Abstract: A cleaning method of cleaning a solution treatment apparatus for applying a coating solution onto a substrate, the solution treatment apparatus including a holder holding and rotating the substrate; a coating solution supplier; and an inner cup surrounding the holder from a lateral side and having a peripheral edge side upper surface inclining down outward in a radial direction. The cleaning method includes introducing the cleaning solution to the storage chamber via the introduction hole, discharging the cleaning solution from the discharge port and making the cleaning solution flow down along the peripheral edge side upper surface of the inner cup, thereby cleaning away the coating solution adhering to the peripheral edge side upper surface. The discharging in the cleaning discharges the cleaning solution from discharge ports of the inner cup outward in the radial direction and obliquely upward.

Abstract: A solution treatment apparatus applies a coating solution onto a substrate. The apparatus includes a holder holding and rotating the substrate; a coating solution supplier supplying the coating solution to the substrate on the holder; and an inner cup surrounding the holder from a lateral side and having a peripheral edge side upper surface inclining down outward in a radial direction from an apex part located below a peripheral edge side of the substrate on the holder. The inner cup has discharge ports formed along a circumferential direction at the apex part; and the discharge ports are formed to discharge a cleaning solution and make the cleaning solution flow down along the peripheral edge side upper surface of the inner cup, thereby cleaning the peripheral edge side upper surface, and to discharge the cleaning solution outward in the radial direction and obliquely upward.

Abstract: A solution treatment apparatus for applying a coating solution onto a substrate, includes: a holder holding and rotating the substrate; a coating solution supplier supplying the coating solution to the substrate on the holder; and an inner cup surrounding the holder from a lateral side and having a peripheral edge side upper surface inclining down outward in a radial direction from an apex part located below a peripheral edge side of the substrate on the holder, wherein: the inner cup has a plurality of discharge ports formed along a circumferential direction at the apex part; and the discharge ports are formed to discharge a cleaning solution and make the cleaning solution flow down along the peripheral edge side upper surface of the inner cup, thereby cleaning the peripheral edge side upper surface, and to discharge the cleaning solution outward in the radial direction and obliquely upward.

Abstract: A substrate processing apparatus includes a cover member placed to surround a substrate held by a rotary holder; a collecting member placed in an exhaust path formed between the cover member and the rotary holder; and a solvent supply placed above the collecting member and configured to supply a solvent to the collecting member. The solvent supply includes an inner storage space surrounding the substrate; an outer storage space surrounding the inner storage space; and a partition wall extending along a circumferential direction to partition the inner storage space and the outer storage space. Multiple communication holes are extended to penetrate the partition wall such that the solvent introduced into the outer storage space flows to the inner storage space. Multiple dripping holes are extended to penetrate a bottom wall of the inner storage space such that the solvent within the inner storage space drops toward the collecting member.

Abstract: A substrate processing apparatus includes a cover member placed to surround a substrate held by a rotary holder; a collecting member placed in an exhaust path formed between the cover member and the rotary holder; and a solvent supply placed above the collecting member and configured to supply a solvent to the collecting member. The solvent supply includes an inner storage space surrounding the substrate; an outer storage space surrounding the inner storage space; and a partition wall extending along a circumferential direction to partition the inner storage space and the outer storage space. Multiple communication holes are extended to penetrate the partition wall such that the solvent introduced into the outer storage space flows to the inner storage space. Multiple dripping holes are extended to penetrate a bottom wall of the inner storage space such that the solvent within the inner storage space drops toward the collecting member.

Abstract: Provided is a substrate processing apparatus that includes: a peripheral exposing unit that performs a peripheral exposing process by irradiating light to a peripheral portion of a substrate while rotating the substrate held by a substrate holding unit using a rotation driving unit; a substrate inspecting unit that performs a substrate inspecting process based on a picked up image of the substrate while moving the substrate using a movement driving unit; and a control unit. The control unit controls the predetermined substrate processing to be stopped when the peripheral exposing process is included in the predetermined substrate processing and an error occurs in the peripheral exposing unit, and controls the substrate inspecting process to be skipped when no error occurs in both of the peripheral exposing unit and a transport unit, the substrate inspecting process is included in the predetermined substrate processing and an error occurs in the substrate inspecting unit.

Abstract: Provided is a substrate processing apparatus that includes: a peripheral exposing unit that performs a peripheral exposing process by irradiating light to a peripheral portion of a substrate while rotating the substrate held by a substrate holding unit using a rotation driving unit; a substrate inspecting unit that performs a substrate inspecting process based on a picked up image of the substrate while moving the substrate using a movement driving unit; and a control unit. The control unit controls the predetermined substrate processing to be stopped when the peripheral exposing process is included in the predetermined substrate processing and an error occurs in the peripheral exposing unit, and controls the substrate inspecting process to be skipped when no error occurs in both of the peripheral exposing unit and a transport unit, the substrate inspecting process is included in the predetermined substrate processing and an error occurs in the substrate inspecting unit.

Abstract: In the present invention, when a ghost wafer which is not recognized by a control unit on a coating and developing treatment apparatus side is carried out of another apparatus which is connected to the coating and developing treatment apparatus, the ghost wafer is temporarily housed in a buffer cassette on the coating and developing treatment apparatus side. The ghost wafer in the buffer cassette is then collected into a carry-in/out section on the coating and developing treatment apparatus side through use of a carrier unit at a timing which does not affect processing of other wafers in a break between lots. According to the present invention, the ghost wafer occurred in the coating and developing treatment apparatus can be collected without suspension of processing of other ordinary substrates.

Abstract: In accordance with one example of the disclosed subject matter, a semiconductor device can include the following features. A first lead frame can be provided that has one end configured to form a recess. An LED chip can be mounted on an inner bottom surface of the recess. A bonding wire has one end connected to an electrode on the LED chip. A second lead frame has one end connected to the other end of the bonding wire. The LED chip and the bonding wire can be sealed in a sealing resin. The first lead frame and the second lead frame can protrude from the sealing resin and can be bent around to the bottom of the sealing resin. A groove formed through the center of the bottom of the sealing resin at least partly exposes an outer circumferential surface and an outer bottom surface of the recess from the sealing resin and into the groove.

Abstract: In accordance with one example of the disclosed subject matter, a semiconductor device can include the following features. A first lead frame can be provided that has one end configured to form a recess. An LED chip can be mounted on an inner bottom surface of the recess. A bonding wire has one end connected to an electrode on the LED chip. A second lead frame has one end connected to the other end of the bonding wire. The LED chip and the bonding wire can be sealed in a sealing resin. The first lead frame and the second lead frame can protrude from the sealing resin and can be bent around to the bottom of the sealing resin. A groove formed through the center of the bottom of the sealing resin at least partly exposes an outer circumferential surface and an outer bottom surface of the recess from the sealing resin and into the groove.

Abstract: In the present invention, when a ghost wafer which is not recognized by a control unit on a coating and developing treatment apparatus side is carried out of another apparatus which is connected to the coating and developing treatment apparatus, the ghost wafer is temporarily housed in a buffer cassette on the coating and developing treatment apparatus side. The ghost wafer in the buffer cassette is then collected into a carry-in/out section on the coating and developing treatment apparatus side through use of a carrier unit at a timing which does not affect processing of other wafers According to the present invention, the ghost wafer occurred in the coating and developing treatment apparatus can be collected without suspension of processing of other ordinary substrates.

Abstract: A method for manufacturing a magnetic head includes the process by which a curved sliding surface of a head chip for making contact with a recording medium and a penetrating window of a side surface of the head chip for determining a gap depth are formed by machining the head chip using a laser beam. The method includes placing the head chip on a working stage; placing a first mask in a light path of a laser beam from a laser source toward the side surface, the first mask being provided with a first slit for the purpose of forming the curved sliding surface of the head chip and a second slit for the purpose of forming the penetrating window of the side surface of the head chip; and irradiating the side surface through the first and second slits with the laser beam, thereby forming the curved sliding surface and the penetrating window in the head chip. The method also may include forming track grooves by irradiating the sliding surface of the head chip with the laser beam.