Patents by Inventor Shinichi Kimizuka
Shinichi Kimizuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10087279Abstract: The present invention provides a polyol composition including a polyol having a polyester chain, wherein the polyol composition substantially contains no metal-base polymerization catalyst and an amount of phosphorus element derived from a polymerization catalyst is 1 to 1000 ppm. Furthermore, a method for producing a polyol composition is provided, including reacting a compound having an active hydrogen with a compound having at least one selected from the group consisting of carboxyl group, ester group and acid halide group in the presence of 0.0001-0.05 parts by mol of a phosphorus compound with respect to 1 part by mol of the active hydrogen without using a metal-based polymerization catalyst.Type: GrantFiled: October 21, 2014Date of Patent: October 2, 2018Assignee: NIPPON SODA CO., LTD.Inventors: Mitsuhiro Nakamura, Shinichi Kimizuka
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Patent number: 9701779Abstract: A polybutadiene having a hydroxyl group at a terminal end thereof is reacted with a lactone compound such as an ?-caprolactone to obtain a polymer polyol represented by formula (I): HO—X1—Y—X2—OH (wherein X1 and X2 each independently represents a polyester component and Y represents a polybutadiene component), the polymer polyol is reacted with an unsymmetric diisocyanate to obtain a urethane prepolymer, and then the urethane prepolymer is reacted with a chain extender to obtain a polyurethane.Type: GrantFiled: May 23, 2013Date of Patent: July 11, 2017Assignee: NIPPON SODA CO., LTD.Inventors: Akihiro Shirai, Yasunori Miyashita, Shinichi Kimizuka, Mitsuhiro Nakamura
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Patent number: 9701780Abstract: A polybutadiene having a hydroxyl group at a terminal end thereof is reacted with a lactone compound such as an ?-caprolactone to obtain a polymer polyol represented by formula (I): HO—X1—Y—X2—OH (wherein X1 and X2 each independently represents a polyester component and Y represents a polybutadiene component), the polymer polyol is reacted with an unsymmetric diisocyanate to obtain a urethane prepolymer, and then the urethane prepolymer is reacted with a chain extender to obtain a polyurethane.Type: GrantFiled: February 24, 2016Date of Patent: July 11, 2017Assignee: NIPPON SODA CO., LTD.Inventors: Akihiro Shirai, Yasunori Miyashita, Shinichi Kimizuka, Mitsuhiro Nakamura
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Publication number: 20160264713Abstract: The present invention provides a polyol composition including a polyol having a polyester chain, wherein the polyol composition substantially contains no metal-base polymerization catalyst and an amount of phosphorus element derived from a polymerization catalyst is 1 to 1000 ppm. Furthermore, a method for producing a polyol composition is provided, including reacting a compound having an active hydrogen with a compound having at least one selected from the group consisting of carboxyl group, ester group and acid halide group in the presence of 0.0001-0.05 parts by mol of a phosphorus compound with respect to 1 part by mol of the active hydrogen without using a metal-based polymerization catalyst.Type: ApplicationFiled: October 21, 2014Publication date: September 15, 2016Applicant: NIPPON SODA CO., LTD.Inventors: Mitsuhiro NAKAMURA, Shinichi KIMIZUKA
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Publication number: 20160168310Abstract: A polybutadiene having a hydroxyl group at a terminal end thereof is reacted with a lactone compound such as an ?-caprolactone to obtain a polymer polyol represented by formula (I): HO—X1—Y—X2—OH (wherein X1 and X2 each independently represents a polyester component and Y represents a polybutadiene component), the polymer polyol is reacted with an unsymmetric diisocyanate to obtain a urethane prepolymer, and then the urethane prepolymer is reacted with a chain extender to obtain a polyurethane.Type: ApplicationFiled: February 24, 2016Publication date: June 16, 2016Inventors: Akihiro SHIRAI, Yasunori MIYASHITA, Shinichi KIMIZUKA, Mitsuhiro NAKAMURA
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Publication number: 20150119535Abstract: A polybutadiene having a hydroxyl group at a terminal end thereof is reacted with a lactone compound such as an ?-caprolactone to obtain a polymer polyol represented by formula (I): HO—X1—Y—X2—OH (wherein X1 and X2 each independently represents a polyester component and Y represents a polybutadiene component), the polymer polyol is reacted with an unsymmetric diisocyanate to obtain a urethane prepolymer, and then the urethane prepolymer is reacted with a chain extender to obtain a polyurethane.Type: ApplicationFiled: May 23, 2013Publication date: April 30, 2015Inventors: Akihiro Shirai, Yasunori Miyashita, Shinichi Kimizuka, Mitsuhiro Nakamura
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Patent number: 6875821Abstract: A process for making poly(hydroxystyrene)s whose phenolic hydroxyl groups are partially protected by acid-decomposable or -eliminable groups, by which the degree of deblocking of the phenolic hydroxyl groups is controlled. Namely, the production of a polymer containing, in the molecule, repeating units of the general formula (IA) and those of the general formula (IB), comprising adding an acid to polymer (B) containing in the molecule repeating units of general formula (II) in an organic solvent with the molar ratio of the acid to the OR3 group being 0.0001 equivalent or above but below 0.05 equivalent, and reacting the polymer with the acid. In the general formulae, R1 is hydrogen or methyl; R2 is C1-6 alkyl; R3 is an acid-decomposable or -eliminable group; R4 is hydrogen or a group derived from R3 by decomposition with acid; and p is 0, 1, or 2, with the proviso that the IB/IA molar ratio ranges 98/2 to 30/70.Type: GrantFiled: January 25, 2002Date of Patent: April 5, 2005Assignee: Nippon Soda Co., Ltd.Inventors: Hiroo Muramoto, Shinichi Kimizuka
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Patent number: 6743861Abstract: An ESCAP type polymer which has a controlled structure wherein the groups protecting phenolic hydroxyl groups have been selectively or partly eliminated or decomposed with an acid and no carboxylic acid residues are contained and which is a narrow-disperse polymer and is suitable for use as a material for a chemical amplification type resist for excimer lasers which has excellent resolution. The process is characterized by subjecting either an alkenylphenol in which the phenolic hydroxyl group has been protected or the alkenylphenol and a vinylaromatic compound to anionic polymerization together with a (meth)acrylic ester to give a block copolymer and eliminating only a given proportion of the groups protecting the phenolic hydroxyl groups from the block copolymer with an acid reagent. Thus, an alkenylphenol copolymer is synthesized which has a ratio of the weight-average molecular weight (Mw) to the number-average molecular weight (Mn), (Mw/Mn), of 1.00 to 1.50 and has no carboxylic acid residues.Type: GrantFiled: March 1, 2002Date of Patent: June 1, 2004Assignee: Nippon Soda Co. Ltd.Inventors: Hitoshi Matsumoto, Yukikazu Nobuhara, Shinichi Kimizuka
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Publication number: 20040063863Abstract: A process for making poly(hydroxystyrene)s whose phenolic hydroxyl groups are partially protected by acid-decomposable or -eliminable groups, by which the degree of deblocking of the phenolic hydroxyl groups is controlled. Namely, the production of a polymer containing, in the molecule, repeating units of the general formula (IA) and those of the general formula (IB), comprising adding an acid to polymer (B) containing in the molecule repeating units of general formula (II) in an organic solvent with the molar ratio of the acid to the OR3 group being 0.0001 equivalent or above but below 0.05 equivalent, and reacting the polymer with the acid. In the general formulae, R1 is hydrogen or methyl; R2 is C1-6 alkyl; R3 is an acid-decomposable or -eliminable group; R4 is hydrogen or a group derived from R3 by decomposition with acid; and p is 0, 1, or 2, with the proviso that the IB/IA molar ratio ranges 98/2 to 30/70.Type: ApplicationFiled: July 16, 2003Publication date: April 1, 2004Inventors: Hiroo Muramoto, Shinichi Kimizuka
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Patent number: 6677390Abstract: An iodonium salt compound which is colored little, can be easily synthesized in high yield, is highly sensitive to irradiation with actinic energy rays such as light, electronic beams, or X-rays, is highly soluble in monomers, and is lowly toxic; and a photocurable composition which can cure in a short time even when the counter anion is a hexafluorophosphonate, tetrafluoroborate, etc., regardless of whether it is clear or pigmented, and which gives a cured object having excellent properties. The photocurable composition is prepared by compounding an iodonium salt compound represented by the general formula (I) with a cationically polymerizable compound, a sensitizer, etc.Type: GrantFiled: January 31, 2002Date of Patent: January 13, 2004Assignee: Nippon Soda Co., Ltd.Inventors: Eiji Takahashi, Akihiro Shirai, Hiroshi Takahashi, Shinichi Kimizuka
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Patent number: 6558871Abstract: A photopolymerization initiator comprising an iodonium salt compound; and a photocurable composition containing the compound. The composition is a photocurable cationic composition which cures in a short time upon irradiation with actinic energy rays.Type: GrantFiled: September 19, 2000Date of Patent: May 6, 2003Assignee: Nippon Soda Co. Ltd.Inventors: Eiji Takahashi, Akihiro Shirai, Hiroshi Takahashi, Shinichi Kimizuka