and comprising an intermolecular bond-forming group; and a solvent. X1 and X2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with a spiro carbon atom and carbon atoms of an aromatic ring. R1 and R2 each independently represent a halogen atom, a hydroxy group, a nitro group or a monovalent organic group. a1 and a2 are each independently an integer of 0 to 8. n1 and n2 are each independently an integer of 0 to 2; k1 and k2 are each independently an integer of 0 to 8. A sum of k1 and k2 is no less than 1, and a sum of a1 and k1. A sum of a2 and k2 are no greater than 8.Type: GrantFiled: December 1, 2015Date of Patent: August 21, 2018Assignee: JSR CorporationInventors: Shin-ya Nakafuji, Goji Wakamatsu, Tsubasa Abe, Kazunori Sakai
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Publication number: 20180114698Abstract: A composition comprises a compound comprising a partial structure represented by formula (1) and comprising an intermolecular bond-forming group; and a solvent. X1 and X2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with a spiro carbon atom and carbon atoms of an aromatic ring. R1 and R2 each independently represent a halogen atom, a hydroxy group, a nitro group or a monovalent organic group. a1 and a2 are each independently an integer of 0 to 8. n1 and n2 are each independently an integer of 0 to 2; k1 and k2 are each independently an integer of 0 to 8. A sum of k1 and k2 is no less than 1, and a sum of a1 and k1. A sum of a2 and k2 are no greater than 8.Type: ApplicationFiled: December 1, 2015Publication date: April 26, 2018Applicant: JSR CorporationInventors: Shin-ya NAKAFUJI, Goji WAKAMATSU, Tsubasa ABE, Kazunori SAKAI
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Patent number: 9696626Abstract: A composition for forming a resist underlayer film is provided, which contains: a calixarene-based compound obtained from a calixarene by substituting at least a part of hydrogen atoms each on phenolic hydroxyl groups comprised in the calixarene, with a monovalent organic group having 1 to 30 carbon atoms; and an organic solvent. The monovalent organic group preferably includes a crosslinkable group. A part of hydrogen atoms each on phenolic hydroxyl groups of the calixarene-based compound is preferably substituted. The ratio of the number of substituted phenolic hydroxyl groups to the number of unsubstituted phenolic hydroxyl groups in the calixarene-based compound is preferably no less than 30/70 and no greater than 99/1.Type: GrantFiled: May 19, 2016Date of Patent: July 4, 2017Assignee: JSR CORPORATIONInventors: Fumihiro Toyokawa, Shin-ya Nakafuji, Gouji Wakamatsu
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Publication number: 20170154782Abstract: A composition comprises a compound comprising a partial structure represented by formula (1) and comprising an intermolecular bond-forming group; and a solvent. X1 and X2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with a spiro carbon atom and carbon atoms of an aromatic ring. R1 and R2 each independently represent a halogen atom, a hydroxy group, a nitro group or a monovalent organic group. a1 and a2 are each independently an integer of 0 to 8. n1 and n2 are each independently an integer of 0 to 2; k1 and k2 are each independently an integer of 0 to 8. A sum of k1 and k2 is no less than 1, and a sum of a1 and k1. A sum of a2 and k2 are no greater than 8.Type: ApplicationFiled: December 1, 2015Publication date: June 1, 2017Applicant: JSR CorporationInventors: Shin-ya NAKAFUJI, Goji WAKAMATSU, Tsubasa ABE, Kazunori SAKAI
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Patent number: 9620378Abstract: A composition comprises: a compound having one partial structure represented by formula (1), and a solvent. n1 and n2 are each independently an integer of 0 to 2; and k1 and k2 are each independently an integer of 0 to 9. The compound preferably has an intermolecular bond-forming group. The compound is preferably represented by formula (2). Z represents the partial structure represented by the formula (1); Ar1 and Ar2 represent a substituted or unsubstituted arenediyl group having 6 to 20 carbon atoms; Ar3 and Ar4 represent a substituted or unsubstituted aryl group having 6 to 20 carbon atoms; and p1 and p2 are each independently an integer of 0 to 3.Type: GrantFiled: December 24, 2015Date of Patent: April 11, 2017Assignee: JSR CORPORATIONInventors: Shin-ya Nakafuji, Goji Wakamatsu, Tsubasa Abe, Kazunori Sakai
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Patent number: 9581905Abstract: A composition for film formation includes a compound represented by formula (1) and a solvent. In the formula (1), R1, R2 and R3 each independently represent a group represented by the formula (a). In the formula (a), RA represents a hydrogen atom, an aryl group, or an alkyl group unsubstituted or substituted with at least one of a hydroxy group and an aryl group. RB represents a single bond or an arylene group. A part or all of hydrogen atoms on an aromatic ring of the aryl group and the arylene group may be substituted with a halogen atom, a hydroxy group, an amino group, a sulfanyl group, or a monovalent organic group having 1 to 20 carbon atoms and not including an aromatic ring.Type: GrantFiled: December 4, 2015Date of Patent: February 28, 2017Assignee: JSR CORPORATIONInventors: Shin-ya Nakafuji, Fumihiro Toyokawa, Goji Wakamatsu, Shingo Takasugi, Tooru Kimura
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Patent number: 9447303Abstract: A composition for forming a resist underlayer film includes (A) a compound. The compound (A) includes a group represented by formula (1). R represents a monovalent organic group having 1 to 30 carbon atoms. The monovalent organic group represented by R does not include an oxygen atom at an end of the side adjacent the sulfur atom. * represents a bonding hand. The compound (A) preferably includes a ring which is an aromatic ring, a heteroaromatic ring, or a combination thereof. The bonding hand denoted by * in the group represented by the formula (1) is preferably linked directly or via an oxygen atom to the ring.Type: GrantFiled: March 26, 2015Date of Patent: September 20, 2016Assignee: JSR CORPORATIONInventors: Shin-ya Minegishi, Shin-ya Nakafuji, Satoru Murakami, Toru Kimura
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Publication number: 20160259247Abstract: A composition for forming a resist underlayer film is provided, which contains: a calixarene-based compound obtained from a calixarene by substituting at least a part of hydrogen atoms each on phenolic hydroxyl groups comprised in the calixarene, with a monovalent organic group having 1 to 30 carbon atoms; and an organic solvent. The monovalent organic group preferably includes a crosslinkable group. A part of hydrogen atoms each on phenolic hydroxyl groups of the calixarene-based compound is preferably substituted. The ratio of the number of substituted phenolic hydroxyl groups to the number of unsubstituted phenolic hydroxyl groups in the calixarene-based compound is preferably no less than 30/70 and no greater than 99/1.Type: ApplicationFiled: May 19, 2016Publication date: September 8, 2016Applicant: JSR CORPORATIONInventors: Fumihiro TOYOKAWA, Shin-ya NAKAFUJI, Gouji WAKAMATSU
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Patent number: 9400429Abstract: A composition for forming a resist underlayer film is provided, which contains: a calixarene-based compound obtained from a calixarene by substituting at least a part of hydrogen atoms each on phenolic hydroxyl groups comprised in the calixarene, with a monovalent organic group having 1 to 30 carbon atoms; and an organic solvent. The monovalent organic group preferably includes a crosslinkable group. A part of hydrogen atoms each on phenolic hydroxyl groups of the calixarene-based compound is preferably substituted. The ratio of the number of substituted phenolic hydroxyl groups to the number of unsubstituted phenolic hydroxyl groups in the calixarene-based compound is preferably no less than 30/70 and no greater than 99/1.Type: GrantFiled: March 10, 2015Date of Patent: July 26, 2016Assignee: JSR CORPORATIONInventors: Fumihiro Toyokawa, Shin-ya Nakafuji, Gouji Wakamatsu
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Publication number: 20160085152Abstract: A composition for film formation includes a compound represented by formula (1) and a solvent. In the formula (1), R1, R2 and R3 each independently represent a group represented by the formula (a). In the formula (a), RA represents a hydrogen atom, an aryl group, or an alkyl group unsubstituted or substituted with at least one of a hydroxy group and an aryl group. RB represents a single bond or an arylene group. A part or all of hydrogen atoms on an aromatic ring of the aryl group and the arylene group may be substituted with a halogen atom, a hydroxy group, an amino group, a sulfanyl group, or a monovalent organic group having 1 to 20 carbon atoms and not including an aromatic ring.Type: ApplicationFiled: December 4, 2015Publication date: March 24, 2016Applicant: JSR CORPORATIONInventors: Shin-ya NAKAFUJI, Fumihiro TOYOKAWA, Goji WAKAMATSU, Shingo TAKASUGI, Tooru KIMURA
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COMPOSITION, METHOD FOR PRODUCING PATTERNED SUBSTRATE, FILM AND FORMING METHOD THEREOF, AND COMPOUND
Publication number: 20160011512Abstract: A composition includes a compound including a partial structure represented by formula (1), and solvent. In the formula (1), X1 and X2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with the spiro carbon atom and the carbon atoms of the aromatic ring adjacent to X1 or X2; n1 and n2 are each independently an integer of 0 to 2; and the sum of k1 and k2 are each independently an integer of 1 to 8, wherein the sum of k1 and k2 is no less than 2 and no greater than 16. The compound is preferably represented by formula (2). The sum of k1 and k2 in the formula (1) is preferably no less than 3.Type: ApplicationFiled: September 23, 2015Publication date: January 14, 2016Applicant: JSR CORPORATIONInventors: Shin-ya NAKAFUJI, Fumihiro TOYOKAWA, Gouji WAKAMATSU, Yoshio TAKIMOTO, Katsuhisa MIZOGUCHI, Takashi OKADA, Takaaki UNO, Takeshi ENDO, Masaki MORITSUGU -
Patent number: 9170493Abstract: A resist underlayer film-forming composition includes a polymer having a glass transition temperature (Tg) of 0 to 180° C. The resist underlayer film-forming composition is used for a multilayer resist process. The multilayer resist process includes forming a silicon-based oxide film on a surface of a resist underlayer film, and subjecting the silicon-based oxide film to wet etching.Type: GrantFiled: August 28, 2013Date of Patent: October 27, 2015Assignee: JSR CORPORATIONInventors: Shin-ya Minegishi, Kazuhiko Komura, Shin-ya Nakafuji, Takanori Nakano
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Patent number: 9134611Abstract: A composition for forming a resist underlayer film includes a polymer having a repeating unit represented by a following formula (1), and a solvent. R1 represents a hydroxy group, or the like. n is an integer of 0 to 5. X represents a divalent hydrocarbon group having 1 to 20 carbon atoms or an alkanediyloxy group having 1 to 20 carbon atoms. m is an integer of 1 to 7. A sum of m and n is no greater than 7. R2 represents a single bond or an alkanediyl group having 1 to 4 carbon atoms. R3 represents an alicyclic group having 4 to 20 carbon atoms or an aryl group having 6 to 30 carbon atoms. A part or all of hydrogen atoms included in the alicyclic group or the aryl group represented by R3 are unsubstituted or substituted.Type: GrantFiled: October 24, 2013Date of Patent: September 15, 2015Assignee: JSR CORPORATIONInventors: Shin-ya Nakafuji, Shin-ya Minegishi, Takanori Nakano