Abstract: A vapor deposition device (100) includes a vapor deposition source (30), a vapor deposition mask (10), a limiting plate unit (20), and a gas supply mechanism (50). The limiting plate unit (20) is disposed between the vapor deposition source and the vapor deposition mask. The gas supply mechanism (50) causes a gas wall (501) to be formed in a non-opening portion (13). The non-opening portion (13) is a portion between the vapor deposition mask and the limiting plate unit. The non-opening portion (13) is positioned between limiting-plate openings (21) of the limiting plate unit, which are adjacent to each other, and is positioned between mask opening regions (11) of the vapor deposition mask, which are adjacent to each other in plan view.

Abstract: Provided is a display device with high productivity and with reduced color shift in light-emitting elements and reduced degradation in light-emitting element characteristics. An electron transport film (4c) formed on a blue light-emitting film (4b) in B pixels is thicker than an electron transport film (6d) formed on a green light-emitting film (6b) and a red light-emitting film (6c) in G and R pixels so that the remaining film percentage of the electron transport film (4c) after exposure to heat generated by irradiation with laser light is higher than the remaining film percentage of the electron transport film (6d) after exposure to heat generated by irradiation with laser light.

Abstract: In plan view, a magnet plate (10) has a first magnetic domain (11) and a second magnetic domain (12), a magnetic domain boundary line (14) is inclined to an opening side (26) and is bent or curved, and the magnet plate has magnetic fields that are generated in a respective plurality of different directions.

Abstract: The organic EL display panel includes: a substrate; and an organic electroluminescent element disposed on the substrate, the organic electroluminescent element including, in the given order: an anode; a light-emitting layer; and a cathode, the light-emitting layer including multiple light-emitting portions, the multiple light-emitting portions each providing a luminescent color different from the luminescent color of the adjacent light-emitting portion, the multiple light-emitting portions each containing a luminescent dopant material, the concentration of the luminescent dopant material in each light-emitting portion changing in the thickness direction of the light-emitting portion and being at a local maximum in the vicinity of a first interface on the anode side and in the vicinity of a second interface on the cathode side, the local maximum in each light-emitting portion being 20% by weight or higher of the total weight of the light-emitting portion.

Abstract: The present invention provides an organic EL element having high luminous efficacy and productivity and an organic EL panel including the organic EL element. The organic electroluminescent element of the present invention includes, in the given order, an anode, a hole-transport layer, a luminescent unit, an electron-transport layer, and a cathode. The luminescent unit includes a mixed light-emitting layer and includes a luminescent dopant layer at least between the hole-transport layer and the mixed light-emitting layer or between the electron-transport layer and the mixed light-emitting layer. The mixed light-emitting layer contains a first luminescent host material and a first luminescent dopant material. The luminescent dopant layer consists essentially of a second luminescent dopant material and is thinner than the mixed light-emitting layer.

Abstract: A vapor deposition device (1) includes: a vapor deposition source (30); a vapor deposition mask (10) having a plurality of mask openings (12); and a limiting plate unit (20) having a plurality of limiting plates (22). The limiting plate unit is configured such that, in a cross section parallel to an X axis direction, (i) the limiting plate unit includes at least one limiting plate opening (23), each of which is formed between the limiting plates and opposite to a respective one of at least one target region (202) of a target substrate (200) such that the at least one limiting plate opening and the at least one target region are in one-to-one correspondence and (ii) the limiting plate unit prevents entry into the mask openings by vapor deposition particles (310) whose angle of entry is less than a shadow critical angle.

Abstract: A vapor deposition particle injection device of the present invention includes: vapor deposition particle generating sections and for generating vapor deposition particles in the form of vapor by heating vapor deposition materials and; and a nozzle section which is connected to the vapor deposition particle generating sections and has an injection hole from which the vapor deposition particles generated by the vapor deposition particle generating sections and are injected outward. The vapor deposition particle generating section has a smaller capacity for the vapor deposition material than the vapor deposition particle generating section.

Abstract: The present invention (i) uses a mask unit (80) including: a shadow mask (81) that has an opening (82) and that is smaller in area than a vapor deposition region (210) of a film formation substrate (200) and; a vapor deposition source (85) that has a emission hole (86) for emitting a vapor deposition particle, the emission hole (86) being provided so as to face the shadow mask (81), the shadow mask (81) and the vapor deposition source (85) being fixed in position relative to each other, (ii) adjusts an amount of a void between the shadow mask (81) and the film formation substrate (200), (iii) moves at least a first one of the mask unit (80) and the film formation substrate (200) relative to a second one thereof while uniformly maintaining the amount of the void between the mask unit (80) and the film formation substrate (200), and (iv) sequentially deposit the vapor deposition particle onto the vapor deposition region (210) through the opening (82) of the shadow mask (81).

Abstract: A vapor deposition unit (1) includes: a vapor deposition mask (10); a limiting plate unit (20) having limiting plates (22); and a vapor deposition source (30). The vapor deposition source (30) includes: a plurality of first openings (31) for injection of vapor deposition particles; and at least one second opening (32) for pressure release, wherein each of the first openings (31) is provided in a corresponding one of limiting plate openings (23) between the limiting plates (22) in a plan view, and the at least one second opening (32) is provided in such a position as not to face the limiting plate openings (23) in a plan view.

Abstract: The present invention relates to a vapor deposition device for forming a film on a substrate, including: a vapor deposition chamber; a vapor deposition unit including a vapor deposition mask provided with an opening for pattern formation; and a transport mechanism that is configured to transfer at least one of the substrate and the vapor deposition unit relative to the other in a first direction perpendicular to the normal direction of the vapor deposition mask and that is configured to cause the substrate to rest temporarily at a resting position relative to the vapor deposition unit. The substrate includes a vapor-deposition-target region, and the region does not overlap the opening of the vapor deposition mask when the substrate is at the resting position. The vapor deposition chamber is provided with a first vent and a second vent.

Abstract: In plan view, a magnet plate (10) has a first magnetic domain (11) and a second magnetic domain (12), a magnetic domain boundary line (14) is inclined to an opening side (26) and is bent or curved, and the magnet plate has magnetic fields that are generated in a respective plurality of different directions.

Abstract: It comprises: a film made of a resin in which an aperture pattern is formed, the aperture pattern passing through the film, the aperture being with a shape and dimension corresponding to the thin-film pattern in a pre-established region for formation of the thin-film pattern on the substrate; and a metal member that has an aperture part opposite the aperture pattern with a shape and dimension larger than the aperture pattern, the metal member being provided as a thin sheet in intimate contact with one surface of the film on an outside part of the aperture pattern of the film. The film is mutually distanced and distributed, at a position where the film does not overlap the aperture pattern, into a plurality of divided parts on one surface of the metal member.

Abstract: The present invention is directed to a method for manufacturing a vapor deposition mask (2) which includes a mask section (3) and a mask frame (4). The mask section (3) includes an alloy containing iron and nickel. The method includes a heat treatment step of carrying out heat treatment with respect to the mask section (3) in a state in which end parts of the mask section (3) are fixed to the mask frame (4) while tension is applied to the mask section (3).

Abstract: An organic electroluminescent display device of the present invention includes: a substrate; an anode (first electrode); an organic layer including a light-emitting layer; a cathode (second electrode); a reflective layer and a semi-transmissive reflective layer provided to interpose an organic layer; and a plurality of sub-pixels of different colors in which light emitted from the organic layer is repeatedly reflected between the reflective layer and the semi-transmissive reflective layer such that light of a specific wavelength is enhanced and emitted. The substrate is bent or curved, and an optical path length between the reflective layer and the cathode (semi-transmissive reflective layer) in a sub-pixel of a predetermined color of a flat region (first region) is different from an optical path length between the reflective layer and the cathode (semi-transmissive reflective layer) in a sub-pixel of a same color as the predetermined color of a bent region (second region).

Abstract: A vapor deposition mask (10) has a fine-irregularities structure (14), provided on a contact surface of the vapor deposition mask (10), which is configured to attract, by van der Waals force, a film formation target substrate (30) so as to surround a plurality of apertures (12). The contact surface makes contact with the film formation target substrate (30).

Abstract: A mask for a vapor deposition apparatus includes an outer frame; a first bar disposed on an inner side of the outer frame and fixed to the outer frame; and a pattern forming portion disposed on the outer frame and the first bar and fixed to the outer frame. The pattern forming portion includes a plurality of mask openings for pattern formation. Each of the plurality of mask openings is disposed along a first direction. The plurality of mask openings are disposed in a second direction orthogonal to the first direction. The first bar is positioned between adjacent two mask openings among the plurality of mask openings when viewed along a third direction orthogonal to the first direction and the second direction, and is in contact with the pattern forming portion.

Abstract: The method for producing an organic EL display panel includes, in the given order, the steps of: forming a first light-emitting layer by forming a film from a luminescent material of a first luminescent color in a first pixel; performing the etching treatment to remove, while leaving the first light-emitting layer to remain, a thin film of the luminescent material of the first luminescent color which adhered to the second pixel in the step; forming a second light-emitting layer by forming a film from a luminescent material of a second luminescent color different from the first luminescent color in the second pixel; and performing the etching treatment to remove, while leaving the second light-emitting layer to remain, a thin film of the luminescent material of the second luminescent color which adhered to the first pixel in the step.

Abstract: A mixed material for vapor deposition of lithium contains lithium oxide M1 in an amount of 90% or more, sodium chloride (at least one material selected from oxides, sulfides, chlorides, and fluorides of alkali metals) M2 having a melting point lower than the melting point of lithium oxide M1, and magnesium oxide (at least one material selected from oxides and sulfides of alkaline-earth metals) M3 having a melting point higher than the melting point of lithium oxide M1.

Abstract: A method of producing a vapor deposition mask includes the steps of (i) preparing a mixture which contains a resin material and an inorganic filler and (ii) shaping, with use of a reactor which serves as a shaping die, the mixture so that the mask substrate is shaped, the mask substrate containing a resin made of the resin material and the inorganic filler mixed in the resin.

Abstract: A vapor deposition device (1) performs a vapor deposition treatment to form a luminescent layer (47) having a predetermined pattern on a film formation substrate (40). The vapor deposition device includes: a nozzle (13) having a plurality of injection holes (16) from which vapor deposition particles (17), which constitute the luminescent layer, are injected toward the film formation substrate when the vapor deposition treatment is carried out; and a plurality of control plates (20) provided between the nozzle and the film formation substrate and restricting an incident angle, with respect to the film formation substrate, of the vapor deposition particles injected from the plurality of injection holes. The nozzle includes: a nozzle main body (14b) in a container shape having an opening (14c) on a surface thereof on a film formation substrate side and (ii) a plurality of blocks (15) covering the opening and separated from each other, each of the plurality of blocks having the plurality of injection holes.