Patents by Inventor Shingo Naruse

Shingo Naruse has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9417522
    Abstract: The present invention provides a photosensitive resin composition comprising: an alkali-soluble resin (A); a compound having at least one ethylenically unsaturated double bond per molecule (B); a photo radical polymerization initiator having a keto oxime ester structure (C); and a compound represented by the Formula (1) or (2) below (D); wherein the content of the photo radical polymerization initiator (C) is 0.5 to 5 times the content of the compound (D), and the content of the photo radical polymerization initiator (C) with respect to 100 parts by mass of the compound (B) is 3 to 20 parts by mass. In Formula (1), the six R1s each independently represent a hydrogen atom or an electron-donating group, and n represents 0 or 1. In Formula (2), the six R2s each independently represent a hydrogen atom or an electron-donating group, and m represents 0 or 1.
    Type: Grant
    Filed: December 23, 2014
    Date of Patent: August 16, 2016
    Assignee: JSR CORPORATION
    Inventors: Hisanori Akimaru, Hirokazu Sakakibara, Hidefumi Ishikawa, Shingo Naruse
  • Publication number: 20150185604
    Abstract: The present invention provides a photosensitive resin composition comprising: an alkali-soluble resin (A); a compound having at least one ethylenically unsaturated double bond per molecule (B); a photo radical polymerization initiator having a keto oxime ester structure (C); and a compound represented by the Formula (1) or (2) below (D); wherein the content of the photo radical polymerization initiator (C) is 0.5 to 5 times the content of the compound (D), and the content of the photo radical polymerization initiator (C) with respect to 100 parts by mass of the compound (B) is 3 to 20 parts by mass. In Formula (1), the six R1s each independently represent a hydrogen atom or an electron-donating group, and n represents 0 or 1. In Formula (2), the six R2s each independently represent a hydrogen atom or an electron-donating group, and m represents 0 or 1.
    Type: Application
    Filed: December 23, 2014
    Publication date: July 2, 2015
    Applicant: JSR Corporation
    Inventors: Hisanori AKIMARU, Hirokazu Sakakibara, Hidefumi Ishikawa, Shingo Naruse
  • Patent number: 7932300
    Abstract: An energy beam curable type ink jet printing ink comprising (A) a colorant, (B) a compound having at least one ethylenically unsaturated bond which can be polymerized by the application of an energy beam and (C) a photopolymerization initiator, wherein the component (B) is a compound having at least one methacryloyl group as a sole polymerizable unsaturated group and the component (C) is a 2-alkyl-2-amino-2-benzyl-1-(4-morpholinophenyl)ethan-1-one. This ink has low viscosity, high sensitivity and sufficiently high film strength after curing.
    Type: Grant
    Filed: April 24, 2007
    Date of Patent: April 26, 2011
    Assignee: JSR Corporation
    Inventors: Hidenori Naruse, Shingo Naruse, Shingo Tanaka
  • Publication number: 20090118388
    Abstract: An energy beam curable type ink jet printing ink comprising (A) a colorant, (B) a compound having at least one ethylenically unsaturated bond which can be polymerized by the application of an energy beam and (C) a photopolymerization initiator, wherein the component (B) is a compound having at least one methacryloyl group as a sole polymerizable unsaturated group and the component (C) is a 2-alkyl-2-amino-2-benzyl-1-(4-morpholinophenyl)ethan-1-one. This ink has low viscosity, high sensitivity and sufficiently high film strength after curing.
    Type: Application
    Filed: April 24, 2007
    Publication date: May 7, 2009
    Applicant: JSR CORPORATION
    Inventors: Hidenori Naruse, Shingo Naruse, Shingo Tanaka
  • Publication number: 20090004578
    Abstract: There is provided a radiation-sensitive composition for forming a color filter used for a solid-state image sensing device excellent in resolution without generating residues and scumming on a silicon substrate or a silicon nitride substrate. The radiation-sensitive composition for forming the color filter for the solid-state image sensing device contains (A) a pigment, (B) a dispersant, (C) an alkali-soluble resin, (D) a polyfunctional monomer, (E) a photopolymerization initiator, and (F) a compound represented by the following formula (1): wherein R1 to R8 each denote independently a hydrogen atom, a halogen atom or a monovalent organic group. There is provided a color filter using the composition.
    Type: Application
    Filed: June 13, 2008
    Publication date: January 1, 2009
    Applicant: JSR CORPORATION
    Inventors: Shingo NARUSE, Tomokazu Miyazaki, Hidenori Naruse, Hideyuki Yoshizawa, Yukari Yamaguchi