Patents by Inventor Shinichi KAMEI

Shinichi KAMEI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11760717
    Abstract: The resin composition of the present disclosure contains a fluorene derivative represented by the following formula (1) and a polyamide-series resin: Wherein R1 represents a substituent, k denotes an integer of 0 to 8, R2a, R2b, R2c, and R2d each represent a hydrogen atom or a substituent, R3a and R3b each represent a hydrogen atom or a substituent, and X1a and X1b each represent a group defined in the following formula (X1): wherein R4 and R5 each represent a hydrogen atom or a hydrocarbon group; or R4 and R5 bend together to form a heterocyclic ring containing the nitrogen atom adjacent to R4 and R5. The resin composition has an excellent fluidity.
    Type: Grant
    Filed: December 21, 2020
    Date of Patent: September 19, 2023
    Assignee: OSAKA GAS CHEMICALS CO., LTD.
    Inventors: Yuki Ouchi, Shinichi Kamei, Tomoharu Tachikawa, Tomoya Hasegawa, Haruka Katakura
  • Publication number: 20210294013
    Abstract: Provided are a retardation film that has a high heat resistance, has excellent formability and handleability even in a single-layer structure, has a negative thickness-direction retardation Rth value, and is suitable as a negative A-plate or a positive C-plate and a method for producing the film. The retardation film is formed of a stretched film of a polyester resin, contains a unit (A1) represented by the formula (1) as a diol unit (A) and a unit (B1) represented by the formula (2a) or (2b) as a dicarboxylic acid unit (B), and is a negative A-plate or a positive C-plate. In the formulae, Z1 and Z2 represent an aromatic hydrocarbon ring, R1, R2a, R2b, R3a and R3b represent a substituent, k, p1 and p2 denotes an integer of 0 to 8, q denotes an integer of 0 to 4, m1, m2, n1 and n2 denotes an integer of not less than 0, A1a and A1b represents an alkylene group, and A2a, A2b and A3 represents a divalent hydrocarbon group.
    Type: Application
    Filed: August 7, 2019
    Publication date: September 23, 2021
    Applicant: Osaka Gas Chemicals Co., Ltd.
    Inventors: Yoshiya OTA, Shinichi KAMEI, Shinsuke MIYAUCHI
  • Patent number: 10241001
    Abstract: There are provided an antifog property evaluating apparatus and an antifog property evaluating method capable of quantitatively and objectively evaluating an antifog property in a more realistic situation. The antifog property evaluating apparatus includes: fogging generation devices configured to generate the fogging of a surface of a sample; an object disposed at a position different from that of the sample; an imaging device configured to image the object via the sample; and an evaluation device configured to evaluate the antifog property of the sample on the basis of object images acquired by imaging the object.
    Type: Grant
    Filed: November 2, 2016
    Date of Patent: March 26, 2019
    Assignee: KYOWA INTERFACE SCIENCE CO., LTD.
    Inventors: Shinichi Kamei, Makoto Uchiumi, Yuichiro Higo
  • Publication number: 20170122836
    Abstract: There are provided an antifog property evaluating apparatus and an antifog property evaluating method capable of quantitatively and objectively evaluating an antifog property in a more realistic situation. The antifog property evaluating apparatus includes: fogging generation devices configured to generate the fogging of a surface of a sample; an object disposed at a position different from that of the sample; an imaging device configured to image the object via the sample; and an evaluation device configured to evaluate the antifog property of the sample on the basis of object images acquired by imaging the object.
    Type: Application
    Filed: November 2, 2016
    Publication date: May 4, 2017
    Inventors: Shinichi KAMEI, Makoto UCHIUMI, Yuichiro HIGO