Patents by Inventor Shinichi Sumida

Shinichi Sumida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9678426
    Abstract: Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R2 and R3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.
    Type: Grant
    Filed: April 7, 2014
    Date of Patent: June 13, 2017
    Assignee: Central Glass Company, Limited
    Inventors: Haruhiko Komoriya, Shinichi Sumida, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto
  • Patent number: 9678425
    Abstract: Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R2 and R3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.
    Type: Grant
    Filed: April 7, 2014
    Date of Patent: June 13, 2017
    Assignee: Central Glass Company, Limited
    Inventors: Haruhiko Komoriya, Shinichi Sumida, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto
  • Patent number: 9650451
    Abstract: A fluorine-containing compound represented by the formula 1, where R1 is a methyl group or trifluoromethyl group, each of R2 and R3 is independently a hydrogen atom or a group containing (a) a hydrocarbon group having a straight-chain, branched or ring form and having a carbon atom number of 1-25 or (b) an aromatic hydrocarbon group, the group optionally containing at least one of a fluorine atom, an oxygen atom and a carbonyl bond, l is an integer of from 0 to 2, each of m and n is independently an integer of 1-5 to satisfy an expression of m+n?6, and when at least one of R1, R2 and R3 is in a plural number, the at least one of R1, R2 and R3 may be identical with or different from each other.
    Type: Grant
    Filed: February 24, 2014
    Date of Patent: May 16, 2017
    Assignee: Central Glass Company, Limited
    Inventors: Shinichi Sumida, Haruhiko Komoriya, Kazuhiko Maeda
  • Publication number: 20140221589
    Abstract: Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R2 and R3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.
    Type: Application
    Filed: April 7, 2014
    Publication date: August 7, 2014
    Applicant: Central Glass Company, Limited
    Inventors: Haruhiko KOMORIYA, Shinichi SUMIDA, Kenjin INOMIYA, Takashi MORI, Takamasa KITAMOTO, Yusuke KANTO
  • Publication number: 20140220490
    Abstract: Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R2 and R3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.
    Type: Application
    Filed: April 7, 2014
    Publication date: August 7, 2014
    Applicant: Central Glass Company, Limited
    Inventors: Haruhiko KOMORIYA, Shinichi SUMIDA, Kenjin INOMIYA, Takashi MORI, Takamasa KITAMOTO, Yusuke KANTO
  • Publication number: 20140171584
    Abstract: A fluorine-containing compound represented by the formula 1, where R1 is a methyl group or trifluoromethyl group, each of R2 and R3 is independently a hydrogen atom or a group containing (a) a hydrocarbon group having a straight-chain, branched or ring form and having a carbon atom number of 1-25 or (b) an aromatic hydrocarbon group, the group optionally containing at least one of a fluorine atom, an oxygen atom and a carbonyl bond, l is an integer of from 0 to 2, each of m and n is independently an integer of 1-5 to satisfy an expression of m+n?6, and when at least one of R1, R2 and R3 is in a plural number, the at least one of R1, R2 and R3 may be identical with or different from each other.
    Type: Application
    Filed: February 24, 2014
    Publication date: June 19, 2014
    Applicant: Central Glass Company, Limited
    Inventors: Shinichi SUMIDA, Haruhiko KOMORIYA, Kazuhiko MAEDA
  • Patent number: 8716385
    Abstract: Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R2 and R3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.
    Type: Grant
    Filed: December 3, 2009
    Date of Patent: May 6, 2014
    Assignee: Central Glass Company, Limited
    Inventors: Haruhiko Komoriya, Shinichi Sumida, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto
  • Patent number: 8691491
    Abstract: A fluorine-containing compound represented by the formula 1, where R1 is a methyl group or trifluoromethyl group, each of R2 and R3 is independently a hydrogen atom or a group containing (a) a hydrocarbon group having a straight-chain, branched or ring form and having a carbon atom number of 1-25 or (b) an aromatic hydrocarbon group, the group optionally containing at least one of a fluorine atom, an oxygen atom and a carbonyl bond, l is an integer of from 0 to 2, each of m and n is independently an integer of 1-5 to satisfy an expression of m+n?6, and when at least one of R1, R2 and R3 is in a plural number, the at least one of R1, R2 and R3 may be identical with or different from each other.
    Type: Grant
    Filed: April 26, 2011
    Date of Patent: April 8, 2014
    Assignee: Central Glass Company, Limited
    Inventors: Shinichi Sumida, Haruhiko Komoriya, Kazuhiko Maeda
  • Patent number: 8592508
    Abstract: Disclosed is a top coat composition for photoresist, which is characterized by containing a fluorinated polymer having a repeating unit represented by general formula (5). In the formula, R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group; n represents 0 or 1; m represents an integer of 1 to (3+n); and R2 or R3 represents a hydrogen atom or a protecting group. The top coat composition has a proper degree of solubility in a developing solution.
    Type: Grant
    Filed: December 11, 2009
    Date of Patent: November 26, 2013
    Assignee: Central Glass Company, Limited
    Inventors: Haruhiko Komoriya, Shinichi Sumida, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto
  • Publication number: 20130177848
    Abstract: A polymer containing a repeating unit represented by the following general formula (1) and a repeating unit having an acid-releasable group.
    Type: Application
    Filed: September 9, 2011
    Publication date: July 11, 2013
    Applicant: CENTRAL GLASS COMPANY LIMITED
    Inventors: Yusuke Kanto, Shinichi Sumida, Kazuhiko Maeda
  • Patent number: 8115036
    Abstract: The present invention relates to a fluorine-containing cyclic compound of formula (5): wherein R2-R4 and R9-R15 are independently a hydrogen atom, a halogen atom, or a C1-C25 straight-chain, branched or cyclic alkyl group, and may contain fluorine atom, oxygen atom, sulfur atom, or nitrogen atom. R10 and R11, R12 and R13, or R14 and R15 may be bonded together to form a ring. In such a case, it is a C1-C25 alkylene group that may contain a hetero atom such as oxygen, sulfur and nitrogen, “a” is 0 or 1, “b” is an integer of 0-2 and “c” is an integer of 0-2.
    Type: Grant
    Filed: April 22, 2010
    Date of Patent: February 14, 2012
    Assignee: Central Glass Company, Limited
    Inventors: Haruhiko Komoriya, Shinichi Sumida, Michitaka Ootani, Takeo Komata, Kazuhiko Maeda
  • Publication number: 20110244188
    Abstract: Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R2 and R3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.
    Type: Application
    Filed: December 3, 2009
    Publication date: October 6, 2011
    Applicant: Central Glass Company , Limited
    Inventors: Haruhiko Komoriya, Shinichi Sumida, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto
  • Publication number: 20110245395
    Abstract: Disclosed is a top coat composition for photoresist, which is characterized by containing a fluorinated polymer having a repeating unit represented by general formula (5). In the formula, R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group; n represents 0 or 1; m represents an integer of 1 to (3+n); and R2 or R3 represents a hydrogen atom or a protecting group. The top coat composition has a proper degree of solubility in a developing solution.
    Type: Application
    Filed: December 11, 2009
    Publication date: October 6, 2011
    Inventors: Haruhiko Komoriya, Shinichi Sumida, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto
  • Publication number: 20110196121
    Abstract: A fluorine-containing compound represented by the formula 1, where R1 is a methyl group or trifluoromethyl group, each of R2 and R3 is independently a hydrogen atom or a group containing (a) a hydrocarbon group having a straight-chain, branched or ring form and having a carbon atom number of 1-25 or (b) an aromatic hydrocarbon group, the group optionally containing at least one of a fluorine atom, an oxygen atom and a carbonyl bond, l is an integer of from 0 to 2, each of m and n is independently an integer of 1-5 to satisfy an expression of m+n?6, and when at least one of R1, R2 and R3 is in a plural number, the at least one of R1, R2 and R3 may be identical with or different from each other.
    Type: Application
    Filed: April 26, 2011
    Publication date: August 11, 2011
    Applicant: Central Glass Company, Limited
    Inventors: Shinichi SUMIDA, Haruhiko Komoriya, Kazuhiko Maeda
  • Patent number: 7947422
    Abstract: The invention relates to a fluorine-containing compound represented by the formula 1, where R1 is a methyl group or trifluoromethyl group, each of R2 and R3 is independently a hydrogen atom or a group containing (a) a hydrocarbon group having a straight-chain, branched or ring form and having a carbon atom number of 1-25 or (b) an aromatic hydrocarbon group, the group optionally containing at least one of a fluorine atom, an oxygen atom and a carbonyl bond, l is an integer of from 0 to 2, each of m and n is independently an integer of 1-5 to satisfy an expression of m+n?6, and when at least one of R1, R2 and R3 is in a plural number, the at least one of R1, R2 and R3 may be identical with or different from each other.
    Type: Grant
    Filed: July 25, 2006
    Date of Patent: May 24, 2011
    Assignee: Central Glass Company, Limited
    Inventors: Shinichi Sumida, Haruhiko Komoriya, Kazuhiko Maeda
  • Patent number: 7781602
    Abstract: The present invention relates to a novel fluorine-containing cyclic compound that is derived from a norbornadiene and hexafluoroacetone and has an oxacyclopentane structure. This compound may be represented by the following formula (1) or (2). Furthermore, the present invention relates to a fluorine-containing polymer compound prepared by a polymerization or copolymerization using this fluorine-containing cyclic compound or its derivative. By using such fluorine-containing polymer compound, it is possible to provide a superior resist material and a fine pattern forming process using the same.
    Type: Grant
    Filed: November 16, 2007
    Date of Patent: August 24, 2010
    Assignee: Central Glass Company, Limited
    Inventors: Haruhiko Komoriya, Shinichi Sumida, Katsunori Kawamura, Satoru Kobayashi, Satoru Miyazawa, Kazuhiko Maeda
  • Publication number: 20100204422
    Abstract: The present invention relates to, for example, a fluorine-containing cyclic compound represented by the following general formula (1). In the general formula (1), R1a is a C1-C25 cyclic alkyl group, cyclic alkenyl group or cyclic alkynyl group; each of R2 and R3 is independently a hydrogen atom, a halogen atom, or a C1-C25 straight-chain, branched or cyclic alkyl group; and each of R1a, R2 and R3 may contain fluorine atom, oxygen atom, sulfur atom, nitrogen atom or an atomic group containing a carbon-carbon double bond.
    Type: Application
    Filed: April 22, 2010
    Publication date: August 12, 2010
    Applicant: Central Glass Company, Limited
    Inventors: Haruhiko Komoriya, Shinichi Sumida, Michitaka Ootani, Takeo Komata, Kazuhiko Maeda
  • Patent number: 7736835
    Abstract: The present invention relates to, for example, a fluorine-containing cyclic compound represented by the following general formula (1). In the general formula (1), R1a is a C1-C25 cyclic alkyl group, cyclic alkenyl group or cyclic alkynyl group; each of R2 and R3 is independently a hydrogen atom, a halogen atom, or a C1-C25 straight-chain, branched or cyclic alkyl group; and each of R1a, R2 and R3 may contain fluorine atom, oxygen atom, sulfur atom, nitrogen atom or an atomic group containing a carbon-carbon double bond.
    Type: Grant
    Filed: February 17, 2005
    Date of Patent: June 15, 2010
    Assignee: Central Glass Company, Limited
    Inventors: Haruhiko Komoriya, Shinichi Sumida, Michitaka Ootani, Takeo Komata, Kazuhiko Maeda
  • Publication number: 20080194764
    Abstract: The present invention relates to a novel fluorine-containing cyclic compound that is derived from a norbornadiene and hexafluoroacetone and has an oxacyclopentane structure. This compound may be represented by the following formula (1) or (2). Furthermore, the present invention relates to a fluorine-containing polymer compound prepared by a polymerization or copolymerization using this fluorine-containing cyclic compound or its derivative. By using such fluorine-containing polymer compound, it is possible to provide a superior resist material and a fine pattern forming process using the same.
    Type: Application
    Filed: November 16, 2007
    Publication date: August 14, 2008
    Applicant: Central Glass Company Limited
    Inventors: Haruhiko KOMORIYA, Shinichi SUMIDA, Katsunori KAWAMURA, Satoru KOBAYASHI, Satoru MIYAZAWA, Kazuhiko MAEDA
  • Patent number: 7402626
    Abstract: The present invention relates to a top coat composition, which is characterized in that it is applied to a photoresist top surface by using a polymer containing at least one structure represented by the formula [1], [2] or [3]. It is possible to produce a top coat composition solution by dissolving this top coat composition in an organic solvent. These top coat composition and top coat composition solution can be used in immersion lithography.
    Type: Grant
    Filed: November 4, 2004
    Date of Patent: July 22, 2008
    Assignee: Central Glass Company, Limited
    Inventors: Kazuhiko Maeda, Haruhiko Komoriya, Shinichi Sumida, Satoru Miyazawa, Michitaka Ootani