Patents by Inventor Shin Yi LI

Shin Yi LI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Laminated structure
    Patent number: 9817313
    Abstract: A laminated structure for use as a thy film photoresist, which includes a supporting layer, a photosensitive resin layer and a protective layer. The protective layer is a polyester film that has a maximum surface roughness between 1,500 nm and 2,500 nm, and a sheet resistance between 1×108?/? and 1×1012?/?. The laminated structure is particularly applicable to the manufacture of a photosensitive device and a circuit of a printed circuit board or a lead frame.
    Type: Grant
    Filed: March 31, 2016
    Date of Patent: November 14, 2017
    Assignee: Eternal Materials Co., Ltd.
    Inventors: Shin Yi Li, Jen Yu Liu
  • LAMINATED STRUCTURE
    Publication number: 20160291471
    Abstract: A laminated structure for use as a thy film photoresist, which includes a supporting layer, a photosensitive resin layer and a protective layer. The protective layer is a polyester film that has a maximum surface roughness between 1,500 nm and 2,500 nm, and a sheet resistance between 1×108 ?/? and 1×1012 ?/?. The laminated structure is particularly applicable to the manufacture of a photosensitive device and a circuit of a printed circuit board or a lead frame.
    Type: Application
    Filed: March 31, 2016
    Publication date: October 6, 2016
    Inventors: Shin Yi LI, Jen Yu LIU