Patents by Inventor Shingo Fujita
Shingo Fujita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240096243Abstract: A novel display panel that is highly convenient, useful, or reliable is provided. The display panel includes a display region, a first support, and a second support, the display region includes a first region, a second region, and a third region, the first region and the second region each have a belt-like shape extending in one direction, and the third region is sandwiched between the first region and the second region. The first support overlaps with the first region and is less likely to be warped than the third region, and the second support overlaps with the second region and is less likely to be warped than the third region. The second support can pivot on an axis extending in the one direction with respect to the first support.Type: ApplicationFiled: November 21, 2023Publication date: March 21, 2024Inventors: Shingo EGUCHI, Taiki NONAKA, Daiki NAKAMURA, Nozomu SUGISAWA, Kazuhiko FUJITA, Shunpei YAMAZAKI
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Publication number: 20240090106Abstract: This invention is capable of detailed control in accordance with the mode of using a lighting apparatus and the like.Type: ApplicationFiled: July 29, 2021Publication date: March 14, 2024Applicant: JIMBO ELECTRIC Co., Ltd.Inventors: Shingo Ishiyama, Kazuhiro Naito, Tatsuo Matsuno, Yoma Isakawa, Yasuhiro Suichi, Masahiro Fujita
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Publication number: 20240083369Abstract: Provided is a vehicle configured to allow for capturing an image of a surrounding area along a side of a vehicle regardless of whether a door is opened or closed. A vehicle comprises a vehicle body having a passenger opening on a side, and a camera rearward of the passenger opening. The camera has an optical axis oriented in a laterally outward and frontward direction. A door with a side mirror is provided at the passenger opening and has a door window in its upper part. The camera may be located above a lower end of the door window and/or above an upper end of the side mirror. An extension window is provided rearward of the passenger opening, with a garnish member at an edge of the extension window. The camera may be provided on the garnish member.Type: ApplicationFiled: September 5, 2023Publication date: March 14, 2024Inventors: Shingo NAKAYAMA, Tadahiro MATORI, Akira FUJITA, Yuhei TANAKA
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Patent number: 11681224Abstract: Disclosed are a resin containing a structural unit represented by formula (I), a structural unit represented by formula (a1-1), a structural unit represented by formula (a1-2) and a structural unit represented by formula (a2-A), and a resist composition including the same:Type: GrantFiled: August 23, 2019Date of Patent: June 20, 2023Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Mutsuko Higo, Shingo Fujita, Koji Ichikawa
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Patent number: 11500288Abstract: Disclosed is a resin including a structural unit represented by formula (I) and a structural unit represented by formula (a2-A), and a resist composition: wherein R1 represents a hydrogen atom or a methyl group; L1 and L2 each represent —O— or —S—; s1 represents an integer of 1 to 3; s2 represents an integer of 0 to 3; Ra50 represents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom; Ra51 represents a halogen atom, a hydroxy group, an alkyl group, an alkoxy group, an alkylcarbonyl group or the like; Aa50 represents a single bond or *—Xa51-(Aa52-Xa52)nb—; Aa52 represents an alkanediyl group; Xa51 and Xa52 each represent —O—, —CO—O— or —O—CO—; nb represents 0 or 1; and mb represents an integer of 0 to 4.Type: GrantFiled: January 14, 2020Date of Patent: November 15, 2022Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Mutsuko Higo, Shingo Fujita, Koji Ichikawa
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Patent number: 11353790Abstract: Disclosed is a resin including a structural unit represented by formula (a1-5) and a structural unit represented by formula (I), and a resist composition: wherein Ra8 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; Za1 represents a single bond or *—(CH2)h3—CO-L54-; h3 represents an integer of 1 to 4; L51, L52, L53 and L54 each independently represent —O— or —S—; s1 represents an integer of 1 to 3; s1? represents an integer of 0 to 3; R1 represents a hydrogen atom or a methyl group; A1 represents a single bond or *—CO—O—; R2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; mi represents an integer of 1 to 3; and ni represents an integer of 0 to 4, in which mi+ni?5.Type: GrantFiled: January 14, 2020Date of Patent: June 7, 2022Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Mutsuko Higo, Shingo Fujita, Koji Ichikawa
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Patent number: 10915022Abstract: A photoresist composition comprising a resin which comprises a structural unit represented by the formula (I): and a salt represented by the formula (B1):Type: GrantFiled: June 20, 2018Date of Patent: February 9, 2021Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Katsuhiro Komuro, Shingo Fujita, Koji Ichikawa
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Patent number: 10795258Abstract: A resist composition which contains a resin (A1) which has a structural unit having a sulfonyl group, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g— where * represents a binding position to an oxygen atom, L2 and L3 independently represent a C1 to C12 divalent hydrocarbon group, “g” represents 0 or 1, and R3 represents a C1 to C12 liner or branched alkyl group except for a tertiary alkyl group.Type: GrantFiled: June 24, 2016Date of Patent: October 6, 2020Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Takayuki Miyagawa, Shingo Fujita, Koji Ichikawa
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Publication number: 20200233300Abstract: Disclosed is a resin including a structural unit represented by formula (I) and a structural unit represented by formula (a2-A), and a resist composition: wherein R1 represents a hydrogen atom or a methyl group; L1 and L2 each represent —O— or —S—; s1 represents an integer of 1 to 3; s2 represents an integer of 0 to 3; Ra50 represents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom; Ra51 represents a halogen atom, a hydroxy group, an alkyl group, an alkoxy group, an alkylcarbonyl group or the like; Aa50 represents a single bond or *—Xa51-(Aa52-Xa52)nb—; Aa52 represents an alkanediyl group; Xa51 and Xa52 each represent —O—, —CO—O— or —O—CO—; nb represents 0 or 1; and mb represents an integer of 0 to 4.Type: ApplicationFiled: January 14, 2020Publication date: July 23, 2020Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Mutsuko HIGO, Shingo FUJITA, Koji ICHIKAWA
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Publication number: 20200233301Abstract: Disclosed is a resin including a structural unit represented by formula (a1-5) and a structural unit represented by formula (I), and a resist composition: wherein Ra8 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; Za1 represents a single bond or *—(CH2)n3—CO-L54-; h3 represents an integer of 1 to 4; L51, L52, L53 and L54 each independently represent —O— or —S—; s1 represents an integer of 1 to 3; s1? represents an integer of 0 to 3; R1 represents a hydrogen atom or a methyl group; A1 represents a single bond or *—CO—O—; R2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; mi represents an integer of 1 to 3; and ni represents an integer of 0 to 4, in which mi+ni?5.Type: ApplicationFiled: January 14, 2020Publication date: July 23, 2020Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Mutsuko HIGO, Shingo FUJITA, Koji ICHIKAWA
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Publication number: 20200064735Abstract: Disclosed are a resin containing a structural unit represented by formula (I), a structural unit represented by formula (a1-1), a structural unit represented by formula (a1-2) and a structural unit represented by formula (a2-A), and a resist composition including the same:Type: ApplicationFiled: August 23, 2019Publication date: February 27, 2020Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Mutsuko HIGO, Shingo FUJITA, Koji ICHIKAWA
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Publication number: 20180373149Abstract: A photoresist composition comprising a resin which comprises a structural unit represented by the formula (I): and a salt represented by the formula (B1):Type: ApplicationFiled: June 20, 2018Publication date: December 27, 2018Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Katsuhiro KOMURO, Shingo FUJITA, Koji ICHIKAWA
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Patent number: 9760005Abstract: A salt having a group represented by formula (a): wherein Xa and Xb each independently represent an oxygen atom or a sulfur atom, X1 represents a divalent group having an alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and where a hydrogen atom may be replaced by a hydroxy group or a fluorine atom, and * represents a binding site.Type: GrantFiled: August 25, 2015Date of Patent: September 12, 2017Assignee: Sumitomo Chemical Company, LimitedInventors: Tatsuro Masuyama, Shingo Fujita, Koji Ichikawa
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Patent number: 9740102Abstract: A photoresist composition comprising: a resin (A1) which has an acid-labile group; a resin (A2) which comprises a structural unit represented by formula (I); wherein R1 represents a C1-C13 fluorinated saturated hydrocarbon group, A1 represents a single bond, a C1-C6 alkanediyl group, or *-A2-X1-(A3-X2)a-(A4)b-, and R2 represents a C1-C18 hydrocarbon group; and an acid generator.Type: GrantFiled: December 10, 2015Date of Patent: August 22, 2017Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Tatsuro Masuyama, Shingo Fujita, Koji Ichikawa
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Patent number: 9671693Abstract: A resist composition contains; (A1) a resin having a structural unit represented by the formula (aa) and at least one structural unit selected from the group consisting of a structural unit represented by the formula (a1-1) and a structural unit represented by the formula (a1-2); (A2) a resin which does not have the structural unit represented by the formula (aa) and which is insoluble or poorly soluble in aqueous alkali solution, but becomes soluble in aqueous alkali solution by the action of acid; and (B) an acid generator, wherein Raa1, Aaa1, Raa2, La1, La2, Ra4, Ra5, Ra6, Ra7, m1, n1 and n1? are defined in the specification.Type: GrantFiled: December 14, 2011Date of Patent: June 6, 2017Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Koji Ichikawa, Takashi Hiraoka, Shingo Fujita
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Patent number: 9638997Abstract: A resist composition includes (A1) a resin having an acid-labile group, (A2) a resin which includes a structural unit represented by formula (I), and an acid generator: wherein R1 represents a hydrogen atom or a C3 to C18 alicyclic hydrocarbon group, A1 represents a single bond, a C1 to C6 alkanediyl group or *-A2-X1-(A3-X2)a-(A4)b-, * represents a binding site to an oxygen atom, A2, A3 and A4 each independently represent a C1 to C6 alkanediyl group, X1 and X2 each independently represent —O—, —CO—O— or —O—CO—, a represents 0 or 1, b represents 0 or 1, and R2 represents a C1 to C13 fluorinated saturated hydrocarbon group.Type: GrantFiled: November 10, 2015Date of Patent: May 2, 2017Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Tatsuro Masuyama, Shingo Fujita, Koji Ichikawa
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Patent number: 9563123Abstract: A photoresist composition comprising: a resin having an acid-labile group, an acid generator, and a compound represented by formula (I): wherein R1, R2 and R3 each independently represents a C1-C24 hydrocarbon group in which a hydrogen atom can be replaced by a substituent and in which a methylene group can be replaced by an oxygen atom, a sulfur atom or a carbonyl group.Type: GrantFiled: March 2, 2015Date of Patent: February 7, 2017Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Tatsuro Masuyama, Shingo Fujita, Koji Ichikawa
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Publication number: 20160377979Abstract: A resist composition which contains a resin (A1) which has a structural unit having a sulfonyl group, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g— where * represents a binding position to an oxygen atom, L2 and L3 independently represent a C1 to C12 divalent hydrocarbon group, “g” represents 0 or 1, and R3 represents a C1 to C12 liner or branched alkyl group except for a tertiary alkyl group.Type: ApplicationFiled: June 24, 2016Publication date: December 29, 2016Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Takayuki MIYAGAWA, Shingo FUJITA, Koji ICHIKAWA
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Publication number: 20160170300Abstract: A photoresist composition comprising: a resin (A1) which has an acid-labile group; a resin (A2) which comprises a structural unit represented by formula (I); wherein R1 represents a C1-C13 fluorinated saturated hydrocarbon group, A1 represents a single bond, a C1-C6 alkanediyl group, or *-A2-X1-(A3-X2)a-(A4)b-, and R2 represents a C1-C18 hydrocarbon group; and an acid generator.Type: ApplicationFiled: December 10, 2015Publication date: June 16, 2016Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Tatsuro MASUYAMA, Shingo FUJITA, Koji ICHIKAWA
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Publication number: 20160130210Abstract: A compound represented by formula (I), a resin including a structural unit derived from the compound and a resist composition including the resin: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group in which a hydrogen atom may be replaced by a halogen atom, R2 represents a C1 to C6 perfluoroalkyl group or *—CHRf1Rf2, * represents a binding site to a carbonyl group, Rf1 and Rf2 each independently represent a C1 to C4 perfluoroalkyl group or Rf1 and Rf2 may be bonded together with a carbon atom bonded thereto to form a ring, A1 represents a single bond, a C1 to C6 alkanediyl group or **-A3-X1-(A4-X2)a-(A5)b-, ** represents a binding site to an oxygen atom, A2, A3, A4 and A5 each independently represent a C1 to C6 alkanediyl group, X1 and X2 each independently represent —O—, —CO—O— or —O—CO—, a and b each represent 0 or 1, and W1 represents a C5 to C18 divalent alicyclic hydrocarbon group.Type: ApplicationFiled: November 10, 2015Publication date: May 12, 2016Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yukako ANRYU, Shingo FUJITA, Koji ICHIKAWA