Patents by Inventor Shinichi Hikosaka

Shinichi Hikosaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8815130
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Grant
    Filed: October 5, 2007
    Date of Patent: August 26, 2014
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hironori Kobayashi, Manabu Yamamoto, Daigo Aoki, Hironori Kamiyama, Shinichi Hikosaka, Mitsuhiro Kashiwabara
  • Patent number: 8785108
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Grant
    Filed: October 5, 2007
    Date of Patent: July 22, 2014
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hironori Kobayashi, Manabu Yamamoto, Daigo Aoki, Hironori Kamiyama, Shinichi Hikosaka, Mitsuhiro Kashiwabara
  • Patent number: 8268546
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Grant
    Filed: May 19, 2008
    Date of Patent: September 18, 2012
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hironori Kobayashi, Manabu Yamamoto, Daigo Aoki, Hironori Kamiyama, Shinichi Hikosaka, Mitsuhiro Kashiwabara
  • Patent number: 7998662
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Grant
    Filed: May 27, 2009
    Date of Patent: August 16, 2011
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hironori Kobayashi, Manabu Yamamoto, Daigo Aoki, Hironori Kamiyama, Shinichi Hikosaka, Mitsuhiro Kashiwabara
  • Patent number: 7965446
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Grant
    Filed: October 5, 2007
    Date of Patent: June 21, 2011
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hironori Kobayashi, Manabu Yamamoto, Daigo Aoki, Hironori Kamiyama, Shinichi Hikosaka, Mitsuhiro Kashiwabara
  • Patent number: 7943275
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Grant
    Filed: October 5, 2007
    Date of Patent: May 17, 2011
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hironori Kobayashi, Manabu Yamamoto, Daigo Aoki, Hironori Kamiyama, Shinichi Hikosaka, Mitsuhiro Kashiwabara
  • Publication number: 20100112311
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Application
    Filed: January 6, 2010
    Publication date: May 6, 2010
    Inventors: Hironori KOBAYASHI, Manabu YAMAMOTO, Daigo AOKI, Hironori KAMIYAMA, Shinichi HIKOSAKA, Mitsuhiro KASHIWABARA
  • Publication number: 20090233243
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Application
    Filed: May 27, 2009
    Publication date: September 17, 2009
    Inventors: Hironori KOBAYASHI, Manabu YAMAMOTO, Daigo AOKI, Hironori KAMIYAMA, Shinichi HIKOSAKA, Mitsuhiro KASHIWABARA
  • Patent number: 7575845
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Grant
    Filed: June 15, 2001
    Date of Patent: August 18, 2009
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hironori Kobayashi, Manabu Yamamoto, Daigo Aoki, Hironori Kamiyama, Shinichi Hikosaka, Mitsuhiro Kashiwabara
  • Publication number: 20080254394
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Application
    Filed: May 19, 2008
    Publication date: October 16, 2008
    Inventors: Hironori KOBAYASHI, Manabu YAMAMOTO, Daigo AOKI, Hironori KAMIYAMA, Shinichi HIKOSAKA, Mitsuhiro KASHIWABARA
  • Publication number: 20080085478
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Application
    Filed: October 5, 2007
    Publication date: April 10, 2008
    Inventors: Hironori KOBAYASHI, Manabu YAMAMOTO, Daigo AOKI, Hironori KAMIYAMA, Shinichi HIKOSAKA, Mitsuhiro KASHIWABARA
  • Publication number: 20080081283
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Application
    Filed: October 5, 2007
    Publication date: April 3, 2008
    Inventors: Hironori KOBAYASHI, Manabu YAMAMOTO, Daigo AOKI, Hironori KAMIYAMA, Shinichi HIKOSAKA, Mitsuhiro KASHIWABARA
  • Publication number: 20080070156
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Application
    Filed: October 5, 2007
    Publication date: March 20, 2008
    Inventors: Hironori KOBAYASHI, Manabu YAMAMOTO, Daigo AOKI, Hironori KAMIYAMA, Shinichi HIKOSAKA, Mitsuhiro KASHIWABARA
  • Publication number: 20080043337
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Application
    Filed: October 5, 2007
    Publication date: February 21, 2008
    Inventors: Hironori KOBAYASHI, Manabu YAMAMOTO, Daigo AOKI, Hironori KAMIYAMA, Shinichi HIKOSAKA, Mitsuhiro KASHIWABARA
  • Publication number: 20080023858
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Application
    Filed: October 5, 2007
    Publication date: January 31, 2008
    Inventors: Hironori KOBAYASHI, Manabu YAMAMOTO, Daigo AOKI, Hironori KAMIYAMA, Shinichi HIKOSAKA, Mitsuhiro KASHIWABARA
  • Publication number: 20080026304
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Application
    Filed: October 5, 2007
    Publication date: January 31, 2008
    Inventors: Hironori KOBAYASHI, Manabu YAMAMOTO, Daigo AOKI, Hironori KAMIYAMA, Shinichi HIKOSAKA, Mitsuhiro KASHIWABARA
  • Publication number: 20020006558
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Application
    Filed: June 15, 2001
    Publication date: January 17, 2002
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Hironori Kobayashi, Manabu Yamamoto, Daigo Aoki, Hironori Kamiyama, Shinichi Hikosaka, Mitsuhiro Kashiwabara
  • Patent number: 6294313
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Grant
    Filed: April 8, 1999
    Date of Patent: September 25, 2001
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hironori Kobayashi, Manabu Yamamoto, Daigo Aoki, Hironori Kamiyama, Shinichi Hikosaka, Mitsuhiro Kashiwabara
  • Patent number: 5170467
    Abstract: A method of preparing printing plates for printing leaflets, catalogs or the like using a computer. The design for a leaflet, a catalog or the like is classified into line drawings, photographs and characters and they are introduced into a computer through predetermined input units, respectively. Then, they are laid out while being displayed on a display and how they have been laid out is confirmed by the hard copy. The press plates for printing are prepared on the basis of data output from the computer. Additionally, a method of laying out line drawings, photographs and characters on a display with high efficiency. The line drawings are laid out by designating the size and the angle of the line drawing to be laid out on a display in an analog fashion. The photographs are laid out by displaying only the contour line of the photograph on the display.
    Type: Grant
    Filed: May 20, 1991
    Date of Patent: December 8, 1992
    Assignee: Dai Nippon Insatsu Kabushiki Kaisha
    Inventors: Yasuo Kubota, Shinichi Hikosaka, Shigekazu Ohki, Toshio Modegi, Yasunori Tomoda
  • Patent number: 4585553
    Abstract: Apparatus particularly useful for the removal of iron particles and other magnetic solids from printing ink. Included is a casing (22) through which flows a liquid to be clarified. A plurality of straight bar magnets (M), mounted to the inside surface of a tubular sheath (50), are magnetically attached to the outer surface of the casing for creating magnetic fields within the casing. The magnetic solids contained in the liquid are magnetically attracted to the inside surface of the casing and so are separated from the liquid. The detachment of the magnets from the casing causes the separated solids to settle to the bottom of the casing for easy discharge through a drain port (38) formed therein. A cartridge filter (28) is provided centrally within the casing for the separation of nonmagnetic solids from the liquid.
    Type: Grant
    Filed: November 21, 1983
    Date of Patent: April 29, 1986
    Assignee: Dai Nippon Insatsu Kabushiki Kaisha
    Inventors: Shinichi Hikosaka, Shinya Fujino, Takao Fukaya