Patents by Inventor Shinichi Bunya

Shinichi Bunya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5826512
    Abstract: An aluminum planographic printing plate includes an aluminum support and a hydrophilic layer disposed at least on one surface thereof, wherein a corner defined with a surface having the hydrophilic layer and an end face of the aluminum planographic printing plate is constituted with a convexly curved surface with no bending portion, a portion of the convexly curved surface is covered with the hydrophilic layer, and a vertical distance between an end portion of the hydrophilic layer and the flat surface of the hydrophilic layer is 10 to 60 .mu.m.
    Type: Grant
    Filed: June 4, 1996
    Date of Patent: October 27, 1998
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Kenji Niegawa, Shinichi Bunya, Naohide Ogita
  • Patent number: 5260161
    Abstract: Disclosed is a photosensitive composition comprising a diazo resin and a polymeric compound containing a structural unit represented by the following formula (I) in the molecule: ##STR1## wherein J represents a divalent linking group and n is 0 or 1. Disclosed is also a photosensitive lithographic printing using the photosensitive composition.
    Type: Grant
    Filed: July 31, 1992
    Date of Patent: November 9, 1993
    Assignees: Konica Corporation, Mitsubishi Kasei Corporation
    Inventors: Toshiyuki Matsumura, Shinichi Matsubara, Masafumi Uehara, Shinichi Bunya, Eriko Katahashi
  • Patent number: 5009981
    Abstract: A photosensitive composition, comprising a photosensitive diazo compound and a polymeric binder, wherein the diazo compound has a polymerizable unsaturated bond in the molecule.
    Type: Grant
    Filed: September 20, 1990
    Date of Patent: April 23, 1991
    Assignees: Konica Corporation, Mitsubishi Kasei Corporation
    Inventors: Shinichi Matsubara, Masafumi Uehara, Shinichi Bunya, Eriko Katahashi
  • Patent number: 4267260
    Abstract: A developer for use with a lithographic photo-sensitive medium of a polyether resin, comprising a compound of the formula:RO--CH.sub.2 --CH.sub.2 --O--.sub.k R.sup.1orROCH.sub.2 CH.sub.2 OR.sup.2(wherein R represents an alkyl group with carbon number of 1 to 4, R.sup.1 represents hydrogen or an acyl group, R.sup.2 represents an acyl group with a carbon number of 2 to 5, and k represents an integer of 2 to 3).
    Type: Grant
    Filed: July 19, 1976
    Date of Patent: May 12, 1981
    Assignee: Mitsubishi Chemical Industries, Ltd.
    Inventors: Konoe Miura, Chihiro Eguchi, Yoshihiro Takahashi, Akinobu Oshima, Kazuo Torige, Shinichi Bunya