Abstract: An arc evaporation source (101) according to one embodiment of the present invention comprises: a ring-shaped circumferential magnet (103) which is so arranged as to surround the outer circumference of a target (102) along a direction in which the direction of magnetization becomes parallel with the front surface of the target; and a rear surface magnet (104) which is arranged on the rear surface side of the target (102) along a direction in which the direction of magnetization becomes perpendicular to the front surface of the target. The magnetic pole of the circumferential magnet (103) on the inner side in the radial direction and the magnetic pole of the rear surface magnet (104) on the target (102) side have the same polarity as each other.

Abstract: Provided is an arc evaporation source capable of stably retaining an arc spot on the front end surface of a target and apparatus downsizing. An arc evaporation source includes a target to be melted and vaporized from its front end surface by arc discharge and at least one magnet disposed apart from a side surface of the target radially thereof. The magnet is disposed to form a magnetic field satisfying conditions a) and b) below, on the side surface, in a region of up to 10 mm from the front end surface axially of the target: a) an angle which magnetic lines of force forms with the side surface of the target is 45 degrees or less; and b) a component of the strength of the magnetic lines of force along the axial direction of the target is 200 G or more.

Abstract: An arc evaporation device includes a bar-shaped target having a front end surface and a side surface to be melted and evaporated from the front end surface by arc discharge; an arc power supply; a target feed unit which moves the target axially and in a feed direction; an ignition rod capable of contact with the side surface of the target, in an intersecting direction intersecting the feed direction; a rotary actuator which moves the ignition rod along the intersecting direction from a retraction position apart from the side surface in the intersecting direction to make the ignition rod enter a transport region into which the target is fed; and a detection unit which detects whether or not the ignition rod has come into contact with the side surface of the target during movement of the ignition rod.

Abstract: An arc evaporation device includes a bar-shaped target having a front end surface and a side surface to be melted and evaporated from the front end surface by arc discharge; an arc power supply; a target feed unit which moves the target axially and in a feed direction; an ignition rod capable of contact with the side surface of the target, in an intersecting direction intersecting the feed direction; a rotary actuator which moves the ignition rod along the intersecting direction from a retraction position apart from the side surface in the intersecting direction to make the ignition rod enter a transport region into which the target is fed; and a detection unit which detects whether or not the ignition rod has come into contact with the side surface of the target during movement of the ignition rod.

Abstract: An arc evaporation source (101) according to one embodiment of the present invention comprises: a ring-shaped circumferential magnet (103) which is so arranged as to surround the outer circumference of a target (102) along a direction in which the direction of magnetization becomes parallel with the front surface of the target; and a rear surface magnet (104) which is arranged on the rear surface side of the target (102) along a direction in which the direction of magnetization becomes perpendicular to the front surface of the target. The magnetic pole of the circumferential magnet (103) on the inner side in the radial direction and the magnetic pole of the rear surface magnet (104) on the target (102) side have the same polarity as each other.

Abstract: Provided is an arc evaporation source equipped with a target, a ring-shaped magnetic field guide magnet and a back side magnetic field generation source. The magnetic field guide magnet is aligned in a direction perpendicular to the evaporation face of the target and has a polarity that is the magnetization direction facing forward or backward. The back side magnetic field generation source is disposed at the rear of the magnetic field guide magnet, which is at the side of the back side of the target, and forms magnetic force lines running in the direction of magnetization of the magnetic field guide magnet. The target is disposed such that the evaporation face is positioned in front of the magnetic field guide magnet.

Abstract: Provided is an arc evaporation source capable of stably retaining an arc spot on the front end surface of a target and apparatus downsizing. An arc evaporation source includes a target to be melted and vaporized from its front end surface by arc discharge and at least one magnet disposed apart from a side surface of the target radially thereof. The magnet is disposed to form a magnetic field satisfying conditions a) and b) below, on the side surface, in a region of up to 10 mm from the front end surface axially of the target: a) an angle which magnetic lines of force forms with the side surface of the target is 45 degrees or less; and b) a component of the strength of the magnetic lines of force along the axial direction of the target is 200 G or more.

Abstract: An arc evaporation source having fast film-forming speed includes: at least one circumference magnet surrounding the circumference of a target, wherein the magnetization direction of the magnet runs orthogonal to the target surface; a non-ring shaped first permanent magnet on the target's rear surface side has a polarity in the same direction as the circumference magnet, and is arranged so that its magnetization direction runs orthogonal to the target's surface; a non-ring shaped second permanent magnet arranged either on the rear surface side of the first permanent magnet or between the first permanent magnet and the target, so as to leave a gap from the first permanent magnet, has a polarity in the same direction as the circumference magnet, and is arranged so that its magnetization direction runs orthogonal to the surface of the target; and a magnetic body between the first permanent magnet and the second permanent magnet.

Abstract: Provided is an arc evaporation source wherein film-forming speed is increased by inducing magnetic lines in the substrate direction. The arc evaporation source is provided with: at least one outer circumferential magnet (3), which is disposed such that the outer circumferential magnet surrounds the outer circumference of a target (2) and that the magnetization direction thereof is in the direction orthogonally intersecting the surface of the target (2); and a rear surface magnet (4) disposed on the rear surface side of the target (2). The rear surface magnet (4) has a non-ring-shaped first permanent magnet (4A) wherein the polarity thereof faces the same direction as the polarity of the outer circumferential magnet (3) and the magnetization direction of the rear surface magnet (4) is in the direction orthogonally intersecting the surface of the target (2).

Abstract: Provided is an arc evaporation source equipped with a target, a ring-shaped magnetic field guide magnet and a back side magnetic field generation source. The magnetic field guide magnet is aligned in a direction perpendicular to the evaporation face of the target and has a polarity that is the magnetization direction facing forward or backward. The back side magnetic field generation source is disposed at the rear of the magnetic field guide magnet, which is at the side of the back side of the target, and forms magnetic force lines running in the direction of magnetization of the magnetic field guide magnet. The target is disposed such that the evaporation face is positioned in front of the magnetic field guide magnet.

Abstract: An arc evaporation source (101) according to one embodiment of the present invention comprises: a ring-shaped circumferential magnet (103) which is so arranged as to surround the outer circumference of a target (102) along a direction in which the direction of magnetization becomes parallel with the front surface of the target; and a rear surface magnet (104) which is arranged on the rear surface side of the target (102) along a direction in which the direction of magnetization becomes perpendicular to the front surface of the target. The magnetic pole of the circumferential magnet (103) on the inner side in the radial direction and the magnetic pole of the rear surface magnet (104) on the target (102) side have the same polarity as each other.

Abstract: An arc evaporation source having fast film-forming speed includes: at least one circumference magnet surrounding the circumference of a target, wherein the magnetization direction of the magnet runs orthogonal to the target surface; a non-ring shaped first permanent magnet on the target's rear surface side has a polarity in the same direction as the circumference magnet, and is arranged so that its magnetization direction runs orthogonal to the target's surface; a non-ring shaped second permanent magnet arranged either on the rear surface side of the first permanent magnet or between the first permanent magnet and the target, so as to leave a gap from the first permanent magnet, has a polarity in the same direction as the circumference magnet, and is arranged so that its magnetization direction runs orthogonal to the surface of the target; and a magnetic body between the first permanent magnet and the second permanent magnet.

Abstract: The present invention provides a reflection film, a reflection film laminate which are less likely to undergo agglomeration or sulfidation of an Ag thin film due to heat, and a LED, an organic EL display, and an organic EL illuminating instrument, each including any of these. The reflection film in accordance with the present invention is a reflection film formed on a substrate, characterized by being an Ag alloy film including Ag as a main component, and Bi in an amount of 0.02 atomic percent or more, and further including one or more of V, Ge, and Zn in a total content of 0.02 atomic percent or more, and satisfying the following expression (1): 7×[A]+13×[Bi]?8??(1) where [A] (atomic percent) denotes the content of one or more of the V, Ge, and Zn, and [Bi] (atomic percent) denotes the content of Bi.

Abstract: A reflecting film including: an Ag or Ag-base alloy thin film of an Ag-base alloy containing at least one element among Au, Pt, Pd, Bi, and rare-earth elements as a first layer; a film of an oxide or oxynitride of at least one element among Si, Al and Ti having a thickness between 5 and 50 nm as a second layer deposited on the first layer; and a film having a thickness between 10 and 100 nm formed by a plasma polymerization process as a third layer deposited on the second layer.

Abstract: A metal separator 1 for a fuel cell according to the invention is a metal separator for a fuel cell manufactured by using a metal substrate 2 with a flat surface, or with concave gas flow paths formed on at least a part of the surface. The metal separator 1 includes an acid-resistant metal film 3 formed over the surface of the metal substrate 2, and containing one or more kinds of non-noble metals selected from the group comprised of Zr, Nb, and Ta, and a conductive alloy film 4 formed over the acid-resistant metal film 3, and containing one or more kinds of noble metals selected from the group comprised of Au and Pt, and one or more kinds of non-noble metals selected from the group comprised of Zr, Nb, and Ta. A method for manufacturing the metal separator for a fuel cell according to the invention includes a step S1 of depositing an acid-resistant metal film, and a step S2 of depositing a conductive alloy film.

Abstract: The present invention concerns an alloy film for a metal separator for a fuel cell characterized by containing at least one noble metal element selected from Au and Pt and at least one non-noble metal element selected from the group consisting of Ti, Zr, Nb, Hf, and Ta, at a content ratio of noble metal element/non-noble metal element of 35/65 to 95/5, and having a film thickness of 2 nm or more. The present invention also relates to a manufacturing method of an alloy film for the metal separator for the fuel cell and a target material for sputtering, as well as the metal separator and the fuel sell. The alloy film for the metal separator for the fuel cell according to the invention is excellent in the corrosion resistance, has low contact resistance, can maintain the low contact resistance for a long time even in a corrosive environment, and is excellent further in the productivity.

Abstract: Disclosed is anode for use in a lithium ion secondary battery. The anode includes an anode current collector and an anode active material arranged thereon, in which the anode active material contains amorphous carbon and at least one metal dispersed in the amorphous carbon, and the at least one metal is selected from: 30 to 70 atomic percent of Si; and 1 to 40 atomic percent of Sn. The anode gives a lithium ion secondary battery that has a high charge/discharge capacity and is resistant to deterioration of its anode active material even after repetitive charge/discharge cycles.

Abstract: Disclosed is an Al alloy reflective film which has a higher reflectance than that of pure Al films when produced by sputtering, excels in alkali resistance, acid resistance, and moisture resistance, and therefore less suffers from the reduction in reflectance even when a protective coating is not applied. Specifically disclosed is an Al alloy reflective film which contains at least one element selected from Sc, Y, La, Gd, Tb, and Lu in a total amount of from 0.4 to 2.5 atomic percent, with the remainder being Al and inevitable impurities. The Al alloy reflective film has a film surface roughness of 4 nm or less as measured with an atomic force microscope. Also disclosed are an automotive lighting device and an illumination device each provided with the reflective film. Further disclosed is an Al alloy sputtering target for use in the formation of the reflective film.

Abstract: Provided is an arc evaporation source wherein film-forming speed is increased by inducing magnetic lines in the substrate direction. The arc evaporation source is provided with: at least one outer circumferential magnet (3), which is disposed such that the outer circumferential magnet surrounds the outer circumference of a target (2) and that the magnetization direction thereof is in the direction orthogonally intersecting the surface of the target (2); and a rear surface magnet (4) disposed on the rear surface side of the target (2). The rear surface magnet (4) has a non-ring-shaped first permanent magnet (4A) wherein the polarity thereof faces the same direction as the polarity of the outer circumferential magnet (3) and the magnetization direction of the rear surface magnet (4) is in the direction orthogonally intersecting the surface of the target (2).

Abstract: Provided is an Al alloy reflective film which does not require a protective film in that it has excellent alkali resistance (resistance to alkali corrosion), acid resistance (resistance to acid corrosion) and humidity resistance (resistance to a high-temperature, humid environment) even if there is no protective film, and which contains 2.5 to 20 at % of at least one element selected from Gd, La, Y, Sc, Tb, Lu, Pr, Nd, Pm, Ce, Dy, Ho, Er, and Tm, with the balance being Al and inevitable impurities. Also provided are an automobile light, illuminator, and ornamentation having such an Al alloy reflective film. Further provided is an Al alloy sputtering target, which is for forming such an Al alloy reflective film and which contains 2.5 to 35 at % of at least one element selected from Gd, La, Y, Sc, Tb, Lu, Pr, Nd, Pm, Ce, Dy, Ho, Er, and Tm, with the balance being Al and inevitable impurities.