Patents by Inventor Shinichi Umeno
Shinichi Umeno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240128101Abstract: A substrate processing apparatus includes: a reservoir configured to temporarily store a processing liquid for processing a substrate; a replenisher configured to replenish the processing liquid to the reservoir; a flow rate measurer configured to measure a flow rate of the processing liquid replenished to the reservoir; a gas supplier configured to supply gas to the reservoir to pressurize an interior of the reservoir; and a controller, wherein the controller is configured to control the gas supplier based on a value measured by the flow rate measurer to execute a process of replenishing the processing liquid from the replenisher to the reservoir while regulating a magnitude of an internal pressure of the reservoir.Type: ApplicationFiled: October 12, 2023Publication date: April 18, 2024Inventors: Atsushi ANAMOTO, Shinichi UMENO
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Publication number: 20240021445Abstract: A substrate processing apparatus according to the present disclosure includes a substrate holding unit, a fluid supplying unit, a processing-liquid supplying unit, a nozzle, a fluid amount adjusting unit, and a controller. The substrate holding unit holds a substrate to be rotatable. The fluid supplying unit supplies fluid including pressurized vapor or mist of deionized water. The processing-liquid supplying unit supplies processing liquid including at least a sulfuric acid. The nozzle is connected to the fluid supplying unit and the processing-liquid supplying unit to discharge mixed fluid of the fluid and the processing liquid toward the substrate. The fluid amount adjusting unit adjusts a flow volume of the fluid that is flowing through the fluid supplying unit. The controller controls the fluid amount adjusting unit to adjust a ratio of the fluid to the processing liquid.Type: ApplicationFiled: June 28, 2023Publication date: January 18, 2024Applicant: Tokyo Electron LimitedInventors: Hiroki SAKURAI, Yenrui HSU, Shoki MIZUGUCHI, Nobuhiro OGATA, Shinichi UMENO, Kazuya GODA, Minsung KIM, Hiroyuki HIGASHI
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Patent number: 11626298Abstract: A liquid supply device includes: a storage tank configured to store a processing liquid including a first processing liquid (sulfuric acid) and a second processing liquid (hydrogen peroxide solution); a circulation path having a first pipeline through which the processing liquid passes in a horizontal direction, and configured to circulate the processing liquid stored in the storage tank; a branch path configured to supply the processing liquid to a processing unit; and a branching part having an opening for allowing the processing liquid to flow out from the first pipeline to the branch path, wherein the opening is formed in the branching part and formed below a periphery of the first pipeline when the first pipeline is viewed in section.Type: GrantFiled: March 23, 2018Date of Patent: April 11, 2023Assignee: TOKYO ELECTRON LIMITEDInventors: Yusuke Takamatsu, Yasuhiro Takaki, Shinichi Umeno, Shogo Fukui
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Patent number: 11158525Abstract: A recovery route returns, to a retaining tank, mixed solution supplied to a substrate processing unit. A discarding route discards the supplied mixed solution to a place other than the retaining tank. A switching controller causes the supplied mixed solution to flow into the discarding route during a time interval until a first time interval has elapsed from a time point when the substrate processing unit starts to supply the mixed solution; causes the supplied mixed solution to flow into the recovery route during a time interval until a second time interval, which is decided based on a predetermined recovery rate, has elapsed after the first time interval elapses; and causes the supplied mixed solution to flow into the discarding route during a time interval until supply of the mixed solution has been ended from a time point when the second time interval elapses.Type: GrantFiled: January 20, 2017Date of Patent: October 26, 2021Assignee: TOKYO ELECTRON LIMITEDInventors: Yasuhiro Takaki, Shinichi Umeno, Takashi Nagai, Hisashi Morita, Nobuhiro Ogata, Yusuke Takamatsu, Jiro Higashijima
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Publication number: 20210111043Abstract: A liquid supply device includes: a storage tank configured to store a processing liquid including a first processing liquid (sulfuric acid) and a second processing liquid (hydrogen peroxide solution); a circulation path having a first pipeline through which the processing liquid passes in a horizontal direction, and configured to circulate the processing liquid stored in the storage tank; a branch path configured to supply the processing liquid to a processing unit; and a branching part having an opening for allowing the processing liquid to flow out from the first pipeline to the branch path, wherein the opening is formed in the branching part and formed below a periphery of the first pipeline when the first pipeline is viewed in section.Type: ApplicationFiled: March 23, 2018Publication date: April 15, 2021Inventors: Yusuke TAKAMATSU, Yasuhiro TAKAKI, Shinichi UMENO, Shogo FUKUI
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Patent number: 10714365Abstract: A liquid processing apparatus includes a processing unit, a first supply route, a first device, a second supply route, a second device, a housing, and an external housing. The processing unit processes a substrate by using processing liquid including first and second processing liquids. The first supply route is for supplying the first processing liquid to the processing unit. The first device is for supplying the first processing liquid to the first supply route. The second supply route is for supplying the second processing liquid to the processing unit. The second processing liquid has higher temperature than the first processing liquid. The second device is for supplying the second processing liquid to the second supply route. The housing accommodates the processing unit. The external housing accommodates the first and second devices, and is adjacent to the housing. The external housing includes a partition wall between the first and second devices.Type: GrantFiled: November 2, 2016Date of Patent: July 14, 2020Assignee: TOKYO ELECTRON LIMITEDInventors: Tetsurou Iriyama, Shinichi Umeno, Yasuhiro Takaki, Takami Satoh
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Patent number: 10573539Abstract: A substrate liquid processing apparatus includes a transfer section, a processing section, a reservoir and a liquid sending mechanism. The transfer section includes a transfer device configured to transfer a substrate. The processing section is provided adjacent to the transfer section in a horizontal direction, and includes a liquid processing unit configured to process the substrate by using a processing liquid. The reservoir is configured to store the processing liquid therein. The liquid sending mechanism is configured to send out the processing liquid stored in the reservoir into the liquid processing unit. The reservoir is disposed directly under the transfer section. Further, the liquid sending mechanism is disposed directly under the processing section. Space saving of the substrate liquid processing apparatus can be achieved.Type: GrantFiled: December 15, 2015Date of Patent: February 25, 2020Assignee: TOKYO ELECTRON LIMITEDInventors: Hiroshi Komiya, Yasuhiro Takaki, Shinichi Umeno, Koji Tanaka, Takami Satoh, Atsushi Anamoto
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Publication number: 20190067048Abstract: A recovery route returns, to a retaining tank, mixed solution supplied to a substrate processing unit. A discarding route discards the supplied mixed solution to a place other than the retaining tank. A switching controller causes the supplied mixed solution to flow into the discarding route during a time interval until a first time interval has elapsed from a time point when the substrate processing unit starts to supply the mixed solution; causes the supplied mixed solution to flow into the recovery route during a time interval until a second time interval, which is decided based on a predetermined recovery rate, has elapsed after the first time interval elapses; and causes the supplied mixed solution to flow into the discarding route during a time interval until supply of the mixed solution has been ended from a time point when the second time interval elapses.Type: ApplicationFiled: January 20, 2017Publication date: February 28, 2019Applicant: TOKYO ELECTRON LIMITEDInventors: Yasuhiro Takaki, Shinichi Umeno, Takashi Nagai, Hisashi Morita, Nobuhiro Ogata, Yusuke Takamatsu, Jiro Higashijima
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Publication number: 20180358240Abstract: A substrate liquid processing apparatus includes a transfer section, a processing section, a reservoir and a liquid sending mechanism. The transfer section includes a transfer device configured to transfer a substrate. The processing section is provided adjacent to the transfer section in a horizontal direction, and includes a liquid processing unit configured to process the substrate by using a processing liquid. The reservoir is configured to store the processing liquid therein. The liquid sending mechanism is configured to send out the processing liquid stored in the reservoir into the liquid processing unit. The reservoir is disposed directly under the transfer section. Further, the liquid sending mechanism is disposed directly under the processing section. Space saving of the substrate liquid processing apparatus can be achieved.Type: ApplicationFiled: December 15, 2015Publication date: December 13, 2018Inventors: Hiroshi Komiya, Yasuhiro Takaki, Shinichi Umeno, Koji Tanaka, Takami Satoh, Atsushi Anamoto
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Publication number: 20180330974Abstract: A liquid processing apparatus includes a processing unit, a first supply route, a first device, a second supply route, a second device, a housing, and an external housing. The processing unit processes a substrate by using processing liquid including first and second processing liquids. The first supply route is for supplying the first processing liquid to the processing unit. The first device is for supplying the first processing liquid to the first supply route. The second supply route is for supplying the second processing liquid to the processing unit. The second processing liquid has higher temperature than the first processing liquid. The second device is for supplying the second processing liquid to the second supply route. The housing accommodates the processing unit. The external housing accommodates the first and second devices, and is adjacent to the housing. The external housing includes a partition wall between the first and second devices.Type: ApplicationFiled: November 2, 2016Publication date: November 15, 2018Inventors: Tetsurou Iriyama, Shinichi Umeno, Yasuhiro Takaki, Takami Satoh