Abstract: A coil spring includes a wire rod and an elastic coat provided on the wire rod. The coil spring includes a coil section including a plurality of coil portions. The wire rod includes a round cross-sectional portion, a cross-section varying portion, and a rectangular cross-sectional portion along the longitudinal direction of the wire rod. The cross section of the rectangular cross-sectional portion is substantially square and has a first plane and a second plane. The first plane and the second plane oppose each other in the coil section. The elastic coat is provided on at least one of the first plane and the second plane. The elastic coat is continuous from the round cross-sectional portion to the cross-sectional variation portion and the rectangular cross-sectional portion.

Abstract: In a plasma film forming apparatus, two first electrodes 51 connected to a power source 4 and two grounded second electrodes 52 are arranged in the order of the second electrode 52, the first electrode 51, the first electrode 51 and the second electrode 52. A first flow passage 50a formed between the central first electrodes 51 allows a raw material gas (first gas) for being formed into a film to pass therethrough. A plasma discharge space 50b of a second flow passage formed between the first and second electrodes 51, 52 on the both sides allows an excitable gas (second gas) to pass therethrough, which excitable gas is exited by plasma such that the raw material can be formed into a film, but that the excitable gas itself is merely excited but not formed into a film. Those gases are converged at a crossing part 20c between the first and second flow passages and blown off via a common blowoff passage 25a.

Abstract: A tungsten-containing mesoporous silica thin film, which is a mesoporous silica thin film formed from a solution containing a silica precursor and a water-soluble tungsten compound, and has a molar ratio (W/Si) of tungsten content to silicon content of 0.001 to 0.04, a film thickness of 0.1 to 5 ?m, and an average pore diameter of 20 nm or less.

Abstract: A resin composition, and molded articles thereof, where the resin composition simultaneously satisfies resistances, such as heat and environmental resistance, and moldability at high levels, and has excellent optical properties, such as high refractivity and low birefringence. The resin composition contains a polyester resin formed from a dicarboxylic acid component and a diol component (a) and a polycarbonate resin formed from a carbonate-forming component and a diol component (b), the diol component (a) containing a specific fluorene-containing compound and the diol component (b) containing a specific fluorene-containing compound.

Abstract: The present invention discloses an infrared absorption filter which enables a coloring matter having infrared absorptivity to be contained or dispersed uniformly in a high concentration and has excellent durability, and an infrared absorption panel comprising this infrared absorption filter. The infrared absorption filter comprises a polycarbonate resin which contains 20 to 100 mol % of a recurring unit having a fluorene skeleton represented by the formula (1) and 0 to 80 mol % of a recurring unit represented by the formula (2), and a coloring matter having infrared absorptivity.

Abstract: A valve has a housing, a shaft with a valve disc, and a sliding shaft support portion along which the shaft slides, wherein the sliding shaft support portion is provided with a seal member movable and deformable in a certain range.

Abstract: A top surface layer of an electrophotographic photosensitive element (e.g., a charge-transporting layer) is rendered to contain a cyclic polysilane represented by the following formula (1). In the formula, R1 and R2 are the same or different from each other and each represents a group such as an alkyl group, an aryl group, and “m” denotes an integer of not less than 4. The cyclic polysilane may be a copolysilane. The content of the cyclic polysilane may be about 0.01 to 10% by weight relative to the whole components of the top surface layer.

Abstract: This invention seeks to provide a resin composition that can simultaneously satisfy resistances such as heat resistance and environmental resistance and moldability at high levels and that has excellent optical properties such as high refractivity and low birefringence and molded article thereof. The present invention is a resin composition containing a polyester resin formed from a dicarboxylic acid component and a diol component (a) and a polycarbonate resin formed from a carbonate-forming component and a diol component (b), the diol component (a) containing a specific fluorene-containing compound and the diol component (b) containing a specific fluorene-containing compound.

Abstract: It is an object of the present invention to provide an infrared absorption filter which enables a coloring matter having infrared absorptivity to be contained or dispersed uniformly in a high concentration and has excellent durability and an infrared absorption panel comprising this infrared absorption filter. The infrared absorption filter is composed of a polycarbonate resin which contains 20 to 100 mol % of a recurring unit having a fluorene skeleton represented by the formula (1) and 0 to 80 mol % of a recurring unit represented by the formula (2) and a coloring matter having infrared absorptivity.

Abstract: [PROBLEM TO BE SOLVED]In a surface processing apparatus for spraying a processing gas onto the surface of an object to be processed through a hole-row such as a slit, the surface of the object having a large area can effectively be processed even if the hole-row is short. [MEANS FOR SOLVING] A plurality of electrode plates 11, 12 are arranged, in side-by-side relation, on a processor 1 of a plasma surface processing apparatus M. A slit-like hole-row 10a is formed between the adjacent electrode plates, and a hole-row group 100 is constituted by the side-by-side arranged hole-rows 10a. The object W is moved along the extending direction of each slit 10a by a moving mechanism 4.

Abstract: In a plasma film forming apparatus, two first electrodes 51 connected to a power source 4 and two grounded second electrodes 52 are arranged in the order of the second electrode 52, the first electrode 51, the first electrode 51 and the second electrode 52. A first flow passage 50a formed between the central first electrodes 51 allows a raw material gas (first gas) for being formed into a film to pass therethrough. A plasma discharge space 50b of a second flow passage formed between the first and second electrodes 51, 52 on the both sides allows an excitable gas (second gas) to pass therethrough, which excitable gas is exited by plasma such that the raw material can be formed into a film, but that the excitable gas itself is merely excited but not formed into a film. Those gases are converged at a crossing part 20c between the first and second flow passages and blown off via a common blowoff passage 25a.

Abstract: A top surface layer of an electrophotographic photosensitive element (e.g., a charge-transporting layer) is rendered to contain a cyclic polysilane represented by the following formula (1). In the formula, R1 and R2 are the same or different from each other and each represents a group such as an alkyl group, an aryl group, and “m” denotes an integer of not less than 4. The cyclic polysilane may be a copolysilane. The content of the cyclic polysilane may be about 0.01 to 10% by weight relative to the whole components of the top surface layer.

Abstract: An apparatus for forming an oxide film on the surface of a substrate S by a CVD method under the pressure conditions close to the atmospheric pressure, comprising: gas supply sources 3A, 3B for supplying process gases of two components, a raw gas (A) comprising a silicon-contained gas such as TMOS, MTMOS or the like, and a reactive gas (B) comprising an oxidizing gas such as O2, N2O or the like, and a discharge processing section 1. The process gas (A) is mixed, in the vicinity of the surface of a substrate without discharge processing, with the process gas (B) discharge processed in the discharge processing section 1, whereby in the CVD method under normal pressure, an oxide film which is excellent in membranous and coverage property is formed at a fast film forming speed. More preferably, a H2O gas discharge processed or not discharge processed is mixed.

Abstract: A valve has a housing, a shaft with a valve disc, and a sliding shaft support portion along which the shaft slides, wherein the sliding shaft support portion is provided with a seal member movable and deformable in a certain range.

Abstract: In a plasma film forming apparatus, two first electrodes 51 connected to a power source 4 and two grounded second electrodes 52 are arranged in the order of the second electrode 52, the first electrode 51, the first electrode 51 and the second electrode 52. A first flow passage 50a formed between the central first electrodes 51 allows a raw material gas (first gas) for being formed into a film to pass therethrough. A plasma discharge space 50b of a second flow passage formed between the first and second electrodes 51, 52 on the both sides allows an excitable gas (second gas) to pass therethrough, which excitable gas is exited by plasma such that the raw material can be formed into a film, but that the excitable gas itself is merely excited but not formed into a film. Those gases are converged at a crossing part 20c between the first and second flow passages and blown off via a common blowoff passage 25a.

Abstract: A flow quantity control valve includes second spring holder that is fixed within housing and holds one end of valve spring which is located on a side of valve disk. The second spring holder is a roughly cylindrical member made of a material with a lower thermal conductivity than that of the housing 1 made of cast iron; and is composed of roughly circular internal bottom, stay portion that is a body portion extending from the outer periphery of the internal bottom and surrounding the valve spring, a through hole formed in a center of the internal bottom and having a larger internal diameter than the external diameter of surrounding wall constituting another through hole of the housing and flange portion radially and outwardly extending from a upper part of the stay portion and having a roughly rectangular periphery portion.

Abstract: A flow quantity control valve includes second spring holder that is fixed within housing and holds one end of valve spring which is located on a side of valve disk. The second spring holder is a roughly cylindrical member made of a material with a lower thermal conductivity than that of the housing 1 made of cast iron; and is composed of roughly circular internal bottom, stay portion that is a body portion extending from the outer periphery of the internal bottom and surrounding the valve spring, a through hole formed in a center of the internal bottom and having a larger internal diameter than the external diameter of surrounding wall constituting another through hole of the housing and flange portion radially and outwardly extending from a upper part of the stay portion and having a roughly rectangular periphery portion.

Abstract: The present invention provides a technique for joining polyolefin pipes by means of a polyolefin joint, the method comprising the steps of placing a treatment containing a silicon compound or a treatment containing a silicon compound and a reaction accelerator between the pipes and the joint and heating a joining portion.

Abstract: An exhaust gas re-circulation valve which allows the accurate control of high temperature and pressure exhaust gas flowing through the engine exhaust gas re-circulation passage of a turbo diesel vehicle or the like. Valve seats 28, 29, valves 31, 32 and a valve shaft are mounted on a valve housing 21 and an adjustable adjusting mechanism 36,51,28b,71 is provided which allows both the first valve 31 and the first valve seat 28 and the second valve 32 and the second valve seat 29 to close in abutment by displacement or deformation. In this way even if there is an irregularity in the process or assembly accuracy of the components of the exhaust gas re-circulation valve, it can be absorbed by the adjustable mechanism 36, 51, 28b, 71. As a result the formation of gaps between the valve and the valve seat as a result of irregularities in the in the process or assembly accuracy of the components of the exhaust gas re-circulation valve can be prevented and valve accuracy can be improved.

Abstract: A method for producing polysilanes comprising subjecting a dihalosilane of the general formula (wherein m is 1 to 3; R represents hydrogen atom, alkyl group, aryl group, alkoxy group, amino group or silyl group and two Rs are the same or different in case of m=1, four Rs are the same or at least two of them are different in case of m=2 and six Rs are the same or at least two of them are different in case of m=3; X represents halogen atom) to the action of Mg or Mg alloy in an aprotic solvent in the presence of Li salt and metal halide, thereby producing polysilane represented by the general formula (wherein R is as defined above corresponding to the starting material; n is 2 to 1000).