Abstract: A process for spin coating a substrate such as a semi-conductor wafer uniformly with a coating solution such as a photographic emulsion by rotating the substrate at a first speed while simultaneously applying the coating solution at a radially moving position. Once the substrate has been initially covered, the speed of rotation of the substrate is increased and rotation continues until a uniform coating is obtained.

Abstract: A heat developable light-sensitive material comprising a support carrying at least one layer containing at least (a) an organic silver salt, (b) a light-sensitive halide or a light-sensitive silver halide-forming component, (c) a reducing agent and (d) phthalazinone, and which further has on another surface of the support opposite the above layer one layer containing a compound comprising a ##STR1## moiety, wherein M represents a hydrogen atom or a monovalent metal atom. The material shows improved retention of its as manufactured properties, especially in the superposed state.