Patents by Inventor Shinichi Kimizuka

Shinichi Kimizuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10087279
    Abstract: The present invention provides a polyol composition including a polyol having a polyester chain, wherein the polyol composition substantially contains no metal-base polymerization catalyst and an amount of phosphorus element derived from a polymerization catalyst is 1 to 1000 ppm. Furthermore, a method for producing a polyol composition is provided, including reacting a compound having an active hydrogen with a compound having at least one selected from the group consisting of carboxyl group, ester group and acid halide group in the presence of 0.0001-0.05 parts by mol of a phosphorus compound with respect to 1 part by mol of the active hydrogen without using a metal-based polymerization catalyst.
    Type: Grant
    Filed: October 21, 2014
    Date of Patent: October 2, 2018
    Assignee: NIPPON SODA CO., LTD.
    Inventors: Mitsuhiro Nakamura, Shinichi Kimizuka
  • Patent number: 9701779
    Abstract: A polybutadiene having a hydroxyl group at a terminal end thereof is reacted with a lactone compound such as an ?-caprolactone to obtain a polymer polyol represented by formula (I): HO—X1—Y—X2—OH (wherein X1 and X2 each independently represents a polyester component and Y represents a polybutadiene component), the polymer polyol is reacted with an unsymmetric diisocyanate to obtain a urethane prepolymer, and then the urethane prepolymer is reacted with a chain extender to obtain a polyurethane.
    Type: Grant
    Filed: May 23, 2013
    Date of Patent: July 11, 2017
    Assignee: NIPPON SODA CO., LTD.
    Inventors: Akihiro Shirai, Yasunori Miyashita, Shinichi Kimizuka, Mitsuhiro Nakamura
  • Patent number: 9701780
    Abstract: A polybutadiene having a hydroxyl group at a terminal end thereof is reacted with a lactone compound such as an ?-caprolactone to obtain a polymer polyol represented by formula (I): HO—X1—Y—X2—OH (wherein X1 and X2 each independently represents a polyester component and Y represents a polybutadiene component), the polymer polyol is reacted with an unsymmetric diisocyanate to obtain a urethane prepolymer, and then the urethane prepolymer is reacted with a chain extender to obtain a polyurethane.
    Type: Grant
    Filed: February 24, 2016
    Date of Patent: July 11, 2017
    Assignee: NIPPON SODA CO., LTD.
    Inventors: Akihiro Shirai, Yasunori Miyashita, Shinichi Kimizuka, Mitsuhiro Nakamura
  • Publication number: 20160264713
    Abstract: The present invention provides a polyol composition including a polyol having a polyester chain, wherein the polyol composition substantially contains no metal-base polymerization catalyst and an amount of phosphorus element derived from a polymerization catalyst is 1 to 1000 ppm. Furthermore, a method for producing a polyol composition is provided, including reacting a compound having an active hydrogen with a compound having at least one selected from the group consisting of carboxyl group, ester group and acid halide group in the presence of 0.0001-0.05 parts by mol of a phosphorus compound with respect to 1 part by mol of the active hydrogen without using a metal-based polymerization catalyst.
    Type: Application
    Filed: October 21, 2014
    Publication date: September 15, 2016
    Applicant: NIPPON SODA CO., LTD.
    Inventors: Mitsuhiro NAKAMURA, Shinichi KIMIZUKA
  • Publication number: 20160168310
    Abstract: A polybutadiene having a hydroxyl group at a terminal end thereof is reacted with a lactone compound such as an ?-caprolactone to obtain a polymer polyol represented by formula (I): HO—X1—Y—X2—OH (wherein X1 and X2 each independently represents a polyester component and Y represents a polybutadiene component), the polymer polyol is reacted with an unsymmetric diisocyanate to obtain a urethane prepolymer, and then the urethane prepolymer is reacted with a chain extender to obtain a polyurethane.
    Type: Application
    Filed: February 24, 2016
    Publication date: June 16, 2016
    Inventors: Akihiro SHIRAI, Yasunori MIYASHITA, Shinichi KIMIZUKA, Mitsuhiro NAKAMURA
  • Publication number: 20150119535
    Abstract: A polybutadiene having a hydroxyl group at a terminal end thereof is reacted with a lactone compound such as an ?-caprolactone to obtain a polymer polyol represented by formula (I): HO—X1—Y—X2—OH (wherein X1 and X2 each independently represents a polyester component and Y represents a polybutadiene component), the polymer polyol is reacted with an unsymmetric diisocyanate to obtain a urethane prepolymer, and then the urethane prepolymer is reacted with a chain extender to obtain a polyurethane.
    Type: Application
    Filed: May 23, 2013
    Publication date: April 30, 2015
    Inventors: Akihiro Shirai, Yasunori Miyashita, Shinichi Kimizuka, Mitsuhiro Nakamura
  • Patent number: 6875821
    Abstract: A process for making poly(hydroxystyrene)s whose phenolic hydroxyl groups are partially protected by acid-decomposable or -eliminable groups, by which the degree of deblocking of the phenolic hydroxyl groups is controlled. Namely, the production of a polymer containing, in the molecule, repeating units of the general formula (IA) and those of the general formula (IB), comprising adding an acid to polymer (B) containing in the molecule repeating units of general formula (II) in an organic solvent with the molar ratio of the acid to the OR3 group being 0.0001 equivalent or above but below 0.05 equivalent, and reacting the polymer with the acid. In the general formulae, R1 is hydrogen or methyl; R2 is C1-6 alkyl; R3 is an acid-decomposable or -eliminable group; R4 is hydrogen or a group derived from R3 by decomposition with acid; and p is 0, 1, or 2, with the proviso that the IB/IA molar ratio ranges 98/2 to 30/70.
    Type: Grant
    Filed: January 25, 2002
    Date of Patent: April 5, 2005
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Hiroo Muramoto, Shinichi Kimizuka
  • Patent number: 6743861
    Abstract: An ESCAP type polymer which has a controlled structure wherein the groups protecting phenolic hydroxyl groups have been selectively or partly eliminated or decomposed with an acid and no carboxylic acid residues are contained and which is a narrow-disperse polymer and is suitable for use as a material for a chemical amplification type resist for excimer lasers which has excellent resolution. The process is characterized by subjecting either an alkenylphenol in which the phenolic hydroxyl group has been protected or the alkenylphenol and a vinylaromatic compound to anionic polymerization together with a (meth)acrylic ester to give a block copolymer and eliminating only a given proportion of the groups protecting the phenolic hydroxyl groups from the block copolymer with an acid reagent. Thus, an alkenylphenol copolymer is synthesized which has a ratio of the weight-average molecular weight (Mw) to the number-average molecular weight (Mn), (Mw/Mn), of 1.00 to 1.50 and has no carboxylic acid residues.
    Type: Grant
    Filed: March 1, 2002
    Date of Patent: June 1, 2004
    Assignee: Nippon Soda Co. Ltd.
    Inventors: Hitoshi Matsumoto, Yukikazu Nobuhara, Shinichi Kimizuka
  • Publication number: 20040063863
    Abstract: A process for making poly(hydroxystyrene)s whose phenolic hydroxyl groups are partially protected by acid-decomposable or -eliminable groups, by which the degree of deblocking of the phenolic hydroxyl groups is controlled. Namely, the production of a polymer containing, in the molecule, repeating units of the general formula (IA) and those of the general formula (IB), comprising adding an acid to polymer (B) containing in the molecule repeating units of general formula (II) in an organic solvent with the molar ratio of the acid to the OR3 group being 0.0001 equivalent or above but below 0.05 equivalent, and reacting the polymer with the acid. In the general formulae, R1 is hydrogen or methyl; R2 is C1-6 alkyl; R3 is an acid-decomposable or -eliminable group; R4 is hydrogen or a group derived from R3 by decomposition with acid; and p is 0, 1, or 2, with the proviso that the IB/IA molar ratio ranges 98/2 to 30/70.
    Type: Application
    Filed: July 16, 2003
    Publication date: April 1, 2004
    Inventors: Hiroo Muramoto, Shinichi Kimizuka
  • Patent number: 6677390
    Abstract: An iodonium salt compound which is colored little, can be easily synthesized in high yield, is highly sensitive to irradiation with actinic energy rays such as light, electronic beams, or X-rays, is highly soluble in monomers, and is lowly toxic; and a photocurable composition which can cure in a short time even when the counter anion is a hexafluorophosphonate, tetrafluoroborate, etc., regardless of whether it is clear or pigmented, and which gives a cured object having excellent properties. The photocurable composition is prepared by compounding an iodonium salt compound represented by the general formula (I) with a cationically polymerizable compound, a sensitizer, etc.
    Type: Grant
    Filed: January 31, 2002
    Date of Patent: January 13, 2004
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Eiji Takahashi, Akihiro Shirai, Hiroshi Takahashi, Shinichi Kimizuka
  • Patent number: 6558871
    Abstract: A photopolymerization initiator comprising an iodonium salt compound; and a photocurable composition containing the compound. The composition is a photocurable cationic composition which cures in a short time upon irradiation with actinic energy rays.
    Type: Grant
    Filed: September 19, 2000
    Date of Patent: May 6, 2003
    Assignee: Nippon Soda Co. Ltd.
    Inventors: Eiji Takahashi, Akihiro Shirai, Hiroshi Takahashi, Shinichi Kimizuka