Abstract: The present invention provides a processing system that includes a first apparatus and a second apparatus, and processes a substrate, wherein the first apparatus includes a first measurement unit configured to detect a first structure and a second structure different from the first structure provided on the substrate, and measure a relative position between the first structure and the second structure, and the second apparatus includes an obtainment unit configured to obtain the relative position measured by the first measurement unit, a second measurement unit configured to detect the second structure and measure a position of the second structure, and a control unit configured to obtain a position of the first structure based on the relative position obtained by the obtainment unit and the position of the second structure measured by the second measurement unit.

Abstract: The present invention provides a processing system that includes a first apparatus and a second apparatus, and processes a substrate, wherein the first apparatus includes a first measurement unit configured to detect a first structure and a second structure different from the first structure provided on the substrate, and measure a relative position between the first structure and the second structure, and the second apparatus includes an obtainment unit configured to obtain the relative position measured by the first measurement unit, a second measurement unit configured to detect the second structure and measure a position of the second structure, and a control unit configured to obtain a position of the first structure based on the relative position obtained by the obtainment unit and the position of the second structure measured by the second measurement unit.

Abstract: The present invention provides a processing system that includes a first apparatus and a second apparatus, and processes a substrate, wherein the first apparatus includes a first measurement unit configured to detect a first structure and a second structure different from the first structure provided on the substrate, and measure a relative position between the first structure and the second structure, and the second apparatus includes an obtainment unit configured to obtain the relative position measured by the first measurement unit, a second measurement unit configured to detect the second structure and measure a position of the second structure, and a control unit configured to obtain a position of the first structure based on the relative position obtained by the obtainment unit and the position of the second structure measured by the second measurement unit.

Abstract: The alignment apparatus performs alignment of an object in a first direction along a surface of the object, based on a position of a predetermined target formed on the surface, and includes a holding unit that holds the object to be moved, an acquisition unit that acquires an image of the predetermined target formed on the surface of the object held by the holding unit, and a controller that drives the holding unit to realize a relative distance between the object and the acquisition unit in a second direction perpendicular to the surface of the object, a relative tilt between the object and the acquisition unit, or the distance and the tilt, the distance and the tilt being determined based on a correlation degree between the image acquired by the acquisition unit and a template, and detects a position of the predetermined target in the first direction based on the correlation degree.

Abstract: Provided is a method of determining, out of a plurality of shot regions of a substrate, a set of sample shot regions in each of which a position of a mark is to be actually measured. The method includes setting an initial arrangement of the set of sample shot regions, and adding, to the set of sample shot regions, a shot region, among the shot regions other than the sample shot regions in the initial arrangement, in which a value indicating uncertainty of an estimate of a measurement value of a position of a mark obtained using an estimation model exceeds a predetermined threshold value.

Abstract: A measurement apparatus that measures a position of a mark formed between first and surfaces of a substrate is provided. The apparatus includes a stage that holds and moves the substrate, a first detector that detects an image of the mark, a second detector that detects a height position of the first surface, and a processor that determines, based on the detected height position, an offset amount used to set the focus of the first detector to the mark. The processor includes a first mode in which the offset amount is determined based on a first distance set as a distance from the first surface to the mark, and a second mode in which the offset amount is determined based on a second distance set as a distance from the second surface to the mark.

Abstract: A method of determining a mark position, includes determining, based on a position of a mark image on an image acquired by using a scope that captures an image of a mark, a temporary position of the mark image, determining a correction amount for correcting the temporary position based on a distortion map indicating a two-dimensional distribution of distortion amounts of the scope, and the mark image, and determining a position of the mark by correcting the temporary position based on the correction amount.

Abstract: The alignment apparatus performs alignment of an object in a first direction along a surface of the object, based on a position of a predetermined target formed on the surface, and includes a holding unit that holds the object to be moved, an acquisition unit that acquires an image of the predetermined target formed on the surface of the object held by the holding unit, and a controller that drives the holding unit to realize a relative distance between the object and the acquisition unit in a second direction perpendicular to the surface of the object, a relative tilt between the object and the acquisition unit, or the distance and the tilt, the distance and the tilt being determined based on a correlation degree between the image acquired by the acquisition unit and a template, and detects a position of the predetermined target in the first direction based on the correlation degree.

Abstract: The present invention provides a pattern forming apparatus including a detection optical system configured to obtain optical information of a mark provided on a substrate by detecting the mark, and a processing unit configured to perform a process of obtaining a position of the mark by using a template for obtaining the position of the mark by being applied to the optical information of the mark and a window which indicates a region for extracting an amount of characteristic indicating the position of the mark from a waveform signal obtained from the optical information, wherein the processing unit decides, based on the optical information of the mark obtained by the detection optical system, a parameter indicating at least one of a shape of the template and a shape of the window for each of a plurality of substrates.

Abstract: A measurement apparatus that measures a position of a mark formed between first and surfaces of a substrate is provided. The apparatus includes a stage that holds and moves the substrate, a first detector that detects an image of the mark, a second detector that detects a height position of the first surface, and a processor that determines, based on the detected height position, an offset amount used to set the focus of the first detector to the mark. The processor includes a first mode in which the offset amount is determined based on a first distance set as a distance from the first surface to the mark, and a second mode in which the offset amount is determined based on a second distance set as a distance from the second surface to the mark.

Abstract: The present invention provides a pattern forming apparatus including a detection optical system configured to obtain optical information of a mark provided on a substrate by detecting the mark, and a processing unit configured to perform a process of obtaining a position of the mark by using a template for obtaining the position of the mark by being applied to the optical information of the mark and a window which indicates a region for extracting an amount of characteristic indicating the position of the mark from a waveform signal obtained from the optical information, wherein the processing unit decides, based on the optical information of the mark obtained by the detection optical system, a parameter indicating at least one of a shape of the template and a shape of the window for each of a plurality of substrates.

Abstract: The present invention provides a measurement apparatus that measures a position of an object, the apparatus including a detector configured to detect a mark formed on the object and generate a detection signal, and a processor configured to obtain the position of the object based on the detection signal, wherein the processor is configured to obtain the position of the object based on a portion of the detection signal that is limited based on information about a tolerance regarding a measurement precision for the object.

Abstract: A lithography apparatus includes a detector that detects an original-side mark image and a substrate-side mark image via a projection optical system, and a controller. The detector generates refocusable light field image data that includes the original-side mark image and the substrate-side mark image. The controller performs, based on the light field image data obtained from the detector, a refocus operation of reconstructing a plurality of images different in position in a focus direction and adjusts a position of at least one of the original holder and the substrate holder based on the plurality of images reconstructed by the refocus operation.

Abstract: The present invention provides a measurement apparatus that measures a position of an object, the apparatus including a detector configured to detect a mark formed on the object and generate a detection signal, and a processor configured to obtain the position of the object based on the detection signal, wherein the processor is configured to obtain the position of the object based on a portion of the detection signal that is limited based on information about a tolerance regarding a measurement precision for the object.

Abstract: A lithography apparatus includes a detector that detects an original-side mark image and a substrate-side mark image via a projection optical system, and a controller. The detector generates refocusable light field image data that includes the original-side mark image and the substrate-side mark image. The controller performs, based on the light field image data obtained from the detector, a refocus operation of reconstructing a plurality of images different in position in a focus direction and adjusts a position of at least one of the original holder and the substrate holder based on the plurality of images reconstructed by the refocus operation.

Abstract: An exposure apparatus sequentially performs exposure in each of a plurality of underlying shot regions formed on a substrate and includes a controller. The controller is configured to judge, for each of the plurality of shot regions, whether to perform one-shot exposure without dividing the shot region or divided exposure, based on information of respective shapes of the plurality of shot regions, determine a shape of each partial region in the shot region in which the divided exposure is to be performed, and control the exposure so as to perform the one-shot exposure or the divided exposure in each of the plurality of shot regions based on a result of the judgment and the determined shape of each partial region.

Abstract: A management apparatus receives image data corresponding to item numbers of the JGAP criteria or foods from each training support apparatus. The management apparatus generates, for each item number, an image data group of image data having been rearranged based on their priorities. The management apparatus notifies the image data groups to each training support apparatus. The training support apparatus performs display control of respective image data associated with each item number, based on the image data groups notified from the management apparatus.

Abstract: The present invention provides a measurement apparatus that measures a position of an object, the apparatus including a detector configured to detect a mark formed on the object and generate a detection signal, and a processor configured to obtain the position of the object based on the detection signal, wherein the processor is configured to obtain the position of the object based on a portion of the detection signal that is limited based on information about a tolerance regarding a measurement precision for the object.

Abstract: An exposure apparatus sequentially performs exposure in each of a plurality of underlying shot regions formed on a substrate and includes a controller. The controller is configured to judge, for each of the plurality of shot regions, whether to perform one-shot exposure without dividing the shot region or divided exposure, based on information of respective shapes of the plurality of shot regions, determine a shape of each partial region in the shot region in which the divided exposure is to be performed, and control the exposure so as to perform the one-shot exposure or the divided exposure in each of the plurality of shot regions based on a result of the judgment and the determined shape of each partial region.

Abstract: An inspection supporting apparatus includes a storage unit and a generating unit, for example. The storage unit stores therein different types of templates for each check item that is an inspection object for which it is determined whether a predetermined criterion for a site to handle agricultural crops or foods is satisfied, and stores a master in which the types of the templates and an order of arrangement of the templates are defined for each inspection object. The generating unit, upon receiving a selection of the inspection object, generates a frame in which the templates are arranged based on the selected inspection object and the master.